Apparatuses, systems, and methods for sample testing

ABSTRACT

Methods, apparatuses, and systems associated with a sample testing device are provided. For example, an example sample testing device may include a substrate layer defining a bottom surface of the sample testing device, as well as a waveguide disposed on the substrate layer and includes at least one reference channel and at least one sample channel.

CROSS-REFERENCE TO RELATED APPLICATIONS

The present application is a continuation of U.S. patent applicationSer. No. 17/302,536 (filed on May 5, 2021), which claims priority to andbenefit of U.S. Patent Application No. 63/021,416 (filed on May 7,2020), U.S. Patent Application No. 63/198,609 (filed Oct. 29, 2020),U.S. Patent Application No. 63/154,476 (filed on Feb. 26, 2021), theentire contents of which are incorporated by reference into the presentapplication.

BACKGROUND

Existing methods, apparatus, and systems are plagued by challenges andlimitations. For example, efficiency and/or accuracy of many devices maybe affected due to various factors such as structural limitations,environmental temperature, contamination, and/or the like.

BRIEF SUMMARY

In accordance with various examples of the present disclosure, variousexample methods, apparatuses, and systems for sample testing areprovided. In some embodiments, example methods, apparatuses, and systemsmay utilize interferometry to detect the presence of virus and/or otherviral indicator of protein content in a collected sample.

In some examples, a sample testing device may comprise a waveguide andan integrated optical component. In some examples, the integratedoptical component may be coupled to the waveguide. In some examples, theintegrated optical component may comprise a collimator and a beamsplitter.

In some examples, the beam splitter may comprise a first prism and asecond prism. In some examples, the second prism may be attached to afirst oblique surface of the first prism. In some examples, the firstprism and the second prism form a cube shape.

In some examples, the beam splitter may comprise a polarization beamsplitter.

In some examples, the collimator may be attached to a second obliquesurface of the first prism.

In some examples, the sample testing device may comprise a light sourcecoupled to the integrated optical component. In some examples, the lightsource may be configured to emit a laser light beam.

In some examples, the waveguide may comprise a waveguide layer and aninterface layer having a sample opening. In some examples, the interfacelayer may be disposed on a top surface of the waveguide layer.

In some examples, the integrated optical component may be disposed on atop surface of the waveguide layer.

In some examples, the sample testing device may comprise a lenscomponent positioned above the interface layer. In some examples, thelens component may at least partially overlap with an output opening ofthe interface layer in the output light direction.

In some examples, the sample testing device may comprise an imagingcomponent disposed on a top surface of the lens component.

In some examples, the imaging component may be configured to detect aninterference fringe pattern.

In some examples, a sample testing device may comprise a waveguidehaving a first surface and a lens array disposed on the first surface.In some examples, the lens array comprises at least one optical lens.

In some examples, the lens array may comprise at least one micro lensarray. In some examples, a first shape of a first optical lens of themicro lens array may be different from a second shape of a secondoptical lens of the micro lens array. In some examples, the at least oneoptical lens may comprise at least one prism lens.

In some examples, a first surface curvature of the first optical lensmay be different from a second surface curvature of the second opticallens in a waveguide light transfer direction.

In some examples, the sample testing device may comprise an integratedoptical component couple to the waveguide through the lens array.

In some examples, the sample testing device may comprise an imagingcomponent coupled to the waveguide through the lens array.

In some examples, a sample testing device may comprise a waveguidehaving a sample opening on a first surface and an opening layer disposedon the first surface. In some examples, the opening layer may comprise afirst opening at least partially overlapping with the sample opening.

In some examples, the sample testing device may further comprise a coverlayer coupled to the waveguide via at least one sliding mechanism. Insome examples, the cover layer may comprise a second opening.

In some examples, the cover layer may be positioned on top of theopening layer and moveable between a first position and a secondposition.

In some examples, when the cover layer may be at the first position, thesecond opening overlaps with the first opening.

In some examples, when the cover layer is at the second position, thesecond opening does not overlap with the first opening.

In some examples, a sample testing device may comprise a waveguidehaving a top surface and a bottom surface, and a light source configuredto couple light into the sample testing device via the bottom surface ofthe waveguide.

In some examples, the light source may be configured to emit a lightbeam through the top surface of the waveguide.

In some examples, a sample testing device may comprise a waveguidehaving a top surface and a bottom surface. In some examples, the topsurface of the waveguide may be configured to be integrated with a usercomputing device.

In some examples, a thickness of the waveguide may be within a range of5 millimeters to 7 millimeters.

In some examples, a user computing device component may be configured tobe commonly used by the sample testing device.

In some examples, a sample testing device may comprise a waveguide, andan insulating layer disposed on at least one surface of the waveguide.

In some examples, the sample testing device may further comprise atleast one sensor configured to control a temperature of the insulatinglayer.

In some examples, a sample testing device may comprise a waveguide and athermally controlled waveguide housing encasing the waveguide.

In some examples, a sample testing device may comprise a waveguidecomprising at least: a substrate layer defining a bottom surface of thesample testing device; a waveguide layer deposited thereon configured tocouple light laterally from an input side of the waveguide to an outputside of the waveguide; and an interface layer defining a top surface ofthe sample testing device.

In some examples, the substrate layer may comprise an integratedcircuit.

In some examples, the waveguide layer may further comprise at least onereference channel and at least one sample channel.

In some examples, the at least one reference channel may be associatedwith a reference window in the interface layer, and the at least onesample channel is associated with at least one sample window in theinterface layer.

In some examples, a computer-implemented method is provided. Thecomputer-implemented method may comprise receiving first interferencefringe data for an unidentified sample medium, the first interferencefringe data associated with a first wavelength; receiving secondinterference fringe data for the unidentified sample medium, the secondinterference fringe data associated with a second wavelength; derivingrefractive index curve data based on the first interference fringe dataassociated with the first wavelength and the second interference fringedata associated with the second wavelength; and determining sampleidentity data based on the refractive index curve data.

In some examples, the computer-implemented method further comprisestriggering a light source to generate (i) first projected light of thefirst wavelength, wherein the first projected light represents a firstinterference fringe pattern and (ii) second projected light of thesecond wavelength, wherein the second projected light represents asecond interference fringe pattern, wherein receiving the firstinterference fringe data comprises capturing, using an imagingcomponent, the first interference fringe data representing the firstinterference fringe pattern associated with the first wavelength, andwherein receiving the second interference fringe data comprisescapturing, using the imaging component the second interference fringedata representing the second interference fringe pattern associated withthe second wavelength.

In some examples, the computer-implemented method further comprisestriggering a first light source to generate first projected light of thefirst wavelength, wherein the first projected light represents a firstinterference fringe pattern; and triggering a second light source togenerate second projected light of the first wavelength, wherein thesecond projected light represents a second interference fringe pattern,wherein receiving the first interference fringe data comprisescapturing, using an imaging component, the first interference fringedata representing the first interference fringe pattern associated withthe first wavelength, and wherein receiving the second interferencefringe data comprises capturing, using the imaging component the secondinterference fringe data representing the second interference fringepattern associated with the second wavelength.

In some examples, determining the sample identity data based on therefractive index curve data comprises querying a refractive indexdatabase for the sample identity data based on the refractive indexcurve data, wherein the sample identity data corresponds to a storedrefractive index curve in the refractive index database that bestmatches the refractive index curve data.

In some examples, the computer-implemented method further comprisesdetermining an operating temperature associated with the unidentifiedsample medium, wherein the refractive index database is queried based onat least the refractive index curve data and the operating temperatureto determine the sample identity data.

In some examples, wherein the refractive index database may beconfigured to store a plurality of known refractive index curve dataassociated with a plurality of identified samples, the plurality ofidentified samples associated with a plurality of known sample identitydata.

In some examples, the refractive index database is further configured tostore the plurality of known refractive index curve data associated witha plurality of temperature data.

In some examples, a computer-implemented method is provided. Thecomputer-implemented method may comprise triggering a light sourcecalibration event associated with a light source; capturing referenceinterference fringe data representing a reference interference fringepattern in a sample environment, the reference interference fringepattern projected via a reference channel of a waveguide; comparing thereference interference fringe data with stored calibrationinterferometer data to determine a refractive index offset between thereference interference fringe data and the stored calibrationinterference data; and tuning the light source based on the refractiveindex offset.

In some examples, tuning the light source based on the refractive indexoffset comprises adjusting a voltage level applied to the light sourceto adjust a light wavelength associated with the light source.

In some examples, tuning the light source based on the refractive indexoffset comprises adjusting a current level applied to the light sourceto adjust a light wavelength associated with the light source.

In some examples, the computer-implemented method further comprisesadjusting a temperature control, wherein adjusting the temperaturecontrol sets the sample environment to a tuned operating temperature,and wherein the tuned operating temperature is within a threshold rangefrom a desired operating temperature.

In some examples, the computer-implemented method further comprises:initiating a calibration setup event associated with the light source;capturing calibrated reference interference fringe data representing acalibrated interference fringe pattern in a calibrated environment, thecalibrated interference fringe pattern projected via the referencechannel of the waveguide; and storing, in a local memory, the calibratedreference interference fringe data as the stored calibrationinterference fringe data.

In some examples, the calibrated environment comprises an environmenthaving a known operating temperature.

In some examples, a computer-implemented method is provided. Thecomputer-implemented method comprises receiving sample interferencefringe data for an unidentified sample medium, the sample interferencefringe data associated with a determinable wavelength; providing thesample interference fringe data to a trained sample identificationmodel; and receiving, from the trained sample identification model,sample identity data associated with the sample identity data associatedwith the sample interference fringe data.

In some examples, receiving the sample interference fringe data for theunidentified sample medium comprises triggering a light source togenerate a projected light of the determinable wavelength, wherein theprojected light is associated with a sample interference fringe pattern;capturing, using an imaging component, the sample interference fringedata representing the sample interference fringe pattern.

In some examples, the sample identity data comprises a sample identitylabel.

In some examples, the sample identity data comprises a plurality ofconfidence scores associated with a plurality of sample identity labels.

In some examples, the trained sample identification model comprises atrained deep learning model or a trained statistical model.

In some examples, the computer-implemented method further comprisesdetermining an operational temperature associated with a sampleenvironment; and providing the operational temperature and the sampleinterference fringe data to the trained sample identification model,wherein the sample identity data is received in response to theoperational temperature and the sample interference fringe data. In someexamples, the computer-implemented method further comprises: collectinga plurality of interference fringe data, the plurality of interferencefringe data associated with a plurality of known sample identity labels;storing, in a training database, each of the plurality of interferencefringe data with the plurality of known sample identity labels; andtraining the trained sample identification model from the trainingdatabase.

In some examples, a sample testing device may comprise a substrate; awaveguide disposed on the substrate; and a lens array disposed on thesubstrate. In some embodiments, the lens array may be configured todirect light to an input edge of the waveguide.

In some embodiments, the lens array may comprise a compound parabolicconcentrator (CPC) lens array.

In some embodiments, the lens array may comprise a micro CPC lens array.

In some embodiments, the lens array may comprise an asymmetric CPC lensarray.

In some embodiments, the lens array may comprise an asymmetric micro CPClens array.

In some embodiments, the waveguide may comprise at least one referencechannel and at least one sample channel.

In some embodiments, the lens array may be configured to direct light toa first input edge of the at least one reference channel and to a secondinput edge of the at least one sample channel.

In some embodiments, the sample testing device may comprise: anintegrated optical component coupled to the lens array, wherein theintegrated optical component may comprise a collimator and a beamsplitter.

In some embodiments, a waveguide may comprise: a plurality of opticalchannels within the waveguide, wherein each of the plurality of opticalchannels defines an optical path; and an input edge comprising aplurality of input openings, wherein each of the plurality of inputopenings corresponds to one of the plurality of optical channels.

In some embodiments, the input edge may be configured to receive light.

In some embodiments, each of the plurality of input openings may beconfigured to receive light.

In some embodiments, each of the plurality of optical channels may beconfigured to guide the light from a corresponding input opening througha corresponding optical channel.

In some embodiments, each of the plurality of optical channels maycomprise a curved portion and a straight portion.

In some embodiments, a method for manufacturing a waveguide is provided.The method may comprise: attaching an intermediate layer on a substratelayer; attaching a waveguide layer on the intermediate layer; andetching a first edge of the intermediate layer, a first edge of thewaveguide layer, a second edge of the intermediate layer, and a secondedge of the waveguide layer.

In some embodiments, the first edge of the waveguide layer may comprisean input opening, wherein the second edge of the waveguide layer maycomprise an output opening.

In some embodiments, the first edge of the waveguide layer may comprisea recessed optical edge.

In some embodiments, the second edge of the waveguide layer may comprisea recessed optical edge.

In some embodiments, the method may comprise coupling a light source tothe first edge of the waveguide layer.

In some embodiments, a method for manufacturing may comprise producing awaveguide with on-chip fluidics; and attaching a cover glass componentto the waveguide with on-chip fluidics.

In some embodiments, producing the waveguide with on-chip fluidics maycomprise: producing a waveguide layer; producing an on-chip fluidicslayer; and attaching the on-chip fluidics layer to a top surface of thewaveguide layer.

In some embodiments, attaching the cover glass component may comprise:producing an adhesive layer; attaching the adhesive layer on a topsurface of the waveguide with on-chip fluidics; and attaching a coverglass layer on a top surface of the adhesive layer.

In some embodiments, a sample testing device may comprise a waveguideholder component, wherein a first surface of the waveguide holdercomponent comprises at least one alignment feature; and a waveguidecomprising at least one etched edge, wherein the at least one etchededge is in contact with the at least one alignment feature of thewaveguide holder component in an alignment arrangement.

In some embodiments, the at least one alignment feature may comprise atleast one protrusion on the first surface of the waveguide holdercomponent, wherein, when in the alignment arrangement, the at least oneetched edge is in contact with the at least one protrusion.

In some embodiments, the waveguide holder component may comprise: aholder cover element; and a fluid gasket element secured to the holdercover element, wherein the fluid gasket element is positioned betweenthe holder cover element and the waveguide.

In some embodiments, the holder cover element may comprise a pluralityof input openings on a top surface of the holder cover element, whereinthe fluid gasket element may comprise a plurality of inlets protrudingfrom a top surface of the fluid gasket element.

In some embodiments, the sample testing device further comprises: athermal pad component disposed on a bottom surface of the waveguide.

In some embodiments, a method is provided. The method may compriseapplying an antibody solution through a sample channel of a sampletesting device; and injecting sample medium through the sample channel.

In some embodiments, prior to injecting the sample medium, the methodmay comprise: applying a buffer solution through the sample channelafter an incubation time period subsequent to applying the antibodysolution.

In some embodiments, subsequent to injecting the sample medium, themethod may comprise: applying a cleaning solution through the samplechannel.

In some embodiments, a computer-implemented method is provided. Themethod may comprise receiving first interference fringe data for anunidentified sample medium; calculating at least one statistical metricbased on the first interference fringe data; comparing the at least onestatistical metric with one or more statistical metrics associated withone or more identified media; and determining sample identity data basedon the at least one statistical metric and the one or more statisticalmetrics.

In some embodiments, the at least one statistical metric may compriseone or more of: a sum associated with the first interference fringedata, a mean associated with the first interference fringe data, astandard deviation associated with the first interference fringe data, askewness associated with the first interference fringe data, or aKurtosis value associated with the first interference fringe data.

In some embodiments, the computer-implemented method may comprise:receiving second interference fringe data for an identified referencemedium; and calculating a plurality of statistical metrics based on thesecond interference fringe data; and storing the plurality ofstatistical metrics in a database.

In some embodiments, comparing the at least one statistical metric withthe one or more statistical metrics may comprise: determining whether adifference between the at least one statistical metric and the one ormore statistical metrics satisfies a threshold.

In some embodiments, the computer-implemented method may comprise: inresponse to determining that the difference between the at least onestatistical metric and the one or more statistical metrics satisfies thethreshold, determining the sample identity data based on identify dataof an identified reference medium associated with the one or morestatistical metrics.

In some embodiments, a sample testing device may comprise: an analyzerapparatus comprising a slot base and at least one optical window; and asensor cartridge fastened to the slot base, wherein the at least oneoptical window is aligned with one of an input window of the sensorcartridge or an output window of the sensor cartridge. In someembodiments, the sensor cartridge comprises a substrate layer and awaveguide described herein.

In some embodiments, the sensor cartridge may comprise: a substratelayer; a waveguide disposed on a top surface of the substrate layer; anda cover layer disposed on a top surface of the waveguide.

In some embodiments, the waveguide may comprise at least one opening onthe top surface of the waveguide.

In some embodiments, the cover layer may comprise at least one opening.

In some embodiments, the cover layer may be slidably attached to thewaveguide.

In some embodiments, a sample testing device may comprise: a waveguide;and a sampler component disposed on a top surface of the waveguide,wherein the sampler component may comprise an anode element.

In some embodiments, the top surface of the waveguide may comprise aground grid layer.

In some embodiments, the ground grid layer may comprise metal material.

In some embodiments, the ground grid layer may be connected to a ground.

In some embodiments, the waveguide may comprise a cladding window layerthat is disposed under the ground grid layer.

In some embodiments, the waveguide may comprise a light shield layerdisposed under the cladding window layer.

In some embodiments, the waveguide may comprise a planer layer disposedunder the light shield layer.

In some embodiments, the waveguide may comprise a waveguide core layerdisposed under the planer layer.

In some embodiments, the waveguide may comprise a cladding layerdisposed under the waveguide core layer.

In some embodiments, the waveguide may comprise a substrate layerdisposed under the cladding layer.

In some embodiments, a sample testing device may comprise a shellcomponent comprising at least one airflow opening element; and a basecomponent comprising an air blower element corresponding to the at leastone airflow opening element, wherein the air blower element isconfigured to direct air to a waveguide.

In some embodiments, the waveguide may be disposed on an inner surfaceof the base component.

In some embodiments, the sample testing device may comprise: an aerosolsampler component disposed on an inner surface of the base component andconnecting the air blower element with the waveguide.

In some embodiments, the base component may comprise a power plugelement.

In some embodiments, a sample testing device comprises a pump; a firstvalve connected to the pump and to a first flow channel; and a bufferloop connected to the first valve and a second valve.

In some embodiments, the first valve and the second valve are2-configuration 6-port valves. In some embodiments, the pump isconnected to a fifth port of the first valve. In some embodiments, thefirst flow channel is connected to a sixth port of the first valve.

In some embodiments, when the first valve is in the first configuration,the fifth port of the first valve is connected to the sixth port of thefirst valve. In some embodiments, when the first valve is in the firstconfiguration, the pump is configured to provide buffer solution to thefirst flow channel through the first valve.

In some embodiments, when the first valve is in the secondconfiguration, the fifth port of the first valve is connected to thefourth port of the first valve. In some embodiments, the fourth port ofthe first valve is connected to the first port of the first valvethrough a first sample loop.

In some embodiments, the first sample loop comprises first fluid. Insome embodiments, when the first valve is in the second configuration,the pump is configured to inject the first fluid to the first flowchannel.

In some embodiments, the second valve is connected to a second flowchannel. In some embodiments, the second valve comprises a second sampleloop. In some embodiments, the second sample loop comprises secondfluid. In some embodiments, the pump is configured to inject the firsttest liquid to the first flow channel and inject the second test liquidto the second flow channel at the same time.

In some embodiments, a sample testing device further comprises aprocessor configured to align a laser source to the waveguide by causingthe laser source or an optical element from which it is refracted orreflected to move in a vertical dimension until detecting a change inthe back-reflected power from the surface, with the characteristicreflectivity of the dielectric in which the waveguide is embedded beingused as a signal to indicate when the laser is incident on that film;and cause the laser source or an optical element from which it isrefracted or reflected to move in a horizontal dimension in a directionindicated by the pattern of light diffracted from gratings formed inwaveguides to either side of the target area for coupling into the mainfunctional waveguide, the position or spatial frequency of the gratingsbeing different on one side of the target than the other. In someembodiments, a method for aligning a laser source to a waveguidecomprises aiming a laser beam emitted by the laser source at a waveguidemount; and causing the laser source to move upwards in a verticaldimension until detecting, via an imaging component, at least onegrating coupler spot formed by the laser beam reflected from a gratingcoupler in the waveguide.

In some embodiments, the waveguide is disposed on a top surface of thewaveguide mount. In some embodiments, a fluid cover is disposed on a topsurface of the waveguide.

In some embodiments, a reflectivity rate of the waveguide mount ishigher than a reflectivity rate of the waveguide.

In some embodiments, the waveguide comprises an optical channel and aplurality of alignment channels. In some embodiments, each of theplurality of alignment channels comprises at least one grating coupler.

In some embodiments, the method for aligning the laser source to thewaveguide further comprises causing the laser source to move in ahorizontal dimension based at least in part on a spatial frequencyassociated with the at least one grating coupler spot.

In some embodiments, a method for aligning a laser source to a waveguidecomprises aiming a laser beam emitted by the laser source at a waveguidemount; and causing the laser source to move upwards in a verticaldimension until a back-reflected signal power from the laser beamdetected by a photodiode satisfies a threshold.

In some embodiments, the waveguide is configured to receive samplemedium comprising non-viral indicator of the biological content andviral indicator of the biological content. In some embodiments, thesample testing device further comprises a processor configured todetermine whether a concentration level of the non-viral indicator ofbiological content satisfies a threshold. In some embodiments, a methodcomprises detecting a concentration level of non-viral indicator ofbiological content; and determining whether the concentration level ofthe non-viral indicator of biological content satisfies a threshold.

In some embodiments, in response to determining that the concentrationlevel of the non-viral indicator of biological content satisfies thethreshold, the method further comprises detecting a concentration levelof viral indicator of biological content.

In some embodiments, in response to determining that the concentrationlevel of the non-viral indicator of biological content does not satisfythe threshold, the method further comprises transmitting a warningsignal.

In some embodiments, a method comprises detecting concentration level ofnon-viral indicators of biological content, detecting concentrationlevels of viral indicators of biological content, and calculatingcomparative concentration levels of viral indicators of biologicalcontent.

In some embodiments, a sample testing device comprises a waveguideplatform; an aiming control base disposed on a top surface of thewaveguide platform; and a waveguide base disposed on the top surface ofthe waveguide platform.

In some embodiments, the waveguide base comprises a waveguide. In someembodiments, the aiming control base comprises a laser source. In someembodiments, the aiming control base is configured to align the lasersource to an input end of the waveguide.

In some embodiments, the aiming control base comprises at least oneelectro-magnetic actuator configured to control at least one of a pitchor a roll of the aiming control base.

In some embodiments, the aiming control base comprises a scan element.

In some embodiments, a waveguide cartridge comprises a waveguide, a flowchannel plate disposed on a top surface of the waveguide, a cartridgebody disposed on a top surface of the flow channel plate, a fluid coverdisposed on a top surface of the cartridge body, and a cartridge coverdisposed on a top surface of the fluid cover.

In some embodiments, the cartridge body comprises a plurality of portsdisposed on a bottom surface of the cartridge body, wherein each of theplurality of ports is connected to at least one flow channel defined bythe flow channel plate.

In some embodiments, the cartridge body comprises a buffer reservoir, areference port, a sample port, and an exhauster chamber.

In some embodiments, a system comprises an evaporator unit and acondenser unit. In some embodiments, the evaporator unit comprises anevaporator coil connected to a compressor and a condenser coil of thecondenser unit. In some embodiments, the evaporator unit comprises acondensate tray positioned under the evaporator coil and configured toreceive condensed liquid. In some embodiments, the condenser unitcomprises a sample collection device connected to the condensate tray.

In some embodiments, the evaporator coil comprises one or morehydrophobic layers.

In some embodiments, the sample collection device stores buffersolution.

The foregoing illustrative summary, as well as other exemplaryobjectives and/or advantages of the disclosure, and the manner in whichthe same are accomplished, are further explained in the followingdetailed description and its accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

The description of the illustrative examples may be read in conjunctionwith the accompanying figures. It will be appreciated that, forsimplicity and clarity of illustration, components and elementsillustrated in the figures have not necessarily been drawn to scale,unless described otherwise. For example, the dimensions of some of thecomponents or elements may be exaggerated relative to other elements,unless described otherwise. Examples incorporating teachings of thepresent disclosure are shown and described with respect to the figurespresented herein, in which:

FIG. 1 illustrates an example block diagram illustrating an examplesample testing device in accordance with various examples of the presentdisclosure;

FIG. 2 illustrates an example sample testing device comprising anexample waveguide in accordance with various examples of the presentdisclosure;

FIG. 3 illustrates an example diagram illustrating an example change inan evanescent field in accordance with various examples of the presentdisclosure;

FIG. 4 illustrates an example perspective view of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 5 illustrates an example side-section view of the example sampletesting device of FIG. 4 in accordance with various examples of thepresent disclosure;

FIG. 6 illustrates an example perspective view of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 7 illustrates an example side-section view of the example sampletesting device of FIG. 6 in accordance with various examples of thepresent disclosure;

FIG. 8 illustrates an example diagram of an example lens array inaccordance with various examples of the present disclosure;

FIG. 9 illustrates an example diagram of an example lens array inaccordance with various examples of the present disclosure;

FIG. 10 illustrates an example perspective view of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 11 illustrates an example side-section view of the example sampletesting device of FIG. 10 in accordance with various examples of thepresent disclosure;

FIG. 12 illustrates an example perspective view of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 13 illustrates an example side-section view of the example sampletesting device of FIG. 12 in accordance with various examples of thepresent disclosure;

FIG. 14 illustrates an example perspective view of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 15 illustrates an example side-section view of example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 16A illustrates an example perspective view of an example mobilepoint-of-care component in accordance with various examples of thepresent disclosure;

FIG. 16B illustrates an example top view of the example mobilepoint-of-care component of FIG. 16A in accordance with various examplesof the present disclosure;

FIG. 16C illustrates an example side-section view of the example mobilepoint-of-care component of FIG. 16A in accordance with various examplesof the present disclosure;

FIG. 17 illustrates an example perspective view of an example thermallycontrolled waveguide housing in accordance with various examples of thepresent disclosure;

FIG. 18 illustrates an example side-section view of an example thermallycontrolled waveguide housing in accordance with various examples of thepresent disclosure;

FIG. 19 illustrates an example perspective view of an example waveguidein accordance with various examples of the present disclosure;

FIG. 20A illustrates an example side-section view of an examplewaveguide in accordance with various examples of the present disclosure;

FIG. 20B illustrates an example side-section view of an examplewaveguide in accordance with various examples of the present disclosure;

FIG. 21 illustrates an example perspective view of an example waveguidein accordance with various examples of the present disclosure;

FIG. 22 illustrates an example top view of an example waveguide inaccordance with various examples of the present disclosure;

FIG. 23 illustrates an example side view of an example waveguide inaccordance with various examples of the present disclosure;

FIG. 24 illustrates an example method for providing an example waveguidein accordance with various examples of the present disclosure;

FIG. 25 illustrates an example view of a portion of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 26 illustrates an example view of a portion of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 27 illustrates an example view of a portion of an example sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 28A illustrates an example view of an example sample testing devicein accordance with various examples of the present disclosure;

FIG. 28B illustrates an example view of an example sample testing devicein accordance with various examples of the present disclosure;

FIG. 29 illustrates an example view of an example sample testing devicein accordance with various examples of the present disclosure;

FIG. 30 illustrates a portion of an example waveguide in accordance withvarious examples of the present disclosure;

FIG. 31 illustrates a portion of an example waveguide in accordance withvarious examples of the present disclosure;

FIG. 32 illustrates a portion of an example waveguide in accordance withvarious examples of the present disclosure;

FIG. 33A illustrates a portion of an example waveguide in accordancewith various examples of the present disclosure;

FIG. 33B illustrates a portion of an example waveguide in accordancewith various examples of the present disclosure;

FIG. 34 illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 35A illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 35B illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 36 illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 37 illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 38 illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 39A illustrates an example waveguide holder component in accordancewith various examples of the present disclosure;

FIG. 39B illustrates an example waveguide holder component in accordancewith various examples of the present disclosure;

FIG. 39C illustrates an example waveguide holder component in accordancewith various examples of the present disclosure;

FIG. 40A illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 40B illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 40C illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 41A illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 41B illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 42A illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 42B illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 42C illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 42D illustrates an example waveguide in accordance with variousexamples of the present disclosure;

FIG. 43 illustrates an example graphical visualization in accordancewith various examples of the present disclosure;

FIG. 44 illustrates an example graphical visualization in accordancewith various examples of the present disclosure;

FIG. 45 illustrates an example block diagram of an example apparatus forsensing and/or processing in accordance with various examples of thepresent disclosure;

FIG. 46 illustrates an example block diagram of an example apparatus forsensing and/or processing in accordance with various examples of thepresent disclosure;

FIG. 47 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 48 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 49 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 50 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 51 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 52 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 53 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 54 illustrates an example flowchart illustrating example operationsin accordance with various examples of the present disclosure;

FIG. 55 illustrates an example infrastructure in accordance with variousexamples of the present disclosure;

FIG. 56 illustrates an example flowchart in accordance with variousexamples of the present disclosure;

FIG. 57 illustrates an example flowchart in accordance with variousexamples of the present disclosure;

FIG. 58 illustrates an example flowchart in accordance with variousexamples of the present disclosure;

FIG. 59 illustrates an example exploded view of an example sensorcartridge in accordance with various examples of the present disclosure;

FIG. 60A illustrates an example view of an example sensor cartridge inaccordance with various examples of the present disclosure;

FIG. 60B illustrates an example view of an example sensor cartridge inaccordance with various examples of the present disclosure;

FIG. 61A illustrates an example view of an example sensor cartridge inaccordance with various examples of the present disclosure;

FIG. 61B illustrates an example view of an example sensor cartridge inaccordance with various examples of the present disclosure;

FIG. 62 illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 63A illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 63B illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 63C illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 64A illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 64B illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 64C illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 65A illustrates a portion of an example sample testing device inaccordance with various examples of the present disclosure;

FIG. 65B illustrates a portion of an example sample testing device inaccordance with various examples of the present disclosure;

FIG. 66A illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 66B illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 66C illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 66D illustrates an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 67A illustrates an example component associated with an examplesample testing device in accordance with various examples of the presentdisclosure;

FIG. 67B illustrates an example component associated with an examplesample testing device in accordance with various examples of the presentdisclosure

FIG. 68 is an example diagram illustrating an example sample testingdevice in accordance with various examples of the present disclosure;

FIG. 69A illustrates an example perspective view associated with anexample sample testing device in accordance with various examples of thepresent disclosure;

FIG. 69B illustrates an example exploded view associated with an examplesample testing device in accordance with various examples of the presentdisclosure;

FIG. 70A illustrates an example perspective view of an example componentassociated with an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 70B illustrates an example top view of an example componentassociated with an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 70C illustrates an example side view of an example componentassociated with an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 70D illustrates an example side view of an example componentassociated with an example sample testing device in accordance withvarious examples of the present disclosure;

FIG. 71 illustrates an example diagram showing example raw responsesignals from an example sample testing device in accordance with variousexamples of the present disclosure;

FIG. 72 illustrates an example diagram showing example normalizedresponse signals from an example sample testing device in accordancewith various examples of the present disclosure;

FIG. 73A illustrates an example cross-sectional side view associatedwith at least a portion of an example sample testing device and anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 73B illustrates an example cross-sectional side view associatedwith at least a portion of an example sample testing device and anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 73C illustrates an example cross-sectional side view associatedwith at least a portion of an example sample testing device and anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 74 illustrates an example top view associated with at least aportion of an example sample testing device in accordance with variousexamples of the present disclosure;

FIG. 75A illustrates an example top view associated with at least aportion of an example sample testing device and an example laseralignment device in accordance with various examples of the presentdisclosure;

FIG. 75B illustrates an example top view associated with at least aportion of an example sample testing device and an example laseralignment device in accordance with various examples of the presentdisclosure;

FIG. 76A illustrates an example cross-sectional side view associatedwith at least a portion of an example sample testing device and anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 76B illustrates an example cross-sectional side view associatedwith at least a portion of an example sample testing device and anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 76C illustrates an example cross-sectional side view associatedwith at least a portion of an example sample testing device and anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 77 illustrates an example diagram showing example signals from anexample laser alignment device in accordance with various examples ofthe present disclosure;

FIG. 78 illustrates an example top view associated with at least aportion of an example sample testing device in accordance with variousexamples of the present disclosure;

FIG. 79A illustrates an example top view associated with at least aportion of an example sample testing device and an example laseralignment device in accordance with various examples of the presentdisclosure;

FIG. 79B illustrates an example top view associated with at least aportion of an example sample testing device and an example laseralignment device in accordance with various examples of the presentdisclosure;

FIG. 80 illustrates an example diagram showing an example flow channeland example non-viral indicator of biological content and example viralindicator of biological content in accordance with various examples ofthe present disclosure;

FIG. 81 illustrates an example diagram showing an example method inaccordance with various examples of the present disclosure;

FIG. 82 illustrates an example diagram showing an example method inaccordance with various examples of the present disclosure;

FIG. 83A illustrates an example perspective view of a sample testingdevice in accordance with various examples of the present disclosure;

FIG. 83B illustrates another example perspective view of a sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 83C illustrates an example side view of a sample testing device inaccordance with various examples of the present disclosure;

FIG. 83D illustrates an example top view of a sample testing device inaccordance with various examples of the present disclosure;

FIG. 83E illustrates an example cross sectional view of the sampletesting device in accordance with various examples of the presentdisclosure;

FIG. 84A illustrates an example perspective view of an aiming controlbase in accordance with various examples of the present disclosure;

FIG. 84B illustrates another example perspective view of the aimingcontrol base in accordance with various examples of the presentdisclosure;

FIG. 84C illustrates an example side view of the aiming control base inaccordance with various examples of the present disclosure;

FIG. 84D illustrates an example top view of the aiming control base inaccordance with various examples of the present disclosure;

FIG. 85A illustrates an example perspective view of a scan element inaccordance with various examples of the present disclosure;

FIG. 85B illustrates another example exploded view of the scan elementin accordance with various examples of the present disclosure;

FIG. 85C illustrates another example exploded view of the scan elementin accordance with various examples of the present disclosure;

FIG. 85D illustrates an example side view of the scan element inaccordance with various examples of the present disclosure;

FIG. 85E illustrates an example perspective view of a resonant flexcomponent in accordance with various examples of the present disclosure;

FIG. 86A illustrates an example perspective view of the waveguidecartridge in accordance with various examples of the present disclosure;

FIG. 86B illustrates an example perspective view of the waveguidecartridge in accordance with various examples of the present disclosure;

FIG. 86C illustrates an example exploded view of the waveguide cartridgein accordance with various examples of the present disclosure;

FIG. 86D illustrates an example top view of the waveguide cartridge inaccordance with various examples of the present disclosure;

FIG. 86E illustrates an example side view of the waveguide cartridge inaccordance with various examples of the present disclosure;

FIG. 86F illustrates an example bottom view of the waveguide cartridgein accordance with various examples of the present disclosure;

FIG. 87A illustrates an example perspective view of the waveguide inaccordance with various examples of the present disclosure;

FIG. 87B illustrates an example top view of the waveguide in accordancewith various examples of the present disclosure;

FIG. 87C illustrates an example side view of the waveguide in accordancewith various examples of the present disclosure;

FIG. 88A illustrates an example perspective view of the flow channelplate in accordance with various examples of the present disclosure;

FIG. 88B illustrates an example top view of the flow channel plate inaccordance with various examples of the present disclosure;

FIG. 88C illustrates an example cross-sectional view of the flow channelplate in accordance with various examples of the present disclosure;

FIG. 88D illustrates an example side view of the flow channel plate inaccordance with various examples of the present disclosure;

FIG. 89A illustrates an example perspective view of the cartridge bodyin accordance with various examples of the present disclosure;

FIG. 89B illustrates an example perspective view of the cartridge body8900 in accordance with various examples of the present disclosure;

FIG. 89C illustrates an example top view of the cartridge body inaccordance with various examples of the present disclosure;

FIG. 89D illustrates an example bottom view of the cartridge body inaccordance with various examples of the present disclosure;

FIG. 89E illustrates an example side view of the cartridge body inaccordance with various examples of the present disclosure;

FIG. 90A illustrates an example perspective view of the fluid cover inaccordance with various examples of the present disclosure;

FIG. 90B illustrates an example perspective view of the fluid cover inaccordance with various examples of the present disclosure;

FIG. 90C illustrates an example top view of the fluid cover inaccordance with various examples of the present disclosure;

FIG. 90D illustrates an example side view of the fluid cover inaccordance with various examples of the present disclosure;

FIG. 90E illustrates an example bottom view of the fluid cover inaccordance with various examples of the present disclosure;

FIG. 91A illustrates an example perspective view of the exhaust filterin accordance with various examples of the present disclosure;

FIG. 91B illustrates an example side view of the exhaust filter inaccordance with various examples of the present disclosure;

FIG. 91C illustrates an example bottom view of the exhaust filter inaccordance with various examples of the present disclosure;

FIG. 92A illustrates an example perspective view of the cartridge coverin accordance with various examples of the present disclosure;

FIG. 92B illustrates an example top view of the cartridge cover inaccordance with various examples of the present disclosure;

FIG. 92C illustrates an example side view of the cartridge cover inaccordance with various examples of the present disclosure;

FIG. 93A illustrates an example block diagram of an example system inaccordance with various examples of the present disclosure; and

FIG. 93B illustrates an example block diagram of an example system inaccordance with various examples of the present disclosure.

DETAILED DESCRIPTION OF THE INVENTION

Some examples of the present disclosure will now be described more fullyhereinafter with reference to the accompanying drawings, in which some,but not all examples of the disclosure are shown. Indeed, thesedisclosures may be embodied in many different forms and should not beconstrued as limited to the examples set forth herein; rather, theseexamples are provided so that this disclosure will satisfy applicablelegal requirements. Like numbers refer to like elements throughout.

The phrases “in one example,” “according to one example,” “in someexamples,” and the like generally mean that the particular feature,structure, or characteristic following the phrase may be included in atleast one example of the present disclosure and may be included in morethan one example of the present disclosure (importantly, such phrases donot necessarily refer to the same example).

If the specification states a component or feature “may,” “can,”“could,” “should,” “would,” “preferably,” “possibly,” “typically,”“optionally,” “for example,” “as an example,” “in some examples,”“often,” or “might” (or other such language) be included or have acharacteristic, that specific component or feature is not required to beincluded or to have the characteristic. Such component or feature may beoptionally included in some examples, or it may be excluded.

The word “example” or “exemplary” is used herein to mean “serving as anexample, instance, or illustration.” Any implementation described hereinas “exemplary” is not necessarily to be construed as preferred oradvantageous over other implementations.

The term “electronically coupled,” “electronically coupling,”“electronically couple,” “in communication with,” “in electroniccommunication with,” or “connected” in the present disclosure refers totwo or more elements or components being connected through wired meansand/or wireless means, such that signals, electrical voltage/current,data and/or information may be transmitted to and/or received from theseelements or components.

Interferometry refers to mechanisms and/or techniques that may cause oneor more waves, beams, signals, and/or the like (including, but notlimited to, optical light beams, electromagnetic waves, sound waves,and/or the like) to overlap, superimpose and/or interfere with oneanother. Interferometry may provide a basis for various methods,apparatus, and systems for sensing (including, but not limited to,detecting, measuring, and/or identifying) object(s), substance(s),organism(s), chemical and/or biological solution(s), and/or the like.

In accordance with examples of the present disclosure, various methods,apparatus, and systems for sensing (including, but not limited to,detecting, measuring, and/or identifying) object(s), substance(s),organism(s), chemical and/or biological solution(s), compounds, and/orthe like may be based on interferometry. For example, an“interferometry-based sample testing device” or a “sample textingdevice” may be an instrument that may output one or more measurementsbased on inference(s), superimposition(s) and/or overlap(s) of two ormore waves, beams, signals, and/or the like that may, for example,transmit energy (including, but not limited to, optical light beams,electromagnetic waves, sound waves, and/or the like).

In some examples, an interferometry-based sample testing device maycompare, contrast, and/or distinguish the positions or surfacestructures of two or more object(s), substance(s), organism(s), chemicaland/or biological solution(s), compounds, and/or the like. Referring nowto FIG. 1, an example block diagram illustrating an example sampletesting device 100 is shown. In some examples, the example sampletesting device 100 may be an interferometry-based sample testing device,such as, but not limited to an amplitude interferometer.

In the example shown in FIG. 1, the sample testing device 100 maycomprise a light source 101, a beam splitter 103, a reference surfacecomponent 105, a sample surface component 107, and/or an imagingcomponent 109.

In some examples, the light source 101 may be configured to produce,generate, emit, and/or trigger the production, generation, and/oremission of light. The example light source 101 may include, but is notlimited to, laser diodes (for example, violet laser diodes, visiblelaser diodes, edge-emitting laser diodes, surface-emitting laser diodes,and/or the like. Additionally, or alternatively, the light source 101may include, but not limited to, incandescent based light sources (suchas, but not limited to, halogen lamp, nernst lamp), luminescent basedlight sources (such as, but not limited to, fluorescence lamps),combustion based light sources (such as, but not limited to, carbidelamps, acetylene gas lamps), electric arc based light sources (such as,but not limited to, carbon arc lamps), gas discharge based light sources(such as, but not limited to, xenon lamp, neon lamps), high-intensitydischarge based light sources (HID) (such as, but not limited to,hydrargyrum quartz iodide (HQI) lamps, metal-halide lamps).Additionally, or alternatively, the light source 101 may comprise one ormore light-emitting diodes (LEDs). Additionally, or alternatively, thelight source 101 may comprise one or more other forms of natural and/orartificial sources of light.

In some examples, the light source 101 may be configured to generatelight having a spectral purity within a predetermined threshold. Forexample, the light source 101 may comprise a laser diode that maygenerate a single-frequency laser beam. Additionally, or alternatively,the light source 101 may be configured to generate light that havingvariances in spectral purity. For example, the light source 101 maycomprise a laser diode that may generate a wavelength-tunable laserbeam. In some examples, the light source 101 may be configured togenerate light having a broad optical spectrum.

In the example shown in FIG. 1, the light generated, emitted, and/ortriggered by the light source 101 may travel through a light path andarrive at the beam splitter 103. In some examples, the beam splitter 103may comprise one or more optical elements that may be configured todivide, split, and/or separate the light into two or more divisions,portions, and/or beams. For example, the beam splitter 103 may comprisea plater beam splitter. The plater beam splitter may comprise a glassplate. One or more surfaces of the flat glass plate may be coated withone or more chemical coatings. For example, the glass plate may becoated with a chemical coating such that at least a portion of the lightmay be reflected from the glass plate and at least another portion ofthe light may be transmitted through the glass plate. In some examples,the plater beam splitter may be positioned at a 45 degree angle withrespect to the angle of the input light. In some examples, the platerbeam splitter may be positioned at other angles.

While the description above provides example(s) of the beam splitter103, it is noted that the scope of the present disclosure is not limitedto the description above. In some examples, an example beam splitter 103may comprise one or more additional and/or alternative elements. Forexample, the beam splitter 103 may comprise a cube beam splitterelement. In this example, the cube beam splitter element may comprisetwo right angle prisms that are attached to one another. For example,one lateral or oblique surface of one right angle prism may be attachedto one lateral or oblique surface of the other right angle prism. Insome examples, that the two right angle prisms may form a cube shape.Additionally, or alternatively, the beam splitter 103 may comprise otherelements.

While the description above provides glass as an example material forthe beam splitter 103, it is noted that the scope of the presentdisclosure is not limited to the description above. In some examples, anexample beam splitter 103 may comprise one or more additional and/oralternative materials, such as, but not limited to, clear plastic,optical fiber materials, and/or the like. Additionally, oralternatively, the beam splitter 103 may comprise other materials.

In the example shown in FIG. 1, the beam splitter 103 may split thelight received from the light source 101 to at least two portions. Forexample, a first portion of the light may be reflected from the beamsplitter 103 may arrive at the reference surface component 105. A secondportion of the light may be transmitted through the beam splitter 103and arrive at the sample surface component 107.

In the present disclosure, the term “surface component” refers to aphysical structure that may be configured to allow at least a portion ofthe waves, beams, signals, and/or the like that it receives to passthrough and/or reflect at least a portions of the waves, beams, signals,and/or the like that it receives. In some examples, an example surfacecomponent may comprise one or more optical components, including one ormore reflective optical components and/or one or more transmissiveoptical components. For example, an example surface component maycomprise mirrors, retroreflectors, and/or the like. Additionally, oralternatively, the surface component may comprise one or more lenses,filters, windows, optical flats, prisms, polarizers, beam splitters,wave plates, and/or the like.

In the example shown in FIG. 1, the example sample testing device maycomprise two surface components: a reference surface component 105 and asample surface component 107. In some examples, the reference surfacecomponent 105 and/or the sample surface component 107 may comprise oneor more optical components such as, but not limited to, those describedabove. As will be described in detail herein, a reference medium may bein contact with at least a portion of a surface of the reference surfacecomponent 105, and/or a sample medium may be in contact with at least aportion of a surface of the sample surface component 107.

In the example shown in FIG. 1, the reference surface component 105 andthe sample surface component 107 each reflect at least a beam of thelight back to the beam splitter 103. For example, the reference surfacecomponent 105 may reflect at least a beam of the first portion of thelight back to the beam splitter 103. The sample surface component 107may reflect at least a beam of the second portion of the light back tothe beam splitter 103.

In some examples, the beam of light reflected from the reference surfacecomponent 105 and the beam of light reflected from the sample surfacecomponent 107 may be at least partially recombined and/or rejoined atthe beam splitter 103.

For example, the reference surface component 105 and the sample surfacecomponent 107 may be in a perpendicular arrangement with one another(such as the example shown in FIG. 1). In such an example, the beam oflight reflected from the reference surface component 105 and the beam oflight reflected from the sample surface component 107 may be recombinedby the beam splitter 103 into at least one beam of light that may traveltowards the imaging component 109. Additionally, or alternatively, thebeam splitter 103 may reflect at least some of the beam of light fromthe reference surface component 105 and the beam of light from thesample surface component 107 back to the light source 101.

In some examples, the recombination of beams of lights may occur at alocation different from the beam splitter 103. For example, the beamsplitter 103 may comprise one or more retroreflectors. In such anexample, the beam splitter 103 may recombine light from the referencesurface component 105 and the sample surface component 107 into two ormore beams of light.

In some examples, observed intensity of the recombined beam of lightvaries depending on the amplitude and phase differences between the beamof light reflected from the reference surface component 105 and the beamof light reflected from the sample surface component 107.

For example, phase difference between the beam of light reflected fromthe reference surface component 105 and the beam of light reflected fromthe sample surface component 107 may occur when the beams travel alongdifferent lengths and/or directions of optical paths, which may be dueto, for example, differences in form, texture, shape, tilt, and/orrefractive index between the reference surface component 105 and/or thesample surface component 107. As described further herein, therefractive index may change due to, for example, the presence of one ormore object(s), substance(s), organism(s), chemical and/or biologicalsolution(s), compounds, and/or the like on the reference surfacecomponent 105 and/or the sample surface component 107.

In some examples, if the beam of light reflected from the referencesurface component 105 and the beam of light reflected from the samplesurface component 107 are exactly out of phase at the point at whichthey are recombined, the two beams of lights may cancel each other out,and the resulting intensity may be zero. This is also referred to as“destructive interference.”

In some examples, if the beam of light reflected from the referencesurface component 105 and the beam of light reflected from the samplesurface component 107 are equal in intensity and are exactly in phase atthe point at which they are recombined, the resultant intensity may befour times that of either beam individually. This is also referred to as“constructive interference.”

Additionally, or alternatively, if the beam of light reflected from thereference surface component 105 and the beam of light reflected from thesample surface component 107 are spatially extended, there may be thevariations over a surface area in the relative phase of wave frontscomprising the two beams. For example, alternating regions ofconstructive interference and destructive interference may producealternating bright bands and dark bands, creating an interference fringepattern. Example details of the interference fringe pattern aredescribed and illustrated further herein.

In the example shown in FIG. 1, the example sample testing device 100may comprise an imaging component 109 that may be configured to detect,measure, and/or identify the interference fringe pattern. For example,the imaging component 109 may be positioned on the travel path of therecombined light beam form the beam splitter 103.

In the present disclosure, the term “imaging component” refers to adevice, instrument, and/or apparatus that may be configured to detect,measure, capture, and/or identify an image and/or information associatedwith an image. In some examples, the imaging component may comprise oneor more imagers and/or image sensors (such as an integrated 1D, 2D, or3D image sensor). Various examples of the image sensors may include, butare not limited to, a contact image sensor (CIS), a charge-coupleddevice (CCD), or a complementary metal-oxide semiconductor (CMOS)sensor, a photodetector, one or more optical components (e.g., one ormore lenses, filters, mirrors, beam splitters, polarizers, etc.),autofocus circuitry, motion tracking circuitry, computer visioncircuitry, image processing circuitry (e.g., one or more digital signalprocessors configured to process images for improved image quality,decreased image size, increased image transmission bit rate, etc.),verifiers, scanners, cameras, any other suitable imaging circuitry, orany combination thereof.

In the example shown in FIG. 1, the imaging component 109 may receivethe recombined light beam as the recombined light beam travels from thebeam splitter 103. In some examples, the imaging component 109 may beconfigured to generate imaging data associated with the received lightbeam. In some examples, a processing component may be electronicallycoupled to the imaging component 109, and may be configured to analyzethe imaging data to determine, for example but not limited to, thechange in refractive index associated with the reference surfacecomponent 105 and/or the sample surface component 107, example detailsof which are described herein.

Additionally, or alternatively, based on the imaging data generated bythe imaging component 109, a two-dimensional and/or a three-dimensionaltopographic image associated with the reference surface component 105and/or the sample surface component 107 may be generated. For example,the imaging data may correspond to an interference fringe pattern asreceived by the imaging component 109, example details of which aredescribed herein.

Additionally, or alternatively, based on the imaging data generated bythe imaging component 109, the processing component may determine thedifference between a first optical path length (between the samplesurface component 107 and the beam splitter 103) and a second opticalpath length (between the reference surface component 105 and the beamsplitter 103). For example, as described above, an interference fringepattern may occur when there is at least a partial phase differencebetween the beam of light reflected from the reference surface component105 and the beam of light reflected from the sample surface component107. The phase difference may occur when the beams of light travel indifferent optical path lengths and/or directions, which may due in partto the differences in form, texture, shape, tilt, and/or refractiveindex between the reference surface component 105 and/or the samplesurface component 107. As such, by analyzing the interference fringepattern, the processing component may determine the phase difference.Based on the phase difference, the processing component may determinethe path length difference between the first optical path length and thesecond optical path length based on, for example, the following formula:

λ=2πLn/φ

where φ corresponds to the phase difference, L corresponds to the pathlength difference, n corresponds to the refractive index, and λcorresponds to the wavelength.

While the description above provides example(s) of sample testingdevices based on interferometry, it is noted that the scope of thepresent disclosure is not limited to the description above. In someexamples, an example sample testing device may comprise one or moreadditional and/or alternative elements, and/or these elements may bearranged and/or positioned differently than those illustrated above.

In some examples, an example sample testing device may comprise parallelsurface components. For example, the reference surface component and thesample surface component may be positioned in a parallel arrangementwith one another, such that light beams may bounce between the referencesurface component and the sample surface component. For example, thelight beam may be reflected from the reference surface component to thesample surface component, which may then in turn be reflected from thesample surface component to the reference surface component. In someexamples, one or both of the sample surface component and the referencesurface component may be coated with reflective coatings on one or bothsides. In some examples, one or both of the reference surface componentand the sample surface component may have a transmission ratio that istargeted at one or more specific optical frequencies. For example, thesample surface component may allow light within an optical frequency topass through the sample surface component and arrive at an imagingcomponent. Based on the interference fringe pattern associated with thelight within the optical frequency, the sample testing device maydetect, measure, and/or identify changes in form, texture, shape, tilt,and/or refractive index between the reference surface component and/orthe sample surface component.

In some examples, an example sample testing device may utilizecounterpropagating beams of light. For example, the beam of light fromthe light source may be split by the beam splitter into two beams oflight that may travel at opposite directions following a common opticalpath. In some examples, one or more surface components may be positionedsuch that two beams of light form a closed loop. As an example, theexample sample testing device may comprise three surface elements. Thethree surface elements and the beam splitter may each be positioned at acorner of a square shape, such that the optical path of the beams oflight may form the square shape. In some examples, the sample testingdevice may provide different polarization states.

In some examples, additionally, or alternatively, an example sampletesting device may include one or more optical fibers in the beamsplitter. In some examples, an example sample testing device maycomprise optical fiber in the form of fiber coupler(s). For example, theexample sample testing device may comprise a fiber polarizationcontroller to control the polarization state of the light as it travelsthrough the fiber coupler. Additionally, or alternatively, the sampletesting device may comprise optical fiber in the form ofpolarization-maintaining fibers.

In some examples, an example sample testing device may comprise two ormore separate beam splitters. As an example, the first beam splitter maysplit the light beam into two or more portions, and the second beamsplitter may combine two or more portions of light beams into a singlelight beam. In such an example, the sample testing device may producetwo or more interference fringe patterns, and one of the beam splittersmay direct the two or more interference fringe patterns to one or moreimaging components. In some examples, the distance between the referencesurface component and the beam splitter and the distance between thesample surface component and the beam splitter may be different. In someexamples, the distance between the reference surface component and thebeam splitter and the distance between the sample surface component andthe beam splitter may be the same.

For example, the sample testing device may comprise a Mach-Zehnderinterferometer. In such examples, the optical path lengths in the twoarms of the Mach-Zehnder interferometer may be identical, or may bedifferent (for example, with an extra delay line). In some examples, thedistribution of optical powers at the two outputs of Mach-Zehnderinterferometer may depend on the difference in optical arm lengths andon the wavelength (or optical frequency), which may be adjusted (forexample, by slightly changing the position of the sample surfacecomponent and/or the reference surface component).

In some examples, the sample testing device may comprise a Fabry-Pérotinterferometer. In some examples, the sample testing device may comprisea Gires-Tournois interferometer. In some examples, the sample testingdevice may comprise a Michelson interferometer. In some examples, thesample testing device may comprise a Sagnac interferometer. In someexamples, the sample testing device may comprise a Sagnacinterferometer. Additionally, or alternatively, the sample testingdevice may comprise other types and/or forms of interferometers.

An example sample testing device in accordance with examples of thepresent disclosure may be implemented in one or more environments, usescase, applications, and/or purposes. As described above, therelationship between the phase difference φ, path length difference L,refractive index n, and the wavelength λ may be summarized by thefollowing formula:

$n = \frac{\lambda \times \varphi}{2 \times \pi \times L}$

In some examples, an example sample testing device in accordance withexamples of the present disclosure may be implemented to measure anoptical system performance, surface roughness, and/or surface contactcondition change (for example, a wet surface). Additionally, oralternatively, an example sample testing device in accordance withexamples of the present disclosure may be implemented to measuredeviations and/or degree of flatness of an optical surface.

In some examples, an example sample testing device in accordance withexamples of the present disclosure may be utilized to measure adistance, changes to a position, and/or a displacement. In someexamples, an example sample testing device in accordance with examplesof the present disclosure may be implemented to calculate a rotationalangle.

In some examples, an example sample testing device in accordance withexamples of the present disclosure may be utilized to measure thewavelength of a light source and/or the wavelength components of a lightsource. For example, the example sample testing device may be configuredas a wave meter to measure the wavelength of a laser beam. In someexamples, an example sample testing device in accordance with examplesof the present disclosure may be implemented to monitor changes in anoptical wavelength or frequency. Additionally, or alternatively, anexample sample testing device in accordance with examples of the presentdisclosure may be implemented to measure a linewidth of a laser.

In some examples, an example sample testing device in accordance withexamples of the present disclosure may be implemented to modulate thepower or phase of a laser beam. In some examples, an example sampletesting device in accordance with examples of the present disclosure maybe implemented to measure the chromatic dispersion of optical componentsas an optical filter.

In some examples, an example sample testing device in accordance withexamples of the present disclosure may be implemented to determine achange in the refractive index of a surface component. Referring now toFIG. 2, an example diagram showing an example sample testing device 200is illustrated. In some examples, the example sample testing device 200may be implemented to detect, measure, and/or identify refractive indexvariations and/or changes. In some examples, the example sample testingdevice 200 may be an interferometry-based sample testing device.

In the example shown in FIG. 2, the example sample testing device 200may comprise a waveguide 202. As used herein, the terms “waveguide,”“waveguide device,” “waveguide component” may be used interchangeably torefer to a physical structure that may guide waves, beams, signals,and/or the like (including, but not limited to, optical light beams,electromagnetic waves, sound waves, and/or the like). Example structuresof waveguide are illustrated herein.

In some examples, the waveguide 202 may comprise one or more layers. Forexample, the waveguide 202 may comprise an interface layer 208, awaveguide layer 206, and a substrate layer 204.

In some examples, the interface layer 208 may comprise material(s) suchas, but not limited to, glass, silicon oxide, polymer, and/or the like.In some examples, In some examples, the interface layer 208 may bedisposed on top of the waveguide layer 206 through various means,including but not limited to, mechanical means (for example, a bindingclip) and/or chemical means (such as the use of adhesive material (e.g.glue)).

In some examples, the waveguide layer 206 may comprise material such as,but not limited to, silicon oxide, silicon nitride, polymer, glass,optic fiber, and/or the like that may guide the guide waves, beams,signals, and/or the like as they propagate through the waveguide layer206. In some examples, the waveguide layer 206 may provide a physicalconstraint for the propagation such that minimal loss of energy isachieved. In some examples, the waveguide layer 206 may be disposed ontop of the substrate layer 204 through various means, including but notlimited to, mechanical means (for example, a binding clip) and/orchemical means (such as the use of adhesive material (e.g. glue)).

In some examples, the substrate layer 204 may provide mechanical supportfor the waveguide layer 206 and the interface layer 208. For example,the substrate layer 204 may comprise material such as, but not limitedto, glass, silicon oxide, and polymer.

In the example shown in FIG. 2, the light (for example, from a lightsource such as the light source as shown above in connection withFIG. 1) may be directed to, emitted through, and/or otherwise enter thewaveguide 202.

In some examples, the light may enter the waveguide 202 through a sidesurface of the waveguide 202. For example, as shown in FIG. 2, light mayenter the waveguide 202 through a side surface at the optical direction210, and the optical path of the light may be in a perpendiculararrangement with the side surface. In some examples, the light sourcemay be coupled to the side surface of the waveguide 202 through one ormore fastening mechanisms and/or attaching mechanisms, including notlimited to, chemical means (for example, adhesive material such asglues), mechanical means (for example, one or more mechanical fastenersor methods such as soldering, snap-fit, permanent and/or non-permeantfasteners), magnetic means (for example, through the use of magnet(s)),and/or suitable means.

While the description above provides an example of the direction wherethe light may enter the waveguide 202, it is noted that the scope of thepresent disclosure is not limited to the description above. In someexamples, the light may additionally, or alternatively, enter thewaveguide 202 at a different surface and/or at a different direction.For example, the light may enter the waveguide 202 from a top surface ofthe waveguide 202. Additionally, or alternatively, the light may enterthe waveguide 202 from a bottom surface of the waveguide 202. Additionaldetails are described herein.

Referring back to FIG. 2, the waveguide 202 may comprise a firstwaveguide portion 212.

In some examples, the first waveguide portion 212 may be configured toprovide, support, and/or cause a single transversal mode of the light asit travels through the first waveguide portion 212. As used herein, theterm “transverse mode,” “transversal mode,” or “vertical mode” refers toa pattern of waves, beams, and/or signals that may be in a perpendicularplane or arrangement to the propagation direction of the waves, beams,and/or signals. For example, the pattern may be associated with anintensity pattern of light radiation that is measured along a lineformed by a plane that is perpendicular to the propagation direction ofthe light, and/or a plane that is perpendicular to the first waveguideportion 212. In some examples, transverse modes may be categorized into,including but not limited to, transverse electromagnetic (TEM) modes,transverse electric (TE) modes, and transverse magnetic (TM) modes. Forexample, in the TEM modes, there is neither electric field nor magneticfield in the direction of light propagation. In the TE modes, there isno electric field in the direction of light propagation. In the TMmodes, there is no magnetic field in the direction of light propagation.

As an example, when laser light travels through a confined channel (suchas, but not limited to, the first waveguide portion 212), the laserlight may form one or more modes. For example, the laser light may forma peak mode 0. In some examples, the laser light may form modes inaddition to the peak mode 0. In some examples, the size and thethickness of a waveguide or waveguide portion may affect the number ofmodes of laser light as it propagates through the waveguide or thewaveguide portion.

In some examples, the first waveguide portion 212 may have a thicknesslower than the optical wavelength of the light that travels through thefirst waveguide portion 212. In some examples, the first waveguideportion 212 may have a thickness of a quarter of the wavelength. In someexamples, the first waveguide portion 212 may have a thickness between0.1 um and 0.2 um, which may limit the light to only one single mode. Insome examples, the thickness of the first waveguide portion 212 may beof other value(s).

While the description above provides example characteristics of thefirst waveguide portion 212 associated with the transverse mode, it isnoted that the scope of the present disclosure is not limited to thedescription above. In some examples, the first waveguide portion 212 maybe configured to provide, support, and/or cause two or more transversalmodes as the light travels through the first waveguide portion 212.Additionally, or alternatively, the first waveguide portion 212 may beconfigured to provide, support, and/or cause one or more longitudinalmodes. As used herein, the term “longitudinal mode,” or “horizontalmode” refers to a pattern of waves, beams, and/or signals that may be ina parallel plane or arrangement to the propagation direction of thewaves, beams, and/or signals. For example, the pattern may be associatedwith an intensity pattern of light radiation that is measured along aline formed by a plane that is parallel to the propagation direction ofthe light, and/or a plane that is perpendicular to the first waveguideportion 212. In some examples, the longitudinal mode may be categorizedinto different types.

Referring back to FIG. 2, the waveguide 202 may comprise a step portion214 and/or a second waveguide portion 216. In some examples, stepportion 214 may correspond to a portion of the waveguide 202 having anincreased thickness. For example, the thickness of the waveguide 202 mayincrease from the thickness of the first waveguide portion 212 to athickness of the second waveguide portion 216.

In some examples, the thickness of the second waveguide portion 216 maybe twice the thickness of the first waveguide portion 212. In someexamples, the ratio between the thickness of the first waveguide portion212 and the second waveguide portion 216 may be other value(s).

In the example shown in FIG. 2, the step portion 214 may comprise avertical surface that protrudes from and disposed perpendicular to a topsurface of the first waveguide portion 212. It is noted that the scopeof the present disclosure is not limited to this example only. In someexamples, the step portion 214 may comprise a curved surface.Additionally, or alternatively, the step portion 214 may comprise othershapes and/or in other forms.

As described above, the size and the thickness of a waveguide orwaveguide portion may affect the number of modes of laser light as itpropagates through the waveguide or the waveguide portion. In someexamples, due to the increased thickness from the first waveguideportion 212 to the second waveguide portion 216 (e.g. a verticalasymmetry), the modes of laser light traveling from the first waveguideportion 212 to the second waveguide portion 216 may change. For example,the first waveguide portion 212 may be configured to provide, support,and/or cause a single transversal mode of the light as it travelsthrough the first waveguide portion 212, and the second waveguideportion 216 may be configured to provide, support, and/or cause twotransversal modes of the light as it travels through the secondwaveguide portion 216.

In some examples, the thickness of the second waveguide portion 216 maybe larger than the thickness of the first waveguide portion 212. Assuch, the second waveguide portion 216 may allow more than one singlemode as described above.

While the description above provides an example structure of a waveguide202, it is noted that the scope of the present disclosure is not limitedto the description above. For example, the waveguide layer 206 maycomprise a first waveguide sub-layer and a second waveguide sub-layer.The second waveguide sub-layer may be disposed on a top surface of thefirst waveguide sub-layer, and the length of the second waveguidesub-layer may be shorter than the length of the first waveguidesub-layer. In such an example, the difference in lengths may increasethe step portion 214, which may increase the thickness of the waveguidelayer 206 from the thickness of the first waveguide sub-layer to thecombined thickness of the first waveguide sub-layer and the second firstwaveguide sub-layer.

While the description above provides an example of changing the modefrom a single transverse mode to two modes, it is noted that the scopeof the present disclosure is not limited to the description above. Forexample, the number of mode(s) associated with the first waveguideportion 212 may be more than one, and the number of modes associatedwith the second waveguide portion 216 may be any value that is more thanor less than the number of mode(s) associated with the first waveguideportion 212.

Continuing from the above example, two modes of light beams maypropagate thought the second waveguide portion 216. For example, a firstmode of light beam may have a different velocity than the second mode oflight beam. In some examples, the first mode of light beam and thesecond mode of light beam may interfere with one another (for example,modal interference). In some examples, as the two modes of light beamsexit the waveguide 202 in the optical direction 220, they may create aninterference fringe pattern, similar to those described above inconnection with FIG. 1.

As described in connection with FIG. 1, a change in the interferencefringe pattern may be due to phase difference change in the beams oflight. Continuing from the above example, a change in the interferencefringe pattern of the first mode of light and the second mode of lightmay be due to phases difference change between the first mode of lightand the second mode of light, which in turn may be due to optical pathlength changes between the first mode of light and the second mode oflight.

In some examples, the optical path length changes may be due to a changein the physical structure(s), parameter(s) and/or characteristic(s)associated with the waveguide 202, such as, but not limited to, a changein the refractive index associated with a surface of the waveguide 202.

For example, the refractive index associated with the surface of thewaveguide layer 206 that is exposed through the sample opening 222 ofthe interface layer 208 may change due to, for example but not limitedto, a change in the evanescent field. Referring now to FIG. 3, anexample diagram illustrating such a change is shown.

In the example shown in FIG. 3, the example sample testing device 300may comprise a waveguide 301, similar to the waveguide 202 describedabove in connection with FIG. 2. For example, the waveguide 202 maycomprise a substrate layer 303, a waveguide layer 305, and an interfacelayer 307, similar to the substrate layer 204, the waveguide layer 206,and the interface layer 208 described above in connection with FIG. 2.

In some examples, a sample medium may be placed on the surface of thewaveguide layer 305 that is exposed through the sample opening of theinterface layer 307 and/or may be in contact with the surface of thewaveguide layer 305. As used herein, the term “sample medium” refers toobject(s), substance(s), organism(s), chemical and/or biologicalsolution(s), molecule(s), and/or the like that a sample testing devicein accordance with examples of the present disclosure may be configuredto detect, measure, and/or identify. For example, the sample medium maycomprise analyte (for example, in the form of a biochemical sample), andthe sample testing device 300 may be configured to detect, measure,and/or identify whether the analyte comprises a particular substance ororganism.

In some examples, the sample medium may be placed on the surface of thewaveguide layer 305 via physical and/or chemical attraction, such as butnot limited to, through a flow channel described herein, gravitationalforce, surface tension, chemical bonding, and/or the like. For example,the sample testing device 300 may be configured to detect the presenceof one or more particular viruses (for example, coronavirus such assevere acute respiratory syndrome coronavirus 2 (SARS-CoV-2)) in asample medium. In some examples, the sample testing device 300 maycomprise antibodies attached to a surface of the waveguide layer 305,and the antibodies may correspond to the one or more particular virusesthat the sample testing device 300 is configured to detect. A chemicalor biological reaction between the antibody and the virus may cause achange in the evanescent field, which in turn may change the refractiveindex of the chemical in contact with surface of waveguide layer 305(for example, but not limited to, the interface layer 307).

Continuing from the above SARS-CoV-2 example, antibody for SARS-CoV-2(for example but not limited to SARS-CoV polyclonal antibodies) may beattached to surface of the waveguide layer 305 through physical and/orchemical attraction, such as but not limited to, gravitational force,surface tension, chemical bonding, and/or the like. When the samplemedium is placed on the surface of the waveguide layer 305 through theopening of the interface layer 307, the antibody for SARS-CoV-2 mayattract molecules of the SARS-CoV-2 virus, if present in the samplemedium.

In circumstances where molecules of the SARS-CoV-2 virus is present inthe sample medium, the antibody for SARS-CoV-2 may pull the moleculestowards the surface of the waveguide layer 305. As described above, thechemical and/or biological reaction between the antibody and the virusmay cause a change in the evanescent field, which may in turn change therefractive index of the chemical in contact with surface of waveguidelayer 305 (for example, but not limited to, the interface layer 307).

In circumstances where molecules of the SARS-CoV-2 virus are not presentin the sample medium, there may not be any chemical and/or biologicalreaction between the antibody and the virus, and therefore theevanescent field and the refractive index of the chemical close to thesurface of the waveguide layer 305 may not change (for example, but notlimited to, the interface layer 307).

As described above, a change in the refractive index of the chemical incontact with the surface of the waveguide layer 305 (for example, butnot limited to, the interface layer 307) may result in a change of theoptical path length of the light as the light propagates through thewaveguide layer 305. Further, similar to those described above inconnection with FIG. 2, the light that exits the waveguide layer 305 maycomprise two (or more) modes and may create an interference fringepattern. As such, a change in the interference fringe pattern mayindicate a change in the refractive index, which in turn may indicatethe presence of object(s), substance(s), organism(s), chemical and/orbiological solution(s) that the sample testing device 300 is configuredto detect, measure, and/or identify (for example, the SARS-CoV-2 virus).

Some examples of the present disclosure may overcome various technicalchallenges. For example, an example sample testing device may comprisean integrated optical component. Referring now to FIG. 4 and FIG. 5,example views of an example sample testing device 800 in accordance withexamples of the present disclosure are illustrated. In some examples,the example sample testing device 800 may be an interferometry-basedsample testing device.

In the example shown in FIG. 4 and FIG. 5, the example sample testingdevice 800 may comprise a light source 820, a waveguide 802, and/or anintegrated optical component 804.

Similar to the light source 101 described above in connection with FIG.1, the light source 820 of the sample testing device 800 may beconfigured to produce, generate, emit, and/or trigger the production,generation, and/or emission of light (including but not limited to alaser light beam). The example light source 820 may include, but notlimited to, laser diodes (for example, violet laser diodes, visiblelaser diodes, edge-emitting laser diodes, surface-emitting laser diodes,and/or the like). Additionally, or alternatively, the light source 820may include, but is not limited to, incandescent based light sources(such as, but not limited to, halogen lamp, nernst lamp), luminescentbased light sources (such as, but not limited to, fluorescence lamps),combustion based light sources (such as, but not limited to, carbidelamps, acetylene gas lamps), electric arc based light sources (such as,but not limited to, carbon arc lamps), gas discharge based light sources(such as, but not limited to, xenon lamp, neon lamps), high-intensitydischarge based light sources (HID) (such as, but not limited to,hydrargyrum quartz iodide (HQI) lamps, metal-halide lamps).Additionally, or alternatively, the light source 820 may comprise one ormore light-emitting diodes (LEDs). Additionally, or alternatively, thelight source 820 may comprise one or more other forms of natural and/orartificial sources of light.

Referring back to FIG. 4 and FIG. 5, the light generated by the lightsource 820 may travel along an optical path and arrive at the integratedoptical component 804. In some examples, the integrated opticalcomponent 804 may collimate, polarize, and/or couple light into thewaveguide 802. For example, the integrated optical component 804 may bean integrated collimator, polarizer, and coupler.

Referring now to FIG. 5, an example structure of the integrated opticalcomponent 804 is shown. In the example shown in FIG. 5, the integratedoptical component 804 may comprise at least a collimator 816 and a beamsplitter 818.

In some examples, the collimator 816 may comprise one or more opticalcomponents to redirect and/or adjust the direction of the light that itreceives. As an example, the optical component(s) may comprise one ormore optical collimating lens and/or imaging lens, such as but notlimited to one or more lens having spherical surface(s), one or morelens having parabolic surface(s) and/or the like. For example, theoptical component(s) may comprise silicon meniscus lens.

For example, beams of light received by the collimator 816 may eachtravel along an optical direction that may not be parallel with theoptical direction of another beam or light. As the beams of light travelthrough the collimator 816, the collimator 816 may collimate beams oflight into parallel or approximately parallel beams of light.Additionally, or alternatively, the collimator 816 may narrow the lightbeams by either causing the direction of the light beams to become morealigned in a specification direction and/or causing the spatialcross-section of the light beams to become smaller.

Referring back to FIG. 4 and FIG. 5, the collimator 816 may be attachedto an oblique surface of the beam splitter 818.

Similar to the beam splitter 103 described above in connection with FIG.1, the beam splitter 818 of the example sample testing device 800 maycomprise one or more optical elements that may be configured to divide,split, and/or separate the light into two or more divisions, portions,and/or beams.

In the examples shown in FIG. 5, the beam splitter 818 may comprise afirst prism 812 and a second prism 814. In some examples, each of thefirst prism 812 and the second prism 814 may be a right angle prism.

In some examples, the second prism 814 may be attached to a firstoblique surface of the first prism 812 through various means, includingbut not limited to, mechanical means and/or chemical means. For example,adhesive material (such as glue) may be applied on the first obliquesurface of the first prism 812, such that the first prism 812 may bebonded with the second prism 814. Additionally, or alternatively, thesecond prism 814 may be cemented together with the first prism 812.

In some examples, the collimator 816 may be attached to a second obliquesurface of the first prism 812 through various means, including but notlimited to, mechanical means and/or chemical means. For example,adhesive material (such as glue) may be applied on the second obliquesurface of the first prism 812, such that collimator 816 may be bondedwith the first prism 812. Additionally, or alternatively, the collimator816 may be cemented together with the first prism 812.

As described above, the collimator 816 may collimate beams of light intoparallel or approximately parallel beams of light, which may in turn bereceived by the beam splitter 818. In some examples, the light receivedby the beam splitter 818 may be split into two or more portions as ittravels through the oblique surface of the first prism 812. For example,the oblique surface of the first prism 812 may reflect a portion of thelight and may allow another portion of the light to pass through. Insome examples, a hypotenuse surface of the first prism 812 and/or thesecond prism 814 may comprise a chemical coating. In some examples, thefirst prism 812 and the second prism 814 may together form a cube shape.

In some examples, the beam splitter 818 may be a polarization beamsplitter. As used herein, the polarization beam splitter may split thelight into one or more portions, and each portion may have a differentpolarization. In some examples, by implementing a polarization beamsplitter, one (or, in some examples, two or more) beam with selectedpolarization may be transmitted into the waveguide 802. As such, thebeam splitter 818 may server as a polarizer.

In some examples, the angle of the first prism 812 and the second prism814 may be calculated to redirect the light into the waveguide based onthe acceptance efficiency for directly light into the waveguide 802. Forexample, the first prism 812 and the second prism 814 may each bearranged in a 45 degrees angle with the waveguide 802, as shown in FIG.5. Additionally, or alternatively, the angle of the first prism 812 andthe second prism 814 may be arranged based on other values to improvethe acceptance efficiency.

While the description above provides an example of beam splitter 818, itis noted that the scope of the present disclosure is not limited to thedescription above. In some examples, an example beam splitter 818 maycomprise one or more additional and/or alternative elements. Forexample, the beam splitter 103 may comprise a plater beam splitter,similar to those described above in connection the beam splitter 103 ofwith FIG. 1.

In some examples, the size of the beam splitter 818 (for example, width,length, and/or height) may be 5 millimeters. In some examples, the sizeof the beam splitter 818 may be other value(s).

Referring back to FIG. 4 and FIG. 5, the integrated optical component804 may be coupled to the waveguide 802. For example, a surface of theintegrated optical component 804 may be attached to a surface of thewaveguide 802 through various means, including but not limited to,mechanical means and/or chemical means. For example, adhesive material(such as glue) may be applied on a surface of the waveguide 802 and/oron a surface of the integrated optical component 804, such that thewaveguide 802 may be bonded with the integrated optical component 804.Additionally, or alternatively, the waveguide 802 may be cementedtogether with the integrated optical component 804.

In some examples, the waveguide 802 may comprise one or more layers. Forexample, the waveguide 802 may comprise an interface layer 806, awaveguide layer 808, and a substrate layer 810, similar to the interfacelayer 208, the waveguide layer 206, and the substrate layer 204described above in connection with FIG. 2. For example, the interfacelayer 806 may be disposed on a top surface of the waveguide layer 808.

In some examples, the interface layer 208 may comprise an opening forreceiving the waveguide 802. For example, the opening of the interfacelayer 208 may correspond to the shape of the integrated opticalcomponent 804. In some examples, the integrated optical component 804may be securely positioned on a top surface of the waveguide layer 808through the opening of the interface layer 208, such that the integratedoptical component 804 may be in direct contact with the waveguide layer808. In some examples, layer(s) (for example, a coupler layer) may beimplemented between the integrated optical component 804 and thewaveguide layer 808.

In the example shown in FIG. 4 and FIG. 5, the interface layer 806 maycomprise a sample opening 822. Similar to those described above inconnection with FIG. 2, the sample opening 822 may receive a samplemedium. In some examples, the integrated optical component 804 may bedisposed on and/or attached to a top surface of the interface layer 806,input light may be provided to the waveguide layer 808 through theinterface layer 806. In such examples, input light may be provided to atop surface of the waveguide 802 (instead of through a side surface).

In some examples, the interface layer 806 may comprise an output opening824. In some examples, the output opening 824 may allow light to exitthe waveguide 802. Similar to those described in connection with FIG. 2,the waveguide 802 may cause two modes of light to exit the waveguide802, resulting in an interference fringe pattern.

Referring back to FIG. 4 and FIG. 5, the example sample testing device800 may comprise a lens component 826 disposed on the top surface of theinterface layer 806. For example, the lens component 826 may at leastpartially overlap with the output opening 824 of the interface layer806, such that light exiting the waveguide 802 may pass through the lenscomponent 826.

In some examples, the lens component 826 may comprise one or moreoptical imaging lens, such as but not limited to one or more lens havingspherical surface(s), one or more lens having parabolic surface(s)and/or the like. In some examples, the lens component 826 may redirectand/or adjust the direction of the light that exits from the waveguide802 towards an imaging component 828. In some examples, the imagingcomponent 828 may be disposed on a top surface of the lens component826.

In some examples, the lens component 826 may be positioned at a distancefrom the output opening 824. For example, the lens component 826 may besecurely supported by a supporting structure (for example, a supportinglayer) such that it is positioned on top of the output opening 824 andwithout in contact with the output opening 824. In some examples, thelens component 826 may at least partially overlap with the outputopening 824 of the interface layer 806 in an output light direction,such that light output from the waveguide 802 may travel through thelens component 826.

In some examples, the imaging component 828 may be positioned at adistance from the lens component 826. For example, the imaging component828 and/or the lens component 826 may each be securely supported by asupporting structure (for example, a supporting layer) such that theimaging component 828 is positioned on top of the lens component 826 andwithout in contact with the lens component 826. In some examples, theimaging component 828 may at least partially overlap with the lenscomponent 826 in an output light direction, such that light output fromthe waveguide 802 may travel through the lens component 826 and arriveat the imaging component 828.

Similar to the imaging component 109 described above in connection withFIG. 1, the imaging component 828 may be configured to detect aninterference fringe pattern. For example, the imaging component 109 maycomprise one or more imagers and/or image sensors (such as an integrated1D, 2D, or 3D image sensor). Various examples of the image sensors mayinclude, but are not limited to, a contact image sensor (CIS), acharge-coupled device (CCD), or a complementary metal-oxidesemiconductor (CMOS) sensor, a photodetector, one or more opticalcomponents (e.g., one or more lenses, filters, mirrors, beam splitters,polarizers, etc.), autofocus circuitry, motion tracking circuitry,computer vision circuitry, image processing circuitry (e.g., one or moredigital signal processors configured to process images for improvedimage quality, decreased image size, increased image transmission bitrate, etc.), verifiers, scanners, cameras, any other suitable imagingcircuitry, or any combination thereof.

In the example shown in FIG. 4 and FIG. 5, the integrated opticalcomponent 804 may provide input light to a top surface of the waveguide802, and, after the light travels through the waveguide 802, it may exitfrom the top surface of the waveguide 802. By directing the optical pathof input light to and output light from the waveguide 802 with directlycoupling to the surface of the waveguide layer 808 through the openingsof the interface layer 806 and/or contact with the best match couplerlayer in between, light efficiency and fringe calculation accuracy maybe improved, which may improve the performance of the sample testingdevice 800 and reduce the size of the sample testing device 800.

In some examples, interferometry-based sample testing devices may usecoupler(s) or grating mechanism(s) to couple an light source and anwaveguide. However, the use of coupler(s) or grating mechanism(s) maynegatively affect the light efficiency of light that travels from thelight source to the waveguide. Additionally, implementing coupler(s) orgrating mechanism(s) to couple a light source to an waveguide mayrequire additional manufacturing processes, increase the cost associatedwith manufacturing the sample testing device, and increase the size ofthe sample testing device.

Some examples of the present disclosure may overcome various technicalchallenges. For example, an example sample testing device may comprise alens array. Referring now to FIG. 6 and FIG. 7, an example sampletesting device 900 is illustrated.

In the example shown in FIG. 6 and FIG. 7, the example sample testingdevice 900 may comprise a light source 901, a waveguide 905, and/or anintegrated optical component 903, similar to the light source 820, thewaveguide 802, and the integrated optical component 804 described abovein connection with FIG. 4 and FIG. 5.

For example, the light source 901 may be configured to produce,generate, emit, and/or trigger the production, generation, and/oremission of light. The light may be received by the integrated opticalcomponent 903, which may direct the light to the waveguide 905. Forexample, the integrated optical component 903 may comprise at least onecollimator and at least one beam splitter, similar to the integratedoptical component 804 described above in connection with FIG. 4 and FIG.5.

Referring back to FIG. 6 and FIG. 7, the waveguide 905 may cause twomodes of light to exit the waveguide 905 and be received by the imagingcomponent 907, similar to those described above in connection with FIG.4 and FIG. 5. For example, the imaging component 907 may comprise acomplementary metal-oxide semiconductor (CMOS) sensor that may detectthe interference fringe pattern of light exit from the waveguide 905.

Similar to the sample testing device 800 described above in connectionwith FIG. 4 and FIG. 5, the sample testing device 900 illustrated inFIG. 6 and FIG. 7 may direct the optical path of input light to andoutput light from the waveguide 905 through a top surface of thewaveguide 905. In FIG. 4 and FIG. 5, the light source 820 may emit lightin an optical direction that is parallel to the top surface of thewaveguide 802. In FIG. 6 and FIG. 7, the light source 901 may emit lightin an optical direction that is perpendicular to the top surface of thewaveguide 905. Regardless of the direction of the light emitted by thelight source, the integrated optical component may direct the inputlight to the waveguide through a top surface of the waveguide.

In some examples, the integrated optical component 903 and/or theimaging component 907 may be coupled to the waveguide 905 throughcoupler(s) or grating mechanism(s). However, as described above,coupler(s) and grating mechanism(s) may require additional manufacturingprocesses, increase the cost associated with manufacturing the sampletesting device, and increase the size of the sample testing device. Insome examples, the integrated optical component 903 and/or the imagingcomponent 907 may be coupled to the waveguide 905 through a lens array.Referring now to FIG. 8, an example diagram illustrating an example lensarray is shown.

In the example shown in FIG. 8, an example sample testing device maycomprise an example integrated optical component 1004 coupled to thewaveguide 1006 through an example lens array 1008. In some examples, thelens array 1008 may direct light received from the integrated opticalcomponent 1004 to the waveguide 1006. In some examples, the integratedoptical component 1004 may be the same or similar to the integratedoptical component 804 described above in connection with FIG. 8. Forexample, the integrated optical component 1004 may comprise one or morecollimator(s) and/or polarizer(s).

In some examples, the lens array 1008 may comprise at least one microlens array. As used herein, the term “micro lens” or microlens” refersto a transmissive optical device (for example, an optical lens) having adiameter less than a predetermined value. For example, an example microlens may have a diameter less than one millimeter (for example, tenmicrometers). The small size of the micro lens may provide the technicalbenefit of improved optical quality.

As use herein, the term “micro lens array” or “microlens array” refersto an arranged set of micro lens. For example, the arranged set of microlens may form a one-dimensional or two-dimensional array pattern. Eachmicro lens in the array pattern may serve to focus and concentrate thelight, thereby may improve the light efficiency. Examples of the presentdisclosure may encompass various types of micro lens array, details ofwhich are described herein.

In some examples, a micro lens array may redirect and/or couple thelight into waveguide 905 with the best efficiency. Referring back toFIG. 8, the example lens array 1008 may comprise at least one opticallens. In some examples, each optical lens of the lens array 1008 mayhave a shape similar to a prism shape. For example, each optical lens ofthe lens array 1008 may be a right angle prism lens. In such an example,each of the optical lens may be arranged in a parallel arrangement withanother optical lens without overlap or gaps.

In some examples, the lens array 1008 may comprise lens having differentshapes and/or pitches in two or more directions. For example, a firstshape of a first optical lens of the micro lens array may be differentfrom a second shape of a second optical lens of the micro lens array.

As an example, along the direction of the light that transmits throughthe waveguide 905, lens of lens array 1008 may have a surface shape of aprism, and the pitch for each lens may be determined based on, forexample, the micro lens height and prism angle. As an example, alonganother direction (for example, the cross direction of the light thattransmits through the waveguide 905, the surface of the lens array 1008may be curved to converge the light into the center region of thewaveguide, which may improve the collection efficiency. In this example,the pitch in this direction may be determined based on the height of themicro lens and the surface curvature associated with the lens.

In some examples, the micro lens array may have different arrangementsalong a waveguide light transfer direction to achieve light uniformity.In some examples, a first surface curvature of the first optical lensmay be different from a second surface curvature of the second opticallens in the waveguide light transfer direction. For example, thedifference between the surface curvatures of lens in the micro lensarray may create different lens power. In some examples, the lens powerdifference may in turn change the light collection efficiency. Forexample, with different micro lens surface curvature, the lightcollection efficiency may be changed. In some examples, an uniformsurface curvature micro lens may create uniform light collectionefficiency along, for example, the direction of light as it transmitsthrough the waveguide. In some examples, the different micro lens powerarrangements may create non-uniform light collection efficiency tocompensate for the light intensity change due to, for example, the lossenergy along the waveguide. In some examples, the different surfacepower may create different pitches with the uniform height micro lensarray.

While the description above provides example shapes and pitches of amicro lens array, it is noted that the scope of the present disclosureis not limited to the description above. In some examples, an examplemicro lens array may comprise one or more shapes and/or pitches.

While the description above provides an example pattern of an examplemicro lens array, it is noted that the scope of the present disclosureis not limited to the description above. In some examples, an examplemicro lens array may comprise one or more additional and/or alternativeelements. For example, one or more optical lens of the micro lens arraymay be in shape(s) other than a prism shape. Additionally, oralternatively, one or more optical lenses of the micro lens array may beplaced in a hexagonal array.

In some examples, the lens array 1008 may be disposed on the firstsurface of the waveguide 1006 through a wafer process with directetching or etching with post thermal forming. For example, directetching with grey scale mask may create micro lens with any surfaceshape, such as spherical lens or micro prism. Additionally, oralternatively, thermal forming may form spherical surface lenses.Additionally, or alternatively, other manufacturing processes and/ortechniques may be implemented for the disposed the lens array disposedon the surface of the waveguide 1006.

While the description above provides an example of coupling mechanismbetween the integrated optical component 1004 and the waveguide 1006, itis noted that the scope of the present disclosure is not limited to thedescription above. In some examples, one or more additional and/oralternative elements may be implemented to provide a coupling mechanism.For example, a single micro lens may be implemented to couple theintegrated optical component 1004 with the waveguide 1006.

Referring now to FIG. 9, an example diagram illustrating an example lensarray is shown. In particular, an example sample testing device maycomprise an example imaging component 1101 coupled to the waveguide 1105through an example lens array 1103. In some examples, the lens array1103 may direct light received from the waveguide 1006 to the imagingcomponent 1101.

Similar to the example lens array 1008 described above in connectionwith FIG. 8, the example lens array 1103 may comprise at least oneoptical lens. In some examples, each optical lens of the lens array 1103may have a shape similar to a prism shape. For example, each opticallens of the lens array 1103 may be a right angle prism lens. In such anexample, each of the optical lens may be arranged in a parallelarrangement with another optical lens without overlap or gaps.

In some examples, a lens component (for example, lens component 826described above in connection with FIG. 8) may be positioned between thelens array 1103 (for example, micro lens array) and the imagingcomponent 1101.

While the description above provides an example pattern of an examplemicro lens array, it is noted that the scope of the present disclosureis not limited to the description above. In some examples, an examplemicro lens array may comprise one or more additional and/or alternativeelements. For example, one or more optical lens of the micro lens arraymay be in shape(s) other than a prism shape. Additionally, oralternatively, one or more optical lens of the micro lens array may beplaced in a hexagonal array.

In some examples, the lens array 1103 may be disposed on the firstsurface of the waveguide 1105 through a wafer process with directetching or etching with post thermal forming. For example, directetching with grey scale mask may create micro lens with any surfaceshape, such as spherical lens or micro prism. Additionally, oralternatively, thermal forming may form spherical surface lenses.Additionally, or alternatively, other manufacturing processes and/ortechniques may be implemented for the disposed the lens array disposedon the surface of the waveguide 1105.

While the description above provides an example of coupling mechanismbetween the example imaging component 1101 and the waveguide 1105, it isnoted that the scope of the present disclosure is not limited to thedescription above. In some examples, one or more additional and/oralternative elements may be implemented to provide a coupling mechanism.For example, a single micro lens may be implemented to couple exampleimaging component 1101 with the waveguide 1105.

In some examples, the sample opening of an interferometry-based sampletesting devices may be less than 0.1 millimeter. As such, it may betechnically challenging to deliver the sample medium to the waveguidelayer through the sample opening.

Some examples of the present disclosure may overcome various technicalchallenges. For example, an example sample testing device may comprisean opening layer and/or a cover layer. Referring now to FIGS. 10 and 11,example views of an example sample testing device 1200 in accordancewith examples of the present disclosure are illustrated.

In the example shown in FIG. 10 and FIG. 11, the example sample testingdevice 1200 may comprise a waveguide. In some examples, the waveguidemay comprise one or more layers, such as a substrate layer 1202, awaveguide layer 1204, and an interface layer 1206, similar to theinterface layer 208, the waveguide layer 206, and the substrate layer204 described above in connection with FIG. 2.

In some examples, the waveguide may have a sample opening on a firstsurface. For example, as shown in FIG. 10 and FIG. 11, the interfacelayer 1206 of the waveguide may comprise a sample opening 1216. Similarto the sample opening 222 described above in connection with FIG. 2, thesample opening 1216 may be configured to receive a sample medium.

In some examples, the sample testing device 1200 may comprise an openinglayer disposed on the first surface of the waveguide. For example, asshown in FIG. 10 and FIG. 11, the opening layer 1208 may be disposed ona top surface of the interface layer 1206 of the waveguide.

In some examples, the opening layer 1208 may comprise a first opening1214. In some examples, the first opening 1214 may at least partiallyoverlap with the sample opening 1216 of the interface layer 1206. Forexample, as shown in FIG. 11, the first opening 1214 of the openinglayer 1208 may cover the sample opening 1216 of the interface layer1206. In some examples, the first opening 1214 of the opening layer 1208may have a diameter larger than the diameter of the sample opening 1216of the interface layer 1206.

In some examples, the opening layer 1208 may be formed with siliconwafer process as an additional oxide layer. In some examples, the firstopening 1214 may be etched.

In the example shown in FIG. 10 and FIG. 11, the example sample testingdevice 1200 may comprise a cover layer 1210.

In some examples, the cover layer 1210 may be placed on in the packagingprocess with polymer molding, such as PMMA.

In some examples, the cover layer 1210 may be coupled to the waveguideof the sample testing device 1200. In some examples, the couplingbetween the cover layer 1210 and the waveguide may be implemented via atleast one sliding mechanism. For example, the cross-section of the coverlayer 1210 may be in a shape similar to the letter “n.” Sliding guardsmay be attached to an inner surface of each leg of cover layer 1210, andcorresponding rail tacks may be attached on one or more side surfaces ofthe waveguide (for example, a side surface of the interface layer 1206).As such, the cover layer 1210 may slide between a first position and asecond position as defined by the sliding guards and the rail tacks.

While the description above provides an example of sliding mechanism, itis noted that the scope of the present disclosure is not limited to thedescription above. In some examples, an example sliding mechanism maycomprise one or more additional and/or alternative elements and/orstructures. For example, the cover layer 1210 may comprise a t-slotslider disposed on a bottom surface of the cover layer 1210, and theinterface layer 1206 may comprise a corresponding t-slot track disposedon a top surface of the interface layer 1206.

In some examples, the sliding mechanism may be in contact with thesubstrate layer 1202 and/or the interface layer 1206, such that it maynot be in contact with the waveguide layer 1204. In some examples, therewill be no optical characteristics change of the waveguide layer 1204due to the addition of sliding mechanism.

In some examples, the cover layer 1210 may comprise a second opening1212. In some examples, the second opening 1212 of the cover layer 1210may be in a circular shape. In some examples, the second opening 1212 ofthe cover layer 1210 may be in other shapes.

In some examples, the size of the second opening 1212 (for example, adiameter or a width) may be between 0.5 millimeters and 2.5 millimeters.In comparison, the size of the sample opening 1216 (for example, adiameter or a width) may be less than 0.1 millimeters. In some examples,the size of the second opening 1212 and/or the size of the sampleopening 1216 may have other value(s).

As described above, the cover layer 1210 may be coupled to the waveguideof the sample testing device 1200 via at least one sliding mechanisms.In such an example, the cover layer 1210 may be positioned on top of theopening layer 1208, and may be movable between a first position and asecond position.

FIG. 10 and FIG. 11 illustrates an example where the cover layer 1210 isat the first position. As shown, when the cover layer 1210 is at thefirst position, the second opening 1212 of the cover layer 1210 mayoverlap with the first opening 1214 of the opening layer 1208.

Referring now to FIG. 12 and FIG. 13, example views of an example sampletesting device 1300 in accordance with examples of the presentdisclosure are illustrated.

In the example shown in FIG. 12 and FIG. 13, the example sample testingdevice 1300 may comprise a waveguide. In some examples, the waveguidemay comprise one or more layers, such as a substrate layer 1301, awaveguide layer 1303, and an interface layer 1305, similar to thesubstrate layer 1202, the waveguide layer 1204, and the interface layer1206 described above in connection with FIG. 10 and FIG. 11.

In some examples, the waveguide may have a sample opening on a firstsurface. For example, as shown in FIG. 12 and FIG. 13, the interfacelayer 1305 of the waveguide may comprise a sample opening 1315. Similarto the sample opening 1216 described above in connection with FIG. 10and FIG. 11, the sample opening 1315 may be configured to receive asample medium.

In some examples, the sample testing device 1300 may comprise an openinglayer disposed on the first surface of the waveguide. For example, asshown in FIG. 12 and FIG. 13, the opening layer 1307 may be disposed ona top surface of the interface layer 1305 of the waveguide.

In some examples, the opening layer 1307 may comprise a first opening1313. In some examples, the first opening 1313 may at least partiallyoverlap with the sample opening 1315 of the interface layer 1305. Forexample, as shown in FIG. 13, the first opening 1313 of the openinglayer 1307 may cover the sample opening 1315 of the interface layer1305. In some examples, the first opening 1313 of the opening layer 1307may have a diameter larger than the diameter of the sample opening 1315of the interface layer 1305.

In the example shown in FIG. 12 and FIG. 13, the example sample testingdevice 1300 may comprise a cover layer 1309, similar to the cover layer1210 described above in connection with FIG. 10 and FIG. 11.

In some examples, the cover layer 1309 may be coupled to the waveguideof the sample testing device 1300. In some examples, the couplingbetween the cover layer 1309 and the waveguide may be implemented via atleast one sliding mechanism, similar to those describe in connectionwith the cover layer 1210 in connection with FIG. 10 and FIG. 11.

In some examples, the cover layer 1309 may comprise a second opening1311. In some examples, the second opening 1311 of the cover layer 1309may comprise a circular shape. In some examples, the second opening 1311of the cover layer 1309 may comprise other shapes.

As described above, the cover layer 1309 may be coupled to the waveguideof the sample testing device 1300 via at least one sliding mechanism. Insuch an example, the cover layer 1309 may be positioned on top of theopening layer 1307, and may be movable between a first position and asecond position.

FIG. 12 and FIG. 13 illustrate an example where the cover layer 1309 isat the second position. As shown, when the cover layer 1309 is at thesecond position, the second opening 1311 of the cover layer 1309 may notoverlap with the first opening 1313 of the opening layer 1307.

In some examples, additional latching or toggle features may beimplemented to secure the cover layer 1309 to the first position or thesecond position. For example, a slidable latch bar may be attached to aside surface of the cover layer 1309, and the waveguide may comprise afirst recess portion and a second recess portion on a side surface ofthe waveguide. In some examples, when the first recess portion receivesthe slidable latch bar, the cover layer 1309 may be secured to the firstposition. In some examples, when the second recess portion receives theslidable latch bar, the cover layer 1309 may be secured to the secondposition.

While the description above provides an example of latching or togglefeatures, it is noted that the scope of the present disclosure is notlimited to the description above. In some examples, an example latchingor toggle features may comprise one or more additional and/oralternative elements.

In some examples, interferometry-based sample testing devices (forexample, but not limited to, bimodal waveguide interferometer-basedsample testing devices) may require additional space for imagingcomponents including, for example, an imaging component and lenscomponent. However, the capacity to reduce the size of the sampletesting device (for example, but not limited to, chip size) may belimited. Thus, a sample testing device may require extra space foroutput fringe imaging functionality.

Some examples of the present disclosure may overcome various technicalchallenges. For example, by introducing backside illumination andimaging, the output fringe area may be shared with the sampling area toreduce the size of the sample testing device/sensor chip. The cost ofthe sample testing device may be reduced and the product size and/orcost may be reduced.

In accordance with various examples of the present disclosure, adual-surface (for example, but not limited to, double-sided) waveguidesample testing device may be provided based on, for example, but notlimited to, utilizing backside illumination image sensor technology, Forexample, a first surface (for example, but not limited to, upper surfaceor top surface) of the sample testing device may be used as the samplearea and a second surface (for example, but not limited to, backside orbottom surface) may be used for illumination and imaging.

In some examples, during example manufacturing processes, afterfabrication of the silicon wafer, the waveguide (for example, thewaveguide layer as described above) may be transferred unto a glasswafer. In some examples, the silicon substrate (for example, thesubstrate layer as described above) may be modified to allow backsideaccess to the sample testing device. For example, an additional openingmay be formed on the backside of the sample testing device through anetching process.

While the description above provides an example process formanufacturing a sample testing device, it is noted that the scope of thepresent disclosure is not limited to the description above. In someexamples, an example process may comprise one or more additional and/oralternative steps and/or elements. For example, additional layer(s) maybe added to further improve the light coupling efficiency of the inputand output of the sample testing device.

In various examples, the imaging component, lens component, and/or lightsource may fixedly and/or removably integrate with (for example, but notlimited to, interface, connect with and/or the like) the sample testingdevice in a variety of configurations and arrangements. The imagingcomponent, the lens component, and/or the light source may be integratedvia any available surface of the sample testing device. For instance,the imaging component and lens component may fixedly and/or removablyintegrate with the sample testing device via one or more apertures,fittings and/or connectors at a lateral end of the sample testingdevice. In other examples, the imaging component, the lens componentand/or the light source may integrate with the sample testing device viaone or more apertures, fittings and/or connectors on the bottom surface(for example, but not limited to, backside) or upper surface of thesample testing device.

FIG. 14 illustrates a perspective view of an example sample testingdevice 1400 in accordance with various examples of the presentdisclosure. In some examples, the example sample testing device 1400 maycomprise an alternatively configured imaging component 1407, lenscomponent 1405 and/or light source 1401.

In the example shown in FIG. 14, the light source 1401 may fixedlyand/or removably integrate with (for example, but not limited to,interface, connect to and/or the like) the bottom surface (for example,but not limited to, backside) of the sample testing device 1400 via aconnection to an integrated optical component 1403. The integratedoptical component 1403 may be fixedly and/or removably integrated via anaperture, fitting, connector and/or combinations thereof. Additionally,the imaging component 1407 and the lens component 1405 may directlyand/or removably integrate with (for example, but not limited to,interface, connect to and/or the like) the bottom surface (for example,but not limited to, backside) of the sample testing device 1400 via adifferent aperture, fitting, connector and/or combinations thereof.

In some examples, the imaging component 1407 and the lens component 1405may comprise a micro lens array directly integrated in the substratelayer, or any other layer, of the sample testing device 1400. Inexamples where the imaging component 1407, the lens component 1405 andthe light source 1401 are integrated via a bottom surface (for example,but not limited to, backside) of the sample testing device 1400, a usermay interact with, hold and/or handle the top surface of the sampletesting device 1400. Additionally, the top surface of the sample testingdevice 1400 may provide support and/or stabilize the sample testingdevice 1400. In some examples, attachments may be provided to the topsurface to improve handling of the sample testing device 1400. Invarious examples, fixedly and/or removably integrating components (e.g.,but not limited to, the imaging component 1407 and the lens component1405) with the sample testing device 1400 reduces the space requirementsof the sample testing device 1400, providing a compact and efficientsolution.

Accordingly, light may be coupled into the sample testing device 1400via the light source 1401 through the bottom surface (for example, butnot limited to, backside) of the sample testing device 1400. In someexamples, the light may enter the waveguide 1409 located in-between thetop surface of the sample testing device 1400 and the bottom surface(for example, but not limited to, backside) of the sample testing device1400, and may travel from the point of entry adjacent the light source1401/integrated optical component 1403 laterally through the waveguide1409 (for example, but not limited to, via one or more opticalchannels). In some examples, the light may travel towards the imagingcomponent 1407/lens component 1405 at the opposite end of the sampletesting device 1400. In some examples, as will be described in detailfurther herein, a processing component (for example, a processor) may beelectronically coupled to the imaging component 1407, and may beconfigured to analyze the imaging data (for example, fringe data) todetermine, for example but not limited to, changes in refractive indexwithin the waveguide 1409.

FIG. 15 illustrates a side view of the alternatively configured examplesample testing device of FIG. 14 with an alternatively configuredimaging component 1508, lens component 1506 and light source 1502. Asshown, the light source 1502 may fixedly and/or removably integrate with(for example, but not limited to, interface, connect to and/or the like)the bottom surface (for example, but not limited to, backside) of thesample testing device 1500 via a connection to an integrated opticalcomponent 1504. The integrated optical component 1504 may be directlyand/or removably integrated via an aperture, fitting, connector and/orcombinations thereof. Additionally, or alternatively, the imagingcomponent 1508 and the lens component 1506 may directly and/or removablyintegrate with (for example, but not limited to, interface, connect toand/or the like) the bottom surface of the sample testing device 1500via a different aperture, fitting, connector and/or combinationsthereof.

In some examples, the imaging component 1508 and the lens component 1506may comprise a micro lens array directly integrated in the substratelayer, or any other layer, of the sample testing device 1500. Inexamples where the imaging component 1508, the lens component 1506 andthe light source 1502 are integrated via a bottom surface (for example,but not limited to, backside) of the sample testing device 1500, a usermay interact with, hold and/or handle the top surface of the sampletesting device 1500. Additionally, or alternatively, the top surface ofthe sample testing device 1500 may provide support and/or stabilize thesample testing device 1500. In some examples, the sample testing device1400 may include an support structure for mounting/supporting thewaveguide 1409 thereon. An example support structure may comprise astructure disposed adjacent at least one surface (e.g., side surface) ofthe waveguide 1409.

Accordingly, light may be coupled into the sample testing device 1500via the light source 1502 through the bottom surface (for example, butnot limited to, backside) of the sample testing device 1500. The lightenters the waveguide 1510 located in-between the top surface of thesample testing device 1500 and the bottom surface (for example, but notlimited to, backside) of the sample testing device 1500 and travels fromthe point of entry adjacent the light source 1502/integrated opticalcomponent 1504 laterally through the waveguide 1510 (for example, butnot limited to, via one or more optical channels) towards the imagingcomponent 1508/lens component 1506 at the opposite end of the sampletesting device 1500.

In various examples, interferometry-based sample testing devices (forexample, but not limited to, bimodal waveguide interferometer-basedsample testing devices) described herein may provide “lab-on-a-chip”solutions for mobile applications. However, the practical integrationmay be limited by the light source and imaging (for example, but notlimited to, fringe detection) capabilities. For example, technicalchallenges may include designing a simple device capable of integratingwith a user computing device (for example, but not limited to, mobileapplication) form factor.

Some examples of the present disclosure may overcome various technicalchallenges. For example, size reduction in combination with backsideillumination and sensing may effectively reduce the chip sensor sizeand/or supporting components size. In some examples, the reduced sizelow-profile sensor module may be integrated with a mobile device such asa mobile terminal for mobile point-of-care applications. In someexamples, backside illumination and interferometry-based sample testingdevices with integrated input light sources and direct imaging sensorsmay achieve a total module height lower than 6 millimeters, and maytherefore enable integrations into device such as mobile phone. Forexample, an example bimodal waveguide interferometer sample testingdevice may be integrated with mobile devices to provide point-of-careapplications in the quick screening of a virus with reliable results.

In various examples, the sample testing device may comprise a mobilepoint-of-care component. The mobile point-of-care component may comprisean attachment configured to receive a user computing device (forexample, but not limited to, mobile device, handheld terminal, PDAand/or the like) configured to be attached to the sample testing device.For example, the mobile point-of-care component may be a mobile phonecompatible form-factor solution. The sample testing device may comprisean integrated and/or miniaturized package of component configured to becompatible with the user computing device (for example, but not limitedto, a mobile device, handheld terminal, PDA, tablet and/or the like)similar to point-of-sale products and devices.

FIG. 16A to FIG. 16C illustrate various views of an example mobilepoint-of-care component 1600 that may be suitable for integrating (forexample, but not limited to, attaching) a sample testing device with auser computing device. In particular, FIG. 16A illustrates an exampleprofile view, FIG. 16B illustrates an example top view, and FIG. 16Billustrates an example side view of the mobile point-of-care component1600. In some examples, the upper surface of the mobile point-of-carecomponent 1600 may configured to be removably integrated with a usercomputing device. For example, the user computing device (e.g., mobiledevice) may slide/insert into an attachment or adjacent a surface of themobile point-of-care component 1600.

As shown in FIG. 16B, the profile of the mobile point-of-care component1600 may have a length that is approximately 20 millimeters and a widththat is approximately 10 millimeters, corresponding with the form factorfor an example user computing device (for example, but not limited to, amobile device). The mobile point-of-care component 1600 may be fixedlyor removably integrated with the sample testing device via the lightsource 1602/integrated optical component 1604. For example the mobilepoint-of-care component 1600 may be integrated with the sample testingdevice via apertures, fittings, connectors and/or combinations thereof.

As shown in FIG. 16C, the profile height, “T”, of the mobilepoint-of-care component 1600 may be approximately 6 millimeters,suitable for compatibility with various conventionally sized usercomputing devices. As illustrated, the sample testing device may bepositioned beneath the mobile point-of-care component 1600, adjacent theintegrated optical component. Other configurations may be realized.

While the description above provides example measurements of mobilepoint-of-care component, it is noted that the scope of the presentdisclosure is not limited to the description above. In some examples, anexample mobile point-of-care component have one or more measurementsthat may be less than or more than those values described above,

In some examples the light source 1602 and integrated optical component1604 may be integrated into the mobile point-of-care component 1600assembly, user computing device assembly and/or the like. The outputfrom the light source 1602/integrated optical component 1604 may betransmitted directly to one or more processors of the user computingdevice (e.g., a mobile device spare camera port).

In some examples, the mobile point-of-care component 1600 may integratethe sample testing device and the user computing device such thathardware components may be shared between them. For example, the sampletesting device and the user computing device may utilize the samesensor, optical component and/or the like to reduce the number ofhardware components in the sample testing device. In some examples, theuser computing device chassis (for example, but not limited to, mobiledevice chassis) may be positioned upon or adjacent the mobilepoint-of-care component 1600 using fasteners, holders, stands,connectors, cables and/or the like.

Additionally, the mobile point-of-care component 1600 may includeadditional user device computing hardware and/or other sub-systems (notdepicted) for providing various user computing device functionality. Forexample, an example user computing device chassis (for example, but notlimited to, mobile device chassis) may be positioned on top of themobile point-of-care component 1600, such that the user interface isprovided (for example, but not limited to, accessible) to receive userinputs. In some examples, the mobile point-of-care component 1600 mayinclude hardware and software to enable integration with the sampletesting device. In some examples, the sample testing device may includeprocessing means to enable wireless communication with computingdevices/entities (e.g., capable of transmitting data wirelessly to acomputing device/entity). In some embodiments, the sample testing devicemay transmit data (e.g., images) to a user computing entity (e.g.,mobile device) through wired or wireless means. For example, the sampletesting device may transmit images via a mobile device processor cameraport using an MIPI serial imaging data connection.

In some examples, it should be appreciated that the user computingdevice (for example, but not limited to, mobile device) may beintegrated with the mobile point-of-care component 1600 and sampletesting device for functioning as a back-facing apparatus. In suchexamples, the user computing device optical components, sensors and/orthe like may be commonly used. For example, the user computing devicemay be integrated with additional custom circuitry and/or computinghardware (not depicted) housed by the mobile point-of-care component1600 and/or integrated with processing circuitry and/or conventionalcomputing hardware of the user computing device (for example, but notlimited to, a CPU and/or memory via a bus) for further processingcaptured and/or processed data from the sample testing device.

In some examples, bimodal waveguide interferometer biosensors mayexhibit high sensitivity in the sample refractive index measurement.Additionally, the result may also be highly sensitive to theenvironmental temperature. As such, there is a need to maintain a stabletemperature during operations.

Some examples of the present disclosure may overcome various technicalchallenges. In some examples, proposed thermally controlled waveguideinterferometer sample testing devices described herein may maintainconstant temperatures (for example, within a temperature range) toensure sensor output accuracy.

In some examples, heating/cooling component (for example, but notlimited to, a heating and/or cooling element, plate, pad and/or thelike) may be provided to adjust the temperature of the waveguide sampletesting device. In some examples, an on-chip temperature sensor may beutilized to monitor the sample testing device/chip temperature. In someexamples, multiple point temperate sensors may be arranged at eachcorner of the sample testing device substrate layer to monitoruniformity and confirm thermal equilibrium.

In some examples, an insulating case may be used to isolate the sensorchip from the ambient environment with only limited access and/oropening areas for sample opens (or sample windows) and lightinput/output. An additional heating/cooling component (for example, butnot limited to, a heating and/or cooling pad) may be added to one ormore surfaces (for example, but not limited to, the upper surface) ofthe waveguide sample testing device to further improve temperatureuniformity. An example sample testing device may include a resistiveheating pad, built-in conductive coating, additional Peltier coolingplate and/or the like.

In some examples, multi-point temperature sensors may be arranged toimprove temperature measurement accuracy. In some examples, sample testsunder different temperature conditions may be achieved by setting thetemperature control to different values. In some examples, data on thesample result and temperature may be collected. In some examples,testing may be facilitated as a result of minimum heating mass.

In some examples, the sample testing device may comprise a thermallycontrolled waveguide housing configured to maintain a constanttemperature with respect to the waveguide. The thermally controlledwaveguide housing may be or comprise a casing or sleeve. The thermallycontrolled waveguide housing may comprise a heating and/or cooling padand/or an insulating case. In some examples, the one or more sensors inthe substrate layer may monitor and adjust the temperature of thewaveguide during operations. For example, the temperature may be limitedto a suitable range (for example, but not limited to, between 10-40degrees Celsius).

FIG. 17 illustrates an example thermally controlled waveguide housing1710 encasing an example waveguide 1700 (for example, but not limitedto, embodied as an integrated chip). The waveguide 1700 (including thethermally controlled waveguide housing) may have a thickness rangingbetween 1 and 3 millimeters. The thermally controlled waveguide housing1710 may be less than 0.2 millimeters thick. An example thermallycontrolled waveguide housing 1710 may be manufactured using packagingprocesses (e.g., polymer over molding). In another example, an examplethermally controlled waveguide housing may comprise one or more directlycoated surfaces of the sample testing device.

While the description above provides example measurements of waveguide1700 and the thermally controlled waveguide housing 1710, it is notedthat the scope of the present disclosure is not limited to thedescription above. In some examples, an example waveguide 1700 and thethermally controlled waveguide housing 1710 may have other values.

In some examples, the thermally controlled waveguide housing 1710 maycomprise a thermally insulated semiconductor material, thermo-conductivepolymer, ceramic, silicon and/or the like. Additionally and/oralternatively, the thermally controlled waveguide housing 1710 may be orcomprise a thin film and/or coating, for example, silicon or dioxidepolymer. The waveguide 1700 may exhibit a low thermal mass such that thetemperature of the waveguide 1700 may be controlled to a precise level(for example, but not limited to, within an accuracy of 1 degreeCelsius) in a short amount of time. For example, the temperature of thewaveguide 1700 may be modulated/calibrated in less than 10 seconds.

While the description above provides example materials and/orcharacteristics of waveguide 1700 and the thermally controlled waveguidehousing 1710, it is noted that the scope of the present disclosure isnot limited to the description above. In some examples, an examplewaveguide 1700 and the thermally controlled waveguide housing 1710 maycomprise other materials and/or having other characteristics.

FIG. 18 illustrates a side view of an example waveguide 1800 andthermally controlled waveguide housing 1810. Additionally, oralternatively, the thermally controlled waveguide housing 1810 mayinclude one or more additional layers. For example, the thermallycontrolled waveguide housing 1810 may include an intermediary layer 1811to provide insulation and/or facilitate electrical isolation.Additionally, or alternatively, the intermediary layer 1811 may comprisea heating/cooling pad as described above in connection to FIG. 17.

In some examples, the thermally controlled waveguide housing 1810 may beformed using semiconductor/integrated circuit packagingtechniques/processes (for example, but not limited to, a thermallyinsulative polymer over-molding techniques/processes). The thermallycontrolled waveguide housing 1810 may comprise thermally insulativecompounds or materials. The thermally controlled waveguide housing 1810may include one or more apertures providing openings for accessingand/or interfacing with the waveguide 1800. For example, an aperture mayprovide access to the interface layer (not depicted) within thethermally controlled waveguide housing 1810. As shown, the waveguide1800 may comprise a second aperture through which a light source 1802and an integrated optical component 1804 may interface (for example, butnot limited to, connect with) the waveguide 1800. Additionally, thewaveguide 1800 may comprise a third aperture through which the imagingcomponent 1806 and the lens component 1808 may interface (for example,but not limited to, connect with) the waveguide 1800. In some exampleexamples, one or more thin films and/or coatings may be applied to thewaveguide 1800 or the thermally controlled waveguide housing 1810 usingsilicon processes. In some examples, the thin films and/or coatings maybe applied only to the upper surface and bottom surface of the waveguide1800 and/or the thermally controlled waveguide housing 1810. In suchexamples, thin edge leaking may be negligible as the thickness of thewaveguide 1800 may be small relative to its length and width.

In some examples, achieving accurate testing results from a waveguidemay require controlled temperature in the surrounding environment (forexample, but not limited to, the entire laboratory, medical facilityand/or the like) to reduce or eliminate temperature inference withtesting results. An example thermally controlled waveguide housing 1810may facilitate individual level control of the waveguide using one ormore temperature sensors (for example, but not limited to, multipointtemperature sensors) integrated within the substrate layer. For example,a sensing diode may be integrated (for example, but not limited to,bonded) within the substrate layer comprising silicon. In some examples,the sensing diode may be integrated (for example, but not limited to,bonded) to a different waveguide layer. In some examples, currentpassing through the sensing diode may be monitored in order to increaseor decrease the temperature associated with the waveguide 1800 substratelayer, such that the waveguide 1800 may maintain a constant temperatureto ensure sensor output accuracy and testing stability and accuracy. Insome examples, the waveguide may cover an area of approximately 0.5square inches. The temperature of the waveguide/sample testing devicemay be continuously monitored and controlled. For example, a controlalgorithm in an example chip may continuously monitor temperature dataand provide optimized control in response to any temperature variations.

While the description above provides an example of controllingtemperature associated with the waveguide, it is noted that the scope ofthe present disclosure is not limited to the description above. In someexamples, temperature control may be achieved through other means and/orvia other device(s).

In some examples, bimodal waveguide interferometers may exhibit highsensitivity under bio-chemical refractive index testing conditions.However, the result may be highly sensitive to the temperature. Forexample, the temperature stability requirement may be 0.001 degreeCelsius to achieve the required level of test accuracy, which may posetechnical challenges in real-world applications.

Some examples of the present disclosure may overcome various technicalchallenges. In some examples, by introducing built-in referencechannels, the temperature related measurement variation may beself-calibrated to eliminate temperature related measurement error. Forexample, the lab-on-a-chip sample testing device may consist of abimodal waveguide interferometer with additional two adjacent channelsfor reference. The close arranged same structure (for example, but notlimited to, SiO₂) clad reference channels may eliminate the need fortemperature related accurate control and compensation. Additionally, oralternatively, closed reference cells may be included in the referencechannels, filled with known reference bio-chemical solutions to furtherimprove accuracy. The bio-chemical solutions may comprise pure water,known viruses and the like. The temperature control may be combined withheating/cooling and temperature sensing via sensors to collect thesample test results under different temperature conditions. In someexamples, the temperature accuracy requirement is only needed to within1 degree Celsius level.

In various examples, the sample testing device may comprise a waveguideconfigured to be coupled with and/or receive input from a light sourceutilizing methods such as diffraction grating, end firing, directcoupling, prism coupling, and/or the like. The waveguide may be orcomprise an integrated chip.

In some examples, the waveguide may be or comprise a three-dimensionalplanar waveguide interferometer comprising a plurality of layers. Insome examples, the waveguide may comprise at least a substrate layer(defining the bottom of the sample testing device) having a waveguidelayer deposited thereon. Additionally, or alternatively, an interfacelayer may be deposited on or above the waveguide layer. The waveguidemay be fabricated as a unitary body or component in accordance totechniques similar to semiconductor fabrication techniques. In someexamples, additional intermediary layers may be provided.

FIG. 19 illustrates an example waveguide 1900 comprising a substratelayer 1920, an interface layer 1924 defining a top surface of thewaveguide 1900 and a waveguide layer 1922 therebetween. In someembodiments, a flow channel plate maybe positioned on the top surface ofthe waveguide 1900, details of which are described herein.

The waveguide layer 1922 may itself comprise one or more layers and/orregions (for example, but not limited to, films of transparentdielectric material such as silicon nitrate). The waveguide layer 1922may comprise a transparent medium configured to receive and couple lightlaterally from a first/input end of the waveguide layer 1922 to anopposite end/distal end of the waveguide layer 1922. The waveguide layer1922 may be configured to enable a plurality of propagating modes, forexample, a zero-order mode and a first-order mode. For example, awaveguide layer 1922 with a stepped profile may correspond with azero-order mode and a first-order mode.

As illustrated in FIG. 19, the waveguide layer 1922 may comprise aunitary body having a first region with a first width/thickness(corresponding with the x-direction when the waveguide is viewed in FIG.19) and a second region having a second width/thickness that isdifferent from the width/thickness of that of the first region. Asshown, the waveguide layer 1922 may define a stepped profile, with afirst region corresponding with a first/shorter profile and a secondregion corresponding with a second/taller profile. Each waveguide layerregion may correspond with different dispersions of light/energy thereinand thus may correspond with a different refractive index from the otherregions and layers in the waveguide 1900.

During operations, as light is coupled into the waveguide 1900 andtravels from a first region corresponding with a first/shorter profileof the waveguide layer to a second region corresponding with asecond/taller profile, the difference between the refractive index ofthe first region and the refractive index of the second region causesdifferent dispersions of light corresponding with a zero-order mode inthe first region and a first-order mode in the second region. Asdescribed above, the zero-order mode and first-order mode correspondwith two different light beams having different optical path lengthscorresponding with different interference fringe patterns. For example,as described above, an interference fringe pattern may occur when thereis at least a partial phase difference between the beam of lightreflected from the region corresponding with the zero-order mode and theregion corresponding with the first-order mode. An example waveguidewith a stepped profile may exhibit a phase difference when the beams oflight traveling reaches the intersection between the two differentregions (i.e., the step portion). For instance, the interference fringepattern associated with a zero-order mode may be a singular bright spotsurrounded by a dim edge, whereas the interference fringe patternassociated with a first-order mode may be more than one bright spot (forexample, but not limited to, two bright spots) each surrounded by a dimedge.

In some examples, additional regions with different widths/thicknessesmay be included to provide additional order modes.

The dispersions of light and corresponding interference fringe patternsmay be detected and measured in the sample testing device's sensinglayer/environment, for instance in the substrate layer (for example, butnot limited to, using one or more sensors in the substrate layer).Additionally, or alternatively, when surface conditions change at thetop surface of the sample testing device, for instance in the interfacelayer (for example, but not limited to, when a medium is depositedthereon), such surface condition changes may induce changes to themeasured refractive index and/or evanescent field right above thesurface of the waveguide. Corresponding changes to interference fringepatterns may be measured, detected and/or monitored. In some examples,the interface layer above the waveguide layer may include one or moresample openings (or sample windows) and/or opening/windows configured toreceive medium thereon (for example, but not limited to, liquids,molecules and/or combinations thereof). Accordingly, the output from thewaveguide layer may change in response to the medium(s) located above inthe interface layer.

As illustrated in FIG. 19 and discussed above, the waveguide layer 1922may define a stepped profile. As shown, the thickness/width of thesecond region (corresponding with the taller profile/step) may begreater than the thickness/width of the first region (corresponding withthe shorter profile/step) of the waveguide layer 1922. In some examples,the thickness/width of the second region may be at least twice the widthof the first region.

A waveguide with a single optical channel/optical path may posetechnical challenges when used in testing applications. For example,such systems may be sensitive to changes in environmental conditions(for example, but not limited to, temperature changes) that may obscuretest results (for example, but not limited to, interference fringepatterns). These challenges may be addressed by including at least onereference channel in the waveguide and ensuring identical environmentalconditions within the waveguide during operations.

An example waveguide may comprise at least one test optical channel(also referred to as sample channel) and one reference channel, eachcomprising an optical path configured to confine light laterally throughthe waveguide layer in the waveguide. The output of eachtesting/reference channel may be independently measured and/or monitoredduring operations to ensure uniformity of testing and environmentalconditions that may result in inaccurate results (for example, but notlimited to, inaccurate interference fringe patterns caused by ambientconditions). A light source may be configured to uniformly illuminateall of the testing/reference channels in the waveguide.

For each of the plurality of optical channels, small refractive indexvariations and or induced index changes (for example, but not limitedto, changes in dispersion of the light along the corresponding opticalpath) may be independently measured and tested (for example, but notlimited to, in the substrate layer) to identify a corresponding output(for example, but not limited to, interference fringe pattern)associated with each optical channel. Data describing the outputs may becaptured and transferred for further operations such as storing,analyzing, testing and/or the like.

In some examples, the substrate layer may function as the sensinglayer/environment of the sample testing device. The substrate layer maybe or comprise a semiconductor integrated circuit/chip (for example, butnot limited to, a silicon oxide chip or wafer). An example integratedcircuit/chip may include a plurality of sensors, transistors, resistors,diodes, capacitors and/or the like. The substrate layer may have a lowerrefraction index than the waveguide layer above. The substrate layer maycomprise a protective sealing film eliminating sensitivity to changes inthe sensing environment therein.

The interface layer may comprise an optically transparent material suchas glass or a transparent polymer coupled to and located directly abovethe waveguide layer. Deposits of medium on the surface of the interfacelayer may induce changes to the refractive index in the opticalchannels/waveguide layer beneath.

A reference window associated with a reference channel may be clad,sealed or accessible for receiving deposits of reference medium thereon(for example, but not limited to, air, water, a known biochemical sampleand/or the like).

A sample window may be configured to receive a sample medium (forexample, but not limited to, molecule, liquid and/or combinationsthereof) for testing. In some examples, a sample medium (for example,but not limited to, bio-chemical sample) deposited on the sample windowmay interact with the surface and/or a medium thereon. For example,through physical attraction (for example, but not limited to, surfacetension) or a chemical reaction (for example, but not limited to,chemical bonding, antibody reaction and/or the like). The surface of thesample window may be configured to interact with a particular type ofmedium or type of molecule in a medium. In some embodiments, the samplemedium may be provided to a flow channel that is positioned on thesample window, details of which are described herein.

FIG. 20A and FIG. 20B show side-section views of exemplaryconfigurations of optical channels in waveguides. As shown, eachwaveguide 2000A/2000B comprises a substrate layer 2020A/2020B, awaveguide layer 2022A/2022B and an interface layer 2024A/2024B.

Referring to FIG. 20A, the waveguide layer 2022A may comprise a firstsample channel 2010A associated with a sample window 2002A in theinterface layer 2024A, a first reference channel 2008A and a secondreference channel 2012A. As shown, the first and second referencechannels 2008A, 2012A may be clad (for example, but not limited to, asilicon oxide clad reference without a reference medium therein) fortesting purposes.

Referring to FIG. 20B, the waveguide layer 2022B may comprise a firstsample channel 2010B associated with a sample window 2002B in theinterface layer 2024B, a first reference channel 2008B associated with afirst reference window 2004B in the interface layer 2024B, and a secondreference channel 2012B associated with a second reference window 2006Bin the interface layer 2024B. Each reference window 2004B, 2006B may besealed and contain the same or different reference mediums (for example,but not limited to, air, water, a biochemical sample and/or the like)for testing purposes. Alternatively, in some examples, one referencechannel may be clad and a second optical channel may be sealed with amedium in the associated reference window therein.

While the description above provides some example configurations, it isnoted that the scope of the present disclosure is not limited to thedescription above. In some examples, an example may comprise one or moreadditional and/or alternative elements. For example, less than two ormore than two reference channels may be implemented.

Referring back to FIG. 20A and FIG. 20B, the sample window 2002A/2002Bmay be configured to receive a deposit of a sample medium (for example,but not limited to, molecule, biochemical sample, virus and/or the like)on the surface of the interface layer. Example sample testing devicecomponents may be reusable, disposable and/or comprise combinations ofreusable and disposable portions. In some embodiments, the sample window2002A/2002B may comprise one or more biological or chemical elements(for example, antibodies) disposed on the surface to attached certainmolecules in the sample medium for testing, similar to those describedabove. In some embodiments, the sample window 2002A/2000B may be cleanedafter each use (e.g., using distilled water, isopropyl alcohol and/orthe like). In some embodiments, the sample medium may be received via aflow channel, details of which are described herein.

The substrate layer (for example, but not limited to, one or moresensors in the substrate layer of the waveguide) may detect and measurelocal changes in the measured refractive index caused by changes in thedirection of travel of the light corresponding with different samplemediums deposited on the sample window 2002A/2002B.

The waveguide layer may comprise a plurality of sample channels,reference channels, sample windows and/or combinations thereof. Thesample channels and reference channels in the waveguide layer may besubstantially parallel to one another and further be associated withopenings/windows in the interface layer above.

FIG. 21 to FIG. 23 illustrate various views of an example waveguide thatmay be manufactured in accordance with methods that are similar tosemiconductor manufacturing techniques and as described herein.

Referring now to FIG. 21, an example waveguide 2100 comprising aplurality of sample windows 2102, 2104, 2106 each associated with aplurality of optical channels (not depicted).

FIG. 22 illustrates a top view of an example waveguide 2200 comprising aplurality of sample windows 2202, 2204, 2206 each associated with aplurality of buried optical channels 2208, 2210, 2212. Each exampleoptical channel 2208, 2210, 2212 may have a width less than 50 nm, alength ranging between 1-5 millimeters, and a depth less than 1 micron,for example between 0.1-0.3 micron. Each optical channel 2208, 2210,2212 may be laterally spaced approximately 0.1 millimeters from aneighboring/adjacent optical channel.

FIG. 23 illustrates a side view of an example waveguide 2300 having awidth that is approximately less than 1 millimeters thick (for example,but not limited to, between 0.2-0.3 millimeters).

While the description above provides some example measurements, it isnoted that the scope of the present disclosure is not limited to thedescription above. In some examples, an example may comprise one or moreelements that have measurement(s) that are different from thosedescribed above.

In some examples, a waveguide may be formed using manufacturingtechniques and/or processes similar to those used for semiconductor andintegrated circuit fabrication.

FIG. 24 illustrates an example fabrication method for producing awaveguide 2400 in accordance with various examples of the presentdisclosure. A plurality of layers/components may be coupledtogether/layered under suitable laboratory conditions to provide thewaveguide 2400. As shown, a substrate layer 2402, an intermediary layer2404, a plurality of waveguide layers 2406, 2408, 2410 and an interfacelayer 2412, may be coupled together to produce the waveguide 2400.During an example manufacturing process, after fabrication of a siliconwafer, the waveguide layers 2406, 2408, 2410 may be transferred unto aglass wafer.

“Edge firing” refers to the mechanism of directing light into awaveguide through a side surface of the waveguide (e.g. an “edge”). Edgefiring waveguide faces many technical difficulties, including alignmentof the waveguide properly to the light source. This may be caused by avariety of factors. For example, the sub-micron scale of a cross-sectionof a waveguide may cause the optical alignment requirement goes beyondmass production product capability. For example, on-chip grating couplermay experience wafer process difficulty in alignment.

In accordance with some examples of the present disclosure, on-chipmicro CPC (Compound Parabolic Concentrator) lens array may reduceoptical alignment requirement more than ten times to allow massproduction. For example, the micro lens array may be precisely producedwith silicon wafer process. In some embodiments, a single chip, directedge firing waveguide (without additional coupler) may allow a waveguidesensing product having a reduced size and/or a lower production cost.

In some embodiments, a micro CPC lens array may be arranged at the inputedge of the waveguide. The output end of each concentrator lens of themicro CPC lens array may be aligned to one waveguide channel. The inputend of each concentrator lens may cover the input area for high couplingefficiency. In some embodiments, the on-chip micro lens may be producedwith silicon process with high precision.

In some embodiments, a single chip, direct edge firing waveguide(without additional coupler) may reduce the application instrumentcomplexity and cost, while requiring only minimum component count. Insome embodiments, a micro CPC lens array may increase the light inputarea by more than 3700 times. In some embodiments, the light source maybe simplified with a collimation module to further reduce the productsize and cost.

Referring now to FIG. 25, a portion of an example sample testing device3700 is shown. In the example shown in FIG. 25, the example sampletesting device 3700 comprises a substrate 3701, a waveguide 3703disposed on the substrate 3701, and a lens array 3705 disposed on thesubstrate 3701.

Similar to the substrate layer described above, the substrate 3701 mayprovide mechanical support for various components of the sample testingdevice. For example, the substrate 3701 may provide mechanical supportfor the waveguide 3703 and the lens array 3705.

In some embodiments, the substrate 3701 may comprise material such as,but not limited to, glass, silicon oxide, and polymer.

In some examples, the waveguide 3703 and/or the lens array 3705 may bedisposed on top of the substrate 3701 through various means, includingbut not limited to, mechanical means (for example, a binding clip)and/or chemical means (such as the use of adhesive material (e.g.glue)).

In some embodiments, the lens array 3705 is configured to direct lightto an input edge (for example, the input edge 3707 shown in FIG. 25) ofthe waveguide 3703.

In some embodiments, the lens array 3705 comprises a compound parabolicconcentrator (CPC) lens array. As an example, the compound parabolicconcentrator (CPC) lens array comprises a plurality of concentrator lens(for example, concentrator lens 3705A, concentrator lens 3705B). In theexample shown in FIG. 25, the output end of each concentrator lens isaligned to an optical channel of the waveguide 3703 (for example, aninput opening of the corresponding optical channel), and the input endof each concentrator lens is aligned with an input light source, detailsof which is described here.

In some embodiments, the lens array 3705 comprises a micro CPC lensarray. In some embodiments, the lens array 3705 comprises an asymmetricCPC lens array. In some embodiments, the lens array 3705 comprises anasymmetric micro CPC lens array.

Referring now to FIG. 26, a portion of a top view of an example sampletesting device 3800 is shown. In the example shown in FIG. 26, theexample sample testing device 3800 may comprise a lens array thatincludes, for example but not limited to, concentrator lens 3804. Theexample sample testing device 3800 may also comprise a waveguide thatmay comprise, for example but not limited to, an optical channel 3802.As described above and will be described in more details herein, lightmay travel through the optical channel (for example, the optical channel3802) of the waveguide.

In the example shown in FIG. 26, the output end of the concentrator lens3804 is aligned to the input edge of the optical channel 3802. As such,the lens array may improve the precision of directing light into thewaveguide.

Referring now to FIG. 27, a portion of a top view of an example sampletesting device 3900 is shown. In the example shown in FIG. 27, theexample waveguide 3917 of the example sample testing device 3900 maycomprise a plurality of optical channels. For example, the waveguide3917 may comprise a reference channel 3901, a reference channel 3903, asample channel 3907, a sample channel 3909, a reference channel 3913 anda reference channel 3915. In some embodiments, the example waveguide3917 may comprise one or more buried optical channels, where the lensarray does not direct light into the burned optical channels. Forexample, the example waveguide 3917 may comprise a buried referencechannel 3905 and a buried reference channel 3911.

As will be described in more detail herein, the sample channel 3907and/or the sample channel 3909 may each comprise or share a samplewindow for receiving sample to be tested. The reference channel 3901,the reference channel 3903, the reference channel 3913, the referencechannel 3915, the buried reference channel 3905 and/or the buriedreference channel 3911 may be sealed and contain the same or differentreference mediums (for example, but not limited to, air, water, abiochemical sample, and/or the like) for testing purposes. Additionally,or alternatively, in some examples, one or more of the referencechannels may be cladded and one or more of the reference channels may besealed with a medium in the associated reference window.

With reference to FIG. 28A and FIG. 28B, an example sample testingdevice 4000 is shown. Similar to those described above in connectionwith FIG. 25, FIG. 26, and FIG. 27, the example sample testing device4000 may comprise a substrate 4002, a waveguide 4004, and a lens array4006. In some embodiments, the waveguide 4004 may comprise one or moreoptical channels (for example, the reference channel 4008). In someembodiments, the lens array 4006 may comprise one or more concentratorlenses (for example, the concentrator lens 4010).

In some embodiments, the lens array 4006 is configured to direct lightto an input edge of the waveguide 4004. For example, each of theconcentrator lens is configured to direct light into an input edge of anoptical channel of the waveguide 4004. As shown in the example of FIG.28A and FIG. 28B, the output edge of the concentrator lens 4010 iscoupled to and aligned with an input edge of the reference channel 4008.

In some embodiments, the lens array 4006 is also aligned with a lightsource. For example, one or more optical elements may be implemented todirect light into the lens array (for example, to the input edge of eachof the concentrator lens).

Referring now to FIG. 29, an example sample testing device 4100 isshown. Similar to those described above, the example sample testingdevice 4100 may comprise a substrate 4101, a waveguide 4103, and a lensarray 4105. The lens array 4105 may be configured to direct light to aninput edge of the waveguide 4103, similar to those described above.

In the example shown in FIG. 29, the sample testing device 4100 maycomprise a light source 4107 and an integrated optical component 4109.

Similar to those described above, the light source 4107 may beconfigured to produce, generate, emit, and/or trigger the production,generation, and/or emission of light (including but not limited to alaser light beam). The light source 4107 may be coupled to theintegrated optical component 4109, and light may travel from the lightsource 4107 to the integrated optical component 4109. Similar to thosedescribed above, the integrated optical component 4109 may collimate,polarize, and/or couple light to the lens array 4105.

Similar to those described above, the lens array 4105 may be configuredto direct light to an input edge of the waveguide 4103. For example,each of the concentrator lens of the lens array 4105 is configured todirect light into an input edge of an optical channel of the waveguide(for example, a reference channel or a sample channel). Light travelsthrough the corresponding reference channel or the corresponding samplechannel, and may be detected by an imaging component 4111. In someembodiments, the imaging component 4111 may be disposed on an outputedge of the waveguide 4103 to collect interferometry data.

It is noted that the scope of the present disclosure is not limited tothose described above. In some embodiments of the present disclosure,features from various figures may be substituted and/or combined. Forexample, while FIG. 25, FIG. 26, FIG. 27, FIG. 28A, FIG. 28B and FIG. 29illustrate example lens arrays for directing light to the openings ofthe sample channel or the reference channel, one or more additional oralternative optical elements may be implemented to direct the light tothe openings of the sample channel or the reference channel, includingbut not limited to, the integrated optical component 804 shown in FIG. 4above.

A multi-channel waveguide (e.g. a waveguide that comprises multipleoptical channels) may comprise one or more beam-splitter splittercomponents (such as Y splitters, U splitters, an/or S splitters) toilluminate the multiple optical channels. However, many beam splittersmay face technical limitations, difficulties, and/or applicationconstrains due to the silicon wafer process.

For example, FIG. 30 illustrates a portion of an example top view of awaveguide. In the example shown in FIG. 30, the waveguide may compriseone or more Y splitters. For example, the waveguide may comprise anexample Y splitter 4200.

The Y splitter 4200 may be shaped similar to a letter “Y” and splits onelight beam into two. For example, light may travel from the bottom ofthe “Y” to the two top branches of the “Y.” Referring to the Y splitter4200 illustrated in FIG. 30, light may travel into the input edge 4203,be split into two, and exit from output edges 4205 and 4207.

In some embodiments, one or more Y splitters may be connected inparallel, such that light may exit an output edge of one Y splitter andenter an input edge of anther Y splitter. In the example shown in FIG.30, the multiple Y splitters may be connected so as to provide aplurally of optical channels described herein (for example, samplechannels and/or reference channels).

However, the Y splitter may face production limitation in providing anuniformed light splitting structure. Additionally, for more than twooptical channels, multiple Y splitters may be needed, and the excessiveaxial chip space may be required.

As another example, FIG. 31 illustrates a portion of an example top viewof a waveguide. In the example shown in FIG. 31, the waveguide maycomprise one or more U splitters. For example, the waveguide maycomprise an example U splitter 4300.

The U splitter 4300 may be shaped similar to a letter “U” and splits onelight beam into two. For example, light may travel from the bottom ofthe “U” to the two top branches of the “U.” Referring to the U splitter4300 illustrated in FIG. 31, light may travel into the input edge 4302,be split into two, and exit from the output edges 4304 and branch 4306.

In some embodiments, one or more U splitters may be connected inparallel, such that light may exit an output edge of one U splitter andenter an input edge of anther U splitter. In the example shown in FIG.31, the multiple U splitters may be connected so as to provide aplurally of optical channels described herein (for example, samplechannels and/or reference channels).

Similar to the Y splitter example described above, the U splitter mayface production limitation in providing an uniformed light splittingstructure. The U splitter may also provide a narrower separation betweenoptical channels, which may cause light interference among opticalchannels.

As another example, FIG. 32 illustrates a portion of an example top viewof a waveguide. In the example shown in FIG. 32, the waveguide maycomprise one or more S splitters. For example, the waveguide maycomprise an example S splitter 4400.

The S splitter 4400 may split one light beam into two. Referring to theS splitter 4400 illustrated in FIG. 32, light may travel into the inputedge 4401, be split into two, and exit from the output edges 4403 and4405.

In some embodiments, one or more S splitters may be connected inparallel, such that light may exit an output edge of one S splitter andenter an input edge of anther S splitter. In the example shown in FIG.32, the multiple S splitters may be connected so as to provide aplurally of optical channels described herein (for example, samplechannels and/or reference channels).

Similar to the Y splitter example and the U splitter example describedabove, the S splitter may face production limitation in providing anuniformed light splitting structure. The S splitter may also requireextra axial chip space for the S transition, and may face limitation indirecting the light along the strait section angles among the Ssplitters.

As described above, in some embodiments, a micro CPC lens array may bearranged at the input edge of the waveguide. The output end of eachconcentrator lens of the micro CPC lens array may be aligned to oneoptical channel. The input end of each concentrator lens may cover aninput area for high coupling efficiency. In some embodiments, theon-chip micro lens may be produced with silicon process with highprecision.

As such, in accordance with various examples of the present disclosure,flood-illuminated multichannel waveguide may eliminate the beam splitterby flood illuminating the multi-channels with direct end-fire through amicro CPC lens array. In some embodiments, an over-sized laser sourcemay provide light into the micro CPC lens array. In some embodiments,light in illuminated waveguide may be guided to the sensing sectionsthrough the curved optical channels, and the curved portion of theoptical channels may compensate and optimize the uniformity of lightwith minimum chip space requirement.

Referring now to FIG. 33A and FIG. 33B, an example top view 4500 of atleast a portion of an example waveguide 4502 is illustrated. Inparticular, FIG. 33B zooms in and illustrates a portion (which is theoptical channel 4504) of the top view shown in FIG. 33A.

In some embodiments, the example waveguide 4502 may be aflood-illuminated multichannel waveguide.

In the example shown in FIG. 33A, the waveguide 4502 may comprise aninput edge 4506 for receiving light from a light source. The input edge4506 of the waveguide 4502 may comprise a plurality of multi-channelinput waveguide openings (also referred to as “input openings” herein),and each of the plurality of input openings corresponds to an openingfor an optical channel for receiving input light. For example, the inputedge 4506 may comprise an input opening 4508.

In some embodiments, the input edge of the waveguide is configured toreceive light. In some embodiments, each of the plurality of inputopenings is configured to receive light. For example, light may travelonto the input edge 4506, and the input edge 4506 may be configured toreceive light. As described above, the input edge 4506 may comprise aninput opening 4508. As such, the input opening 4508 may be configured toreceive the light. Light may travel through the corresponding opticalchannel 4504. In some embodiments, the plurality of optical channels(including optical channel 4504) are each configured to guide the lightfrom a corresponding input opening through the corresponding opticalchannel.

In some embodiments, the input openings of the plurality of opticalchannels may have the same width. In some embodiments, the inputopenings of the plurality of optical channels may have different widths.For example, the different widths of the input openings may balance theenergy received between optical channels under a single Gaussian profileillumination.

In some embodiments, the input openings of the optical channels may beperpendicular to the input edge of the waveguide. In some embodiments,the input openings of the optical channels may not be perpendicular tothe input edge of the waveguide, which may, for example, eliminate thecurved space that is required in other splitters (for example, in Ssplitters).

In some embodiments, each of the plurality of optical channels comprisesa curved portion and a straight portion. As an example, in the exampleshown in FIG. 33A and FIG. 33B, the optical channel 4504 may comprise acurved portion 4510 and a straight portion 4512. In some embodiments,the straight portion 4512 is connected to the curved portion 4510,allowing light to travel from the input opening of the optical channelto the output opening of the optical channel.

In the example shown in FIG. 33A and FIG. 33B, the curved portion 4510may gradually deviate from the input opening 4508, and may provide aconvergent angle for guiding the light through the optical channel 4504.As the light reaches the end of the curved portion 4510, light maytravel to the straight portion 4512 and eventually exit the opticalchannel 4504. As such, the curved portion 4510 may provide polynomialcurves to couple the light beam into the sensor waveguide section withoptimum uniformity by redirection and compensation.

As shown in FIG. 33A and FIG. 33B, the straight portions of the opticalchannels may be separated from one other, therefore creating separationbetween the ends of the optical channels. The separation distancebetween the ends of optical channels may be determined based on theprocess capability. For example, small separation may have less energyloss in the flood illumination. In some embodiments, flood illuminationwith over-sized illumination light spot (for example, an over-sizedlaser source) at the waveguide input may reduce the alignmentrequirement due to the slow beam convergent angles. For example, themisalignment sensitivity may be more than ten times less than anend-fire waveguide illumination that does not implement examples of thepresent disclosure. While there may be energy loss from over-sizedillumination and gap energy loss between input ends, examples of thepresent disclosure may provide sufficient light coupling efficiency fora low power diode laser input and imaging component output with highsignal-to-noise ratio.

Referring now to FIG. 34, an example sample testing device 4600 isshown. Similar to those described above, the example sample testingdevice 4600 may comprise a light source 4601, an integrated opticalcomponent 4603, a waveguide 4605, and an imaging component 4607.

Similar to those described above, the light source 4601 may beconfigured to produce, generate, emit, and/or trigger the production,generation, and/or emission of light (including but not limited to alaser light beam). The light source 4601 may be coupled to theintegrated optical component 4603, and light may travel from the lightsource 4601 to the integrated optical component 4603. Similar to thosedescribed above, the integrated optical component 4603 may collimate,polarize, and/or couple light to the waveguide 4605. For example, theintegrated optical component 4603 may collimate, polarize, and/or couplelight to each of the input opening of the plurality of optical channelswithin the waveguide 4605. Light travels through the plurality ofoptical channels (for example, reference channels and/or samplechannels), and may be detected by an imaging component 4607. In someembodiments, the imaging component 4607 may be disposed on an outputedge of the waveguide 4605 to collect interferometry data.

In the example shown in FIG. 34, the waveguide 4605 may comprise asensing section 4609 on the top surface the waveguide 4605. The sensingsection 4609 may comprise, for example, one or more sample windows ofthe sample channels for receiving the sample to be tested, and/or one ormore reference windows of the reference channels for storing same ordifferent reference mediums (for example, but not limited to, air,water, a biochemical sample, and/or the like) for testing purposes.

In some embodiments, one or more optical channels may share a samplewindow, therefore forming a joint sample channel. In some embodiments,one or more optical channels may share a reference window, therebyforming a joint reference channel. In some embodiments, the sensingsection 4609 may correspond to the straight portions of the opticalchannel (e.g. without any curved portions).

It is noted that the scope of the present disclosure is not limited tothose described above. In some embodiments of the present disclosure,features from various figures may be substituted and/or combined. Forexample, as described above, the plurality of optical channels describedabove may be implemented in a waveguide to create one or more samplechannels and one or more reference channels as described in otherfigures.

Waveguide edge input and output may require coupling components (suchas, but not limited to, prism or grating) added to a waveguide. In someembodiments, prism may require additional space. In some embodiments,grating may face wavelength dependency issues. Both prism and gratingcannot support broadband, and may suffer efficiency loss.

Direct edge coupling may be implemented to couple prism or grating to awaveguide. However, direct edge coupling with post-polished edges maycause production difficulties during the manufacturing process, and mayresult in high cost in the mass production of a waveguide (for example,packaged as a waveguide chip). As such, there is a need for designand/or mechanism on direct edge coupling that overcomes thesedifficulties and allows mass production of waveguide chip.

In accordance with various examples of the present disclose, a sampletesting device is provided. In some embodiments, the sample testingdevice may comprise direct edge coupling mechanism that may achieveoptical edge quality. For example, during the manufacturing process,edges of the waveguide may be etched to create recessed opticalinterface edges, such that the waveguide, after dicing (e.g. a finishedchip), maintains optical quality of the light input and output surfacesat selected edges. By eliminating the post-polishing process, theoptical surface quality of edge surface may be guaranteed with siliconwafer process. As such, the waveguide can be mass produced with thehighest efficiency (for example, as a lab-on-a-chip product).

In some embodiments, the surfaces of optical interface edges may beachieved with etching at the end of layer-by-layer manufacturing processfor the waveguide. The surfaces of optical interface edges may be etchedthrough all layers, and may have optically clear quality to allow lightto directly enter and exit to the waveguide with minimum loss. In otherwords, the optical interface edges allow focused light to directly enterthe waveguide from light source as well as directly exit the waveguideto an imaging component (for example, a photo sensor). In someembodiments, optical components (such as lenses) may be added to furtherimprove the coupling efficiency.

Referring now to FIG. 35A and FIG. 35B, an example sample testing device4700 is illustrated. In particular, the example sample testing device4700 may be fabricated through various example processes describedherein.

In the example shown in FIG. 35A, the example sample testing device 4700may comprise multiple layers. For example, the example sample testingdevice 4700 may comprise a substrate layer 4701, an intermediate layer4703, a waveguide layer 4705, and an interface layer 4707, similar tothose described above.

For example, the substrate layer 4701 may comprise material such as, butnot limited to, glass, silicon oxide, and polymer. The intermediatelayer 4703 may be attached to the substrate layer 4701 through morefastening mechanisms and/or attaching mechanisms, including not limitedto, chemical means (for example, adhesive material such as glues),mechanical means (for example, one or more mechanical fasteners ormethods such as soldering, snap-fit, permanent and/or non-permeantfasteners), and/or suitable means.

In some embodiments, the waveguide layer 4705 comprise a waveguide (forexample, a waveguide that include one or more optical channels). Forexample, the waveguide layer of the sample testing device may include alayer that comprises SiO2, a layer that comprises Si3N4, and a layerthat comprises SiO2. In some embodiments, the waveguide layer 4705 maybe attached to the intermediate layer 4703 through more fasteningmechanisms and/or attaching mechanisms, including not limited to,chemical means (for example, adhesive material such as glues),mechanical means (for example, one or more mechanical fasteners ormethods such as soldering, snap-fit, permanent and/or non-permeantfasteners), and/or suitable means.

In some embodiments, the interface layer 4707 may comprise one or moreinterface elements, such as, but not limited to, one or more samplewindows and/or one or more reference windows, similar to those describedabove. In some embodiments, the interface layer 4707 may be attached tothe waveguide layer 4705 through more fastening mechanisms and/orattaching mechanisms, including not limited to, chemical means (forexample, adhesive material such as glues), mechanical means (forexample, one or more mechanical fasteners or methods such as soldering,snap-fit, permanent and/or non-permeant fasteners), and/or suitablemeans.

In some embodiments, to achieve optical edge quality, the first edge ofthe intermediate layer, the first edge of the waveguide layer, thesecond edge of the intermediate layer, and the second edge of thewaveguide layer may be etched during the method. Referring now to FIG.35B, various etched edges are shown.

In some embodiments, the intermediate layer 4703 may comprise a firstedge 4709 and a second edge 4711. In some embodiments, light may enterthe intermediate layer 4703 through the first edge 4709. In someembodiments, light may exit the intermediate layer 4703 through thesecond edge 4711.

In some embodiments, the waveguide layer 4705 may comprise a first edge4713 and a second edge 4715. In some embodiments, light may enter thewaveguide layer 4705 through the first edge 4713. In some embodiments,light may exit the waveguide layer 4705 through the second edge 4715.

In some embodiments, the interface layer 4707 may comprise a first edge4717 and a second edge 4719. In some embodiments, light may enter theinterface layer 4707 through the first edge 4717. In some embodiments,light may exit the interface layer 4707 through the second edge 4719.

During the method for the sample testing device 4700, subsequent toattaching various layers, the first edge 4709 of the intermediate layer4703, the first edge 4713 of the waveguide layer 4705, and the firstedge 4717 of the interface layer 4707 may be etched together, such thatthe first edge 4709 of the intermediate layer 4703, the first edge 4713of the waveguide layer 4705, and the first edge 4717 of the interfacelayer 4707 may be recessed from an edge of the substrate layer 4701. Asshown in FIG. 35B, light may travel into the waveguide layer 4705through an input opening 4721 of the waveguide layer 4705. As such, theetched first edge 4709 of the waveguide layer 4705 may become a recessedoptical edge that may provide improve optical quality with less lightloss.

Similarly, during the method for the sample testing device 4700,subsequent to attaching various layers, the second edge 4711 of theintermediate layer 4703, the second edge 4715 of the waveguide layer4705, and the second edge 4719 of the interface layer 4707 may be etchedtogether, such that the second edge 4711 of the intermediate layer 4703,the second edge 4715 of the waveguide layer 4705, and the second edge4719 of the interface layer 4707 may be recessed from an edge of thesubstrate layer 4701. As shown in FIG. 35B, light may travel out of thewaveguide layer 4705 through an output opening 4723 of the waveguidelayer 4705. As such, the etched second edge 4715 of the waveguide layer4705 may become a recessed optical edge that may provide improve opticalquality with less light loss.

In some embodiments, subsequent to etching the first edge 4709 of theintermediate layer 4703, the first edge 4713 of the waveguide layer4705, and the first edge 4717 of the interface layer 4707, the methodmay further comprise coupling a light source to the first edge 4713 ofthe waveguide layer 4705. In some embodiments, subsequent to etching thesecond edge 4711 of the intermediate layer 4703, the second edge 4715 ofthe waveguide layer 4705, and the second edge 4719 of the interfacelayer 4707, the method may further comprise coupling an imagingcomponent to the second edge 4715 of the waveguide layer 4705.

The light source may be configured to produce, generate, emit, and/ortrigger the production, generation, and/or emission of light (includingbut not limited to a laser light beam). For example, the light sourcemay include, but not limited to, laser diodes (for example, violet laserdiodes, visible laser diodes, edge-emitting laser diodes,surface-emitting laser diodes, and/or the like). As described above,light may be emitted from the light source and enter the sample testingdevice 4700 through the input opening 4721 on the first edge 4713 of thewaveguide layer 4705. As the first edge 4713 has been etched during themethod, the light may enter the waveguide layer 4705 with less loss. Asdescribed above, light may exit the sample testing device 4700 throughthe output opening 4723 on the second edge 4715 of the waveguide layer4705. As the second edge 4715 has been etched during the method, thelight may exit the waveguide layer 4705 with less loss.

As such, the sample testing device 4700 may be designed with recessededges for optical input and output (for example, as a direct edgecoupling waveguide chip). In some embodiments, safety margin may beimplemented during the etching process to ensure the quality of theoptical interface edge, without causing damage in the process andhandling.

In some embodiments, one or more layer of the sample testing device 4700(for example, the intermediate layer 4703, the waveguide layer 4705,and/or the interface layer 4707, together as a direct edge opticalcoupling assembly) may be registered to surface of the substrate layer4701 for high precision alignment.

In some embodiments, index matching fluid may be applied to variousedges to allow high numerical aperture optical application for highcoupling efficiency. For example, fluid having a refractive index thatmatches the refractive index of the waveguide layer 4705 may be appliedon the first edge 4713 and/or the second edge 4715. Additionally, oralternatively, fluid having a refractive index that matches therefractive index of the intermediate layer 4703 may be applied on thefirst edge 4709 and/or the second edge 4711. Additionally, oralternatively, fluid having a refractive index that matches therefractive index of the interface layer 4707 may be applied on the firstedge 4717 and/or the second edge 4719.

In various embodiments of the present discourse, an example sampletesting device may be in the form of a lab-on-a-chip (LOC) device thatcomprises a micro sensor chip (for example, a waveguide layer) andon-chip micro fluidics (for example, a an on-chip fluidics layer).Technical difficulty exist in fabricating the add-on micro fluidics withminiaturization, and it can be technically challenging when packagingmicrochip with micro fluidics.

In some embodiments, an optical virus sensor with on-chip micro fluidicsmay be precisely formed with silicon wafer process by adding cover glasswith build-in fluid input opening (or inlet) and an output opening (oroutlet) in the chip scale sensor packaging process. The wafer-processedmicro fluids may reduce the cost associated with adding precisely moldedfluidics, and the chip scale package may eliminate the process ofassembling the precisely molded fluidics.

As such, various embodiments of the present disclosure may provide waferlevel packaging process with high precision and low cost, minimum sensordimensions for miniaturized instrument integration, glass surface fluidinterface with quick and easy connection and seal, and/or direct edgeoptical input and output to simplify optical assembly.

Referring now to FIG. 36, an example apparatus 4800 is illustrated. Insome embodiments, the example apparatus 4800 may be a waveguide withon-chip fluidics that may be manufactured in accordance with embodimentsof the present disclosure.

In the example shown in FIG. 36, to manufacture the example apparatus4800, an example method may include producing a waveguide layer 4801 andproducing an on-chip fluidics layer 4803. As described herein, theon-chip fluidics layer (or the component for providing on-chip fluidics)may also be referred to as a “flow channel plate.”

In various embodiments of the present disclosure, the waveguide layer4801 may be manufactured or fabricated in accordance with variousexamples described herein. For example, the waveguide layer 4801 mayprovide one or more waveguides that comprise optical channel(s) (forexample, the optical channel 4811) in accordance with embodiments of thepresent disclosure.

As shown in FIG. 36, the on-chip fluidics layer 4803 may comprise aplurality of flow channels that provide a flow path for sample medium.In the example shown in FIG. 36, the on-chip fluidics layer 4803 maycomprise a flow channel 4805, a flow channel 4807, and a flow channel4809. Each of the flow channel 4805, the flow channel 4807, and the flowchannel 4809 may be in the form of an gap that connects an inputaperture to an output aperture.

In some embodiments, the on-chip fluidics layer 4803 may comprisepolymer SU-8 material. Additionally, or alternatively, the on-chipfluidics layer 4803 may comprise other material(s).

In some embodiments, the example method may include attaching theon-chip fluidics layer 4803 to a top surface of the waveguide layer4801. In particular, the plurality of flow channels of the on-chipfluidics layer 4803 (for example, the flow channel 4805, the flowchannel 4807, and the flow channel 4809) may be aligned on top of theoptical channel(s) of the waveguide layer 4801 (for example, the flowchannel 4807 may be aligned on top of the optical channel 4811).

Referring now to FIG. 37, an example apparatus 4900 is illustrated. Inparticularly, the example apparatus may be manufactured in accordancewith embodiments of the present disclosure.

In the example shown in FIG. 37, to manufacture the example apparatus4900, an example method may include producing an adhesive layer 4906,attaching the adhesive layer 4906 on a top surface of the apparatus4800, and attaching a cover glass layer 4908 on a top surface of theadhesive layer 4906. In some embodiments, the apparatus 4800 may be awaveguide with on-chip fluidics layer that is fabricated in accordancewith various examples described herein.

The adhesive layer 4906 may comprise suitable material such as, but notlimited to, silicon. In some embodiments, adhesive material may bedisposed on a top surface of the adhesive layer 4906 and/or a bottomsurface of the adhesive layer 4906, such as, but not limited to,chemical glue.

As shown in FIG. 37, the adhesive layer 4906 may comprise a plurality offlow channels that provide a flow path for sample medium. In the exampleshown in FIG. 37, the adhesive layer 4906 may comprise a flow channel4910, a flow channel 4912, and a flow channel 4914. Each of the flowchannel 4910, the flow channel 4912, and the flow channel 4914 may be inthe form of an gap that connects an input aperture to an outputaperture.

In some embodiments, the plurality of flow channels of the adhesivelayer 4906 may be aligned with and/or overlap with the plurality of flowchannels of the on-chip fluidics layer of the apparatus 4800 asdescribed above. As described above, the apparatus 4800 may comprise anon-chip fluidics layer on the top surface. After attaching the adhesivelayer 4906 on a top surface of the apparatus 4800, each of the flowchannels of the adhesive layer 4906 may be aligned with and/or overlapwith one of the flow channels of the on-chip fluidics layer of theapparatus 4800.

Referring back to FIG. 37, the cover glass layer 4908 may comprisematerial such as glass material.

The cover glass layer 4908 may comprise one or more input openings andone or more output openings. For example, the cover glass layer 4908 maycomprise an input opening 4916, an input opening 4918, and an inputopening 4920. Sample medium may enter through the input opening 4916,the input opening 4918, and the input opening 4920. The cover glasslayer 4908 may comprise an output opening 4922, an output opening 4924,and an output opening 4926. Sample medium may exit through the outputopening 4922, the output opening 4924, and the output opening 4926.

In some embodiments, the input openings and the output openings of thecover glass layer 4908 may be aligned with and/or overlap with the inputapertures and the output apertures of the flow channels in the adhesivelayer 4906. As described above, each of the flow channels in theadhesive layer 4906 may connect an input aperture with an outputaperture. After attaching the cover glass layer 4908 on a top surface ofthe adhesive layer 4906, each of the input openings of the cover glasslayer 4908 may be aligned with and/or overlap with one of the inputapertures of the adhesive layer 4906, and each of the output openings ofthe cover glass layer 4908 may be aligned with and/or overlap with oneof the output apertures of the adhesive layer 4906.

Referring now to FIG. 38, an example apparatus 5000 is illustrated. Inparticularly, the example apparatus 5000 may be manufactured inaccordance with embodiments of the present disclosure.

In the example shown in FIG. 38, to manufacture the example apparatus5000, an example method may include producing an apparatus 4800, andattaching a cover glass component 5001 to the apparatus 4800. In someexamples, the apparatus 4800 may be a waveguide with on-chip fluidicsthat is fabricated in accordance with various examples described herein.In some examples, the cover glass component 5001 may comprise a coverglass layer and an adhesive layer that are fabricated in accordance withvarious examples described herein.

In some embodiments, the example apparatus 5000 may be diced intoindividual sensors with protective films attached.

In various examples of the present disclosure, photonic integratedcircuit may require precision alignment between optical input andoutput, which may limit its application in the mass production and massdeployment. For example, lab-on-a-chip photonic integrated circuitdevices may need field serviceable solution and require precisealignment, which may limit its applications.

As described above, various examples of the present disclosure mayprovide a sample testing device that comprises a waveguide (for example,a waveguide interferometer sensor). In many applications, the waveguidemay only tolerate <+/−5 micron, <+/−2 micron, <+/−10 micron alignmenterror in the X direction (which is along waveguide surface), in the Ydirection (which is perpendicular to waveguide surface) and in the Zdirection (which is a distance from light source to waveguide inputend). However, many sensor packaging process can only achieve +/−25micron die placement accuracy. As such, the best effort active alignmentplacement process may not meet this requirement with limited massproduction capacity, and there is a need for an effective solution forthe field serviceable application in alignment.

In accordance with various examples of the present disclosure, deepsilicon edge etching techniques may be used, as described above. Theetched edges may also provide alignment surface features to directlyalign the waveguide device to micron and submicron level. In someembodiments, the direct alignment device may be used in mass productionwith no alignment adjustment needed and may achieve high productionefficiency. Further, direct drop-in assembly process may also be usedwhen replace the waveguide without the need for a special tool.

In various examples of the present disclose, deep etching techniques maybe implemented on the substrate edges of the silicon waveguide toprovide alignment features in X and Z directions with relative alignmentaccuracy up to the level of silicon wafer process feature size, whichmay be less than 1 tenth of micron. In some embodiments, the alignmentfeature(s) in the Z direction may use silicon top surface as referencewith relative accuracy to the level of silicon wafer film layerthickness, which may be less than 1 hundredths of micron.

In some embodiments, the fitting mechanism for aligning the waveguide inan alignment arrangement may include pushing the waveguide beelastically positioned against the alignment features with directcontact. In some embodiments, the final integration alignment error isthe combination of the alignment feature error and contact gaps betweenthe waveguide and the alignment features, which may achieve thesubmicron level with clean contact surfaces.

In some embodiments, chip scale package may be used with recessed coverglass to expose the alignment features. For example, a spring loadedseating interface may be designed to secure the waveguide relative tothe alignment feature surfaces. In some embodiments, a fluid gasketcomponent (for example, silicone fluid gasket) and a thermal pad mayprovide compression force for contact alignment without additionalmechanism.

Referring now to FIG. 39A, FIG. 39B, and FIG. 39C, example views of anexample waveguide holder component are illustrated. In particular, FIG.39A illustrates an example exploded view of an example waveguide holdercomponent 5100, FIG. 39B illustrates an example top view of the examplewaveguide holder component 5100, and FIG. 39C illustrates an exampleangled view of the example waveguide holder component 5100.

Referring back to FIG. 39A, the example waveguide holder component 5100may comprise a holder cover element 5101 and a fluid gasket element5103.

In some embodiments, the holder cover element 5101 may comprise one ormore openings on a top surface of the holder cover element 5101. Forexample, the holder cover element 5101 may comprise an input opening5105, an input opening 5107, and an input opening 5109. When the examplewaveguide holder component 5100 is in use, sample or reference media maytravel through the input opening 5105, the input opening 5107, and/orthe input opening 5109 and may enter into a waveguide. The holder coverelement 5101 may comprise an output opening 5111, an output opening5113, and an output opening 5115. When the example waveguide holdercomponent 5100 is in use, sample may travel through the output opening5111, the output opening 5113, and/or the output opening 5115, and mayexit from the waveguide.

In some embodiments, the holder cover element 5101 may comprise one ormore alignment features on a side surface for aligning a light source.For example, the one or more alignment features may be in the form ofsurface depressions (for example, the surface depression 5117 and thesurface depression 5119 shown in FIG. 39A). When the light source iscoupled to the waveguide to provide input light, the light source maycomprise protrusions on its side surface that may correspond to thesurface depression 5117 and the surface depression 5119, thereforeenabling the light source to be correctly aligned with the waveguide.

Referring back to FIG. 39A, the fluid gasket element 5103 may compriseone or more channels or inlets/outlets protruding from the top surfaceof the fluid gasket element 5103. For example, the fluid gasket element5103 may comprise an inlet 5121, an inlet 5123, and an inlet 5125. Theinlet 5121 may be coupled to the input opening 5107 of the holder coverelement 5101. The inlet 5123 may be coupled to the input opening 5109 ofthe holder cover element 5101. The inlet 5125 may be coupled to theinput opening 5105 of the holder cover element 5101. When the examplewaveguide holder component 5100 is in use, sample or reference media maytravel through input opening 5107 to the inlet 5121, through the inputopening 5109 to the inlet 5123, and/or through the input opening 5105 tothe inlet 5125, and may enter into a waveguide. In the example shown inFIG. 39A, the fluid gasket element 5103 may comprise an outlet 5131, anoutlet 5127, and an outlet 5129. The outlet 5131 may be coupled to theoutput opening 5111 of the holder cover element 5101. The outlet 5127may be coupled to the output opening 5113 of the holder cover element5101. The outlet 5129 may be coupled to the output opening 5115 of theholder cover element 5101. When the example waveguide holder component5100 is in use, sample or reference media may travel through the outlet5131 to the output opening 5111, through the outlet 5127 to the outputopening 5113, and/or through the outlet 5127 to the output opening 5115,and may exit from a waveguide.

As such, the inlet 5121, the inlet 5123, the inlet 5125, the outlet5131, the outlet 5127, and/or the outlet 5129 may enable the fluidgasket element 5103 to be secured to the holder cover element 5101 whileallowing sample or reference media to travel through. When in use, thefluid gasket element 5103 may be positioned between the holder coverelement 5101 and a waveguide.

In some embodiments, the fluid gasket element 5103 may providecompression force on the waveguide to contact the alignment features ofthe waveguide holder component 5100 (for example, causing the etchededges of the waveguide to be against the alignment features, details ofwhich are described herein).

Referring now to FIG. 39B and FIG. 39C, various example alignmentfeatures associated with the waveguide holder component 5100 are shown.

For example, the waveguide holder component 5100 may comprise at leastan alignment feature 5133 and an alignment feature 5135. In particular,the alignment feature 5133 and the alignment feature 5135 may be in theform of protrusions from an inner side surface of the waveguide holdercomponent 5100. In some embodiments, the alignment feature 5133 and thealignment feature 5135 may be referred to as X-direction alignmentfeatures as they are configured to align a waveguide in a X direction(e.g. a direction that is in parallel with the direction of opticalchannels in the waveguide). For example, the waveguide may comprise oneor more etched and/or recessed edges (details of which are describedherein), and the etched and/or recessed edges may be pushed against thealignment feature 5133 and/or the alignment feature 5135 (which mayelastically contract) of the waveguide holder component 5100 in analignment arrangement, so as to securely and correctly align thewaveguide in the X direction.

Additionally, or alternatively, the waveguide holder component 5100 maycomprise at least an alignment feature 5137 and an alignment feature5139. In particular, the alignment feature 5137 and the alignmentfeature 5139 may be in the form of grooves on an inner surface of thewaveguide holder component 5100. In some embodiments, the alignmentfeature 5133 and the alignment feature 5135 may be referred to asY-direction alignment features as they are configured to align awaveguide in a Y direction (e.g. a direction that is perpendicular tothe direction of optical channels in the waveguide), details of whichare described herein. For example, the waveguide may comprise one ormore etched and/or recessed edges (details of which are describedherein), and the etched and/or recessed edges may be pushed against thealignment feature 5133 and/or the alignment feature 5135 (which mayelastically contract) of the waveguide holder component 5100 in analignment arrangement, so as to securely and correctly align thewaveguide in the Y direction.

Additionally, or alternatively, the waveguide holder component 5100 maycomprise at least an alignment feature 5141. In particular, thealignment feature 5141 may be in the form of a protrusion on an innerside surface of the waveguide holder component 5100. In someembodiments, the alignment feature 5141 may be referred to asZ-direction alignment features as it is configured to align a waveguidein a Z direction (e.g. a direction that is from the light source to theinput end of the waveguide). For example, the waveguide may comprise oneor more etched and/or recessed edges (details of which are describedherein), and the etched and/or recessed edges may be pushed against thealignment feature 5141 of the waveguide holder component 5100 in analignment arrangement, so as to securely and correctly align thewaveguide in the Z direction.

Referring now to FIG. 40A, FIG. 40B, and FIG. 40C, an example waveguide5200 is shown. In various embodiments, the example waveguide 5200 maycomprise a waveguide layer element 5202 and a cover glass layer 5204disposed on a top surface of the waveguide layer element 5202.

In some embodiments, the cover glass layer 5204 may comprise transparentmaterial such as, but not limited to, glass. In some embodiments, thecover glass layer 5204 may comprise one or more openings. For example,the cover glass layer 5204 may comprise an input opening 5208, an inputopening 5206, and/or an input opening 5210, and sample may enter thewaveguide 5200 through the input opening 5208, the input opening 5206,and/or the input opening 5210. The cover glass layer 5204 may comprisean output opening 5218, an output opening 5220, and/or an output opening5222, and sample may exit the waveguide 5200 through the output opening5218, the output opening 5220, and/or the output opening 5222.

In some embodiments, a channel may connect an input opening with anoutput opening. For example, sample or reference media may enter throughthe input opening 5208, travel through the channel 5212, and exit fromthe output opening 5218. Additionally, or alternatively, sample orreference media may enter through the input opening 5206, travel throughthe channel 5214, and exit from the output opening 5220. Additionally,or alternatively, sample or reference media may enter through the inputopening 5210, travel through the channel 5216, and exit from the outputopening 5222.

In some embodiments, the cover glass layer 5204 may comprise at leastone recessed edge. Referring now to FIG. 40B and FIG. 40C, the edge 5224of cover glass layer 5204 may be recessed from the edge of the waveguidelayer element 5202. The recessed edge 5224 may be fabricated through,for example but not limited to, an example etching process describedabove. In some embodiments, the recessed edge 5224 of the cover glasslayer 5204 may support and guide the correct alignment of the waveguide5200.

For example, the recessed edge 5224 may be pushed against the alignmentfeature 5133 and the alignment feature 5135 of the waveguide holdercomponent 5100 shown in FIG. 39B and FIG. 39C when the waveguide 5200 iscorrectly aligned with the waveguide holder component 5100 in the Xdirection.

In some embodiments, the waveguide layer element 5202 may comprise oneor more waveguide layer and a substrate layer. As discussed above, theedges of the waveguide layer of the waveguide layer element 5202 may beetched.

For example, in the example shown in FIG. 40B, the edge 5226 of thewaveguide layer may be etched and become a recessed edge. In someembodiments, the resultant recessed edge of the waveguide layer of thewaveguide layer element 5202 may support and guide the correct alignmentof the waveguide 5200. For example, the etched edge 5226 may be pushedagainst the alignment feature 5133 and the alignment feature 5135 of thewaveguide holder component 5100 shown in FIG. 39B and FIG. 39C when thewaveguide 5200 is correctly aligned with the waveguide holder component5100 in the Y direction.

Additionally, or alternatively, as described above, the input edge 5228of the waveguide layer may be etched and become a recessed edge. In someembodiments, the resultant recessed edge of the waveguide layer of thewaveguide layer element 5202 may support and guide the correct alignmentof the waveguide 5200. For example, the etched edge 5228 may be pushedagainst the alignment feature 5141 of the waveguide holder component5100 shown in FIG. 39B and FIG. 39C when the waveguide 5200 is correctlyaligned with the waveguide holder component 5100 in the Z direction.

Referring now to FIG. 41A and FIG. 41B, example views of an examplesample testing device 5300 are illustrated. In particular, the examplesample testing device 5300 may comprise a waveguide holder component5301, a waveguide 5303, and a thermal pad 5305.

In some embodiments, the waveguide holder component 5301 may be similarto the waveguide holder component 5100 described above in connectionwith FIG. 39A, FIG. 39B, and FIG. 39C. For example, the waveguide holdercomponent 5301 may comprise at least one alignment feature. In someembodiments, the at least one alignment feature may support and guidethe alignment of the waveguide 5303. In some embodiments, the at leastone etched edge of the waveguide 5303 may be pushed against the at leastone alignment feature of the waveguide holder component in an alignmentarrangement.

In some embodiments, the thermal pad 5305 may be configured to providethermal control of the waveguide 5303. In some embodiments, the thermalpad 5305 may provide compression force to the top surface of thewaveguide 5303 for precision alignment.

Immunoassay based sensors may only be suitable for one time use. As anexample, pregnancy test is a disposable lateral immunoassay device, andthe low cost associated with producing the pregnancy test may justifythe disposable nature of such test. However, in many applications,disposable sensors may cause material waste and challenges in disposingpossible bio-hazards. There is a need for a reusable sensor that can berefreshed on-site.

In accordance with various embodiments of the present disclosure, anoptical immunoassay sensor (such as various sample testing devicesdescribed herein) may provide real-time continuous detecting andmonitoring of virus in airborne aerosol or breathe exhale and nasal swabor saliva.

In some embodiments, a refreshable optical immunoassay sensor maycomprise a waveguide (for example, a waveguide evanescent sensor) withsilicon nitride waveguide on the silicon oxide buffered siliconsubstrate. A layer of silane may be added on a silicon oxide coatedsilicon nitride top in the waveguide for antibody to attach. Thewaveguide with optimum distance from the top of the antibody to the topof the silicon nitride enables the best detection sensitivity for thevirus bonding activities induced by the antibody.

In some embodiments, the waveguide may be illuminated with laser lightfrom light input end. The refractive index change in the evanescentfield may introduce interference pattern change in the output field,which may be captured by an imaging component. Data from the imagingcomponent is then processed and reported with the virus detectionresults.

In some embodiments, an antibody solution may be applied through thesample channel of an example sample testing device described herein.After an incubation time, distilled water or buffer solution isdelivered through the sample channel to wash away unattached antibody,leaving a uniform antibody layer on the sensing surface. For example,the buffer solution may be in the form of an aqueous solution that canresist pH change when an acidic or a base (for example, from a sample)is added to the buffer solution. For example, a buffer solution maycomprise a mixture of weak acid and its conjugate base, or vice versa.During the test, the sample medium is fed through the sample channel.Specifically targeted virus may be captured and form a layer of bondedand immobilized virus on the sensing surface. The sample testing devicemay then detect the existence of the virus and its concentration level.

In some embodiments, after positive detection of a specific virus,cleaning fluid may be flushed through the sample channel to clean thesensing surface. After cleaning, the antibody solution is reappliedthrough the sample channel and the waveguide is ready for another test.

As described above, micro fluidics (for example, an on-chip fluidicslayer) may be disposed on the top surface of the waveguide, which mayallow fluids (such as sample medium and reference mediums) to flow ontop of and apply to the sensing area with optimum flow rate andconcentration for virus detection, as well as providing optimizedcleaning and refreshing.

Referring now to FIG. 42A, FIG. 42B, FIG. 42C, and FIG. 42D, an examplewaveguide 5400 and associated methods are illustrated.

In the example shown in FIG. 42A, FIG. 42B, FIG. 42C, and FIG. 42D, theexample waveguide 5400 may be an example sample testing device inaccordance with various examples of the present disclosure. For example,the waveguide 5400 may comprise a substrate layer comprising Si. Thewaveguide 5400 may comprise a waveguide layer disposed on top of thesubstrate layer, and may comprise a layer of SiO2, a layer of Si3N4disposed on top of the layer of SiO2, and one or more layers of SiO2disposed on top of the layer of SiO2. The waveguide 5400 may furthercomprise a layer of SiH4, as shown in FIG. 42A.

In some embodiments, the waveguide 5400 may comprise a fluidicscomponent 5401 disposed on the top surface of the waveguide 5400. Forexample, the fluidics component 5401 may be an on-chip fluidics layerdescribed herein.

Referring now to FIG. 42A, an antibody solution 5403 may be appliedthrough the sample channel of the fluidics component 5401 and/or thewaveguide 5400. For example, the antibody solution 5403 may be injectedthrough an input opening of the sample channel and exit from an outputopening of the sample channel. In some embodiments, the antibodysolution 5403 may comprise suitable antibodies based on the virus to bedetected. In some embodiments, the waveguide 5400 may comprise a layerof silane added on a silicon oxide coated silicon nitride top forantibody to attach.

Subsequent to applying the antibody solution, there is an incubationtime period for the antibody to attach. After the incubation time periodhas passed, a buffer solution (such as distilled water) may be deliveredthrough the sample channel to wash away unattached antibody.

Referring now to FIG. 42B, the buffer solution in the form of the water5407 may be applied through the sample channel of the fluidics component5401 and/or the waveguide 5400. For example, the water 5407 may beinjected through an input opening of the sample channel and exit from anoutput opening of the sample channel. The water 5407 may wash awayunattached antibody from the sample channel, leaving a uniform layer ofantibody 5405 on the sensing surface.

While the description above provides an example of water as a buffersolution, it is noted that the scope of the present disclosure is notlimited to the description above. In some examples, an example buffersolution may comprise one or more additional and/or alternativechemicals and/or compounds.

Referring now to FIG. 42C, during the test, the sample medium may beapplied through the sample channel of the fluidics component 5401 and/orthe waveguide 5400. For example, the sample medium may be injectedthrough an input opening of the sample channel and exit from an outputopening of the sample channel. In some embodiments, the sample may befed into the buffer solution 5409. Specific targeted virus may becaptured by the antibody 5405, which may form a layer of bonded andimmobilized virus on the sensing surface. The sample testing device maythen detect the existence of the virus and its concentration level.

Referring now to FIG. 42D, a cleaning solution 5411 may be flushedthrough the sample channel to clean sensing surface (for example, afterthe positive detection of the virus). In some embodiments, the cleaningsolution 5411 may remove the virus and/or the antibody from the sensingsurface. In some embodiments, the cleaning solution 5411 may comprisesuitable chemicals and/or compound, include, but not limited to,ethanol. After cleaning, the antibody solution 5403 is reapplied throughthe sample channel as shown in FIG. 42A, and the waveguide is ready foranother test.

Embodiment apparatuses may perform any of the various processes,methodologies, and/or computer-implemented methods for advanced sensingand processing described herein, for example as described herein withrespect to various figures herein. In some contexts, one or moreembodiments may be configured with additional and/or alternative modulesembodied in hardware, software, firmware, or a combination thereof, forperforming all or some of such methodologies. For example, one or moreembodiments includes additional and/or alternative hardware, software,and/or firmware configured for performing one or more processes forprocessing interference fringe data embodying interference fringepattern(s) for purposes of identifying and/or classifying anunidentified sample medium. In this regard, a sample testing device,such as those discussed herein and including, without limitation, aninterferometer, may include or otherwise be communicatively linked withadditional modules embodied in hardware, software, firmware, and/or acombination thereof, for performing such additional or alternativeprocessing operations. It should be appreciated that, in someembodiments, such additional modules embodied in hardware, software,firmware, and/or a combination thereof, may additionally oralternatively perform one or more core operations with respect to thefunctioning of the sample testing device, for example activating and/oradjusting one or more light sources, activating and/or adjusting one ormore imaging component(s). In at least one example context, suchadditional and/or alternative modules embodied in hardware, software,firmware, and/or any combination thereof may be configured to performthe operations of the processes described below with respect to variousfigures herein, which may be performed alone or in conjunction hardware,software, and/or firmware of a sample testing device, or in conjunctionwith one or more hardware, software, and/or firmware modules of thesensing apparatus.

Although one or more components are described with respect to functionallimitations, it should be understood that the particular implementationsnecessarily include the use of particular hardware. It should also beunderstood that certain of the components described herein may includesimilar or common hardware. For example, two modules may both leverageuse of the same processor, network interface, storage medium, or thelike to perform their associated functions, such that duplicate hardwareis not required for each module. The use of the terms “module,” and/or“circuitry” as used herein with respect to components of any of theexample apparatuses should therefore be understood to include particularhardware configured to perform the functions associated with theparticular module as described herein.

Additionally or alternatively, the terms “module” and/or “circuitry”should be understood broadly to include hardware and, in someembodiments, software and/or firmware for configuring the hardware. Forexample, in some embodiments, “module” and “circuitry” may includeprocessing circuitry, storage media, network interfaces, input/outputdevices, supporting modules for interfacing with one or more otherhardware, software, and/or firmware modules, and the like. In someembodiments, other elements of the apparatus(es) may provide orsupplement the functionality of the particular module. For example, aprocessor (or processors) may perform one or more operations and/orprovide processing functionality to one or more associated modules, amemory (or memories) may provide storage functionality for one or moreassociated modules, and the like. In some embodiments, one or moreprocessor(s) and/or memory/memories are specially configured tocommunicate in conjunction with one another for performing one or moreof the operations described herein, for example as described herein withrespect to various figures herein.

FIG. 45 illustrates a block diagram of an example apparatus for advancedsensing and processing, in accordance with at least one exampleembodiment of the present disclosure. In this regard, the apparatus 2700as depicted may be configured to perform one, some, or all of themethodologies disclosure herein. In at least one example embodiment, theapparatus 2700 embodies an advanced interferometry apparatus configuredto perform the interferometry processes described herein and one or moreof the advanced sensing and/or processing methodologies described hereinwith respect to various figures herein.

As depicted, apparatus 2700 includes a sample testing device 2706. Thesample testing device may comprise and/or embody one or more devices,embodied in hardware, software, firmware, or a combination thereof, forprojecting one or more interference fringe patterns associated with anunidentified sample medium, and/or capturing sample interference fringedata representing the interference fringe pattern(s) for processing. Insome embodiments, for example, the sample testing device 2706 comprisesor is otherwise embodied by one or more interferometry devices and/orcomponents thereof, for example at least a waveguide, at least one lightsource, at least one imaging component, supporting hardware for suchcomponents, and/or the like. In at least one example embodiment, thesample testing device 2706 is embodied by one or more apparatusesdescribed herein, for example with respect to various figures herein,and/or components thereof. For example, in some embodiments, the sampletesting device embodies an interferometry apparatus configured asdescribed herein with respect to such figures.

Apparatus 2700 further includes processor 2702 and memory 2704. Theprocessor 2702 (and/or co-processor or any other processing circuitryassisting or otherwise associated with the processor(s)) may be incommunication with the memory 2704 via a bus for passing informationamong components of the apparatus. The memory 2704 may be non-transitoryand may include, for example, one or more volatile and/or non-volatilememories. In other words, for example, the memory 2704 may be anelectronic storage device (e.g., a computer readable storage medium).The memory 2704 may be configured to store information, data, content,applications, instructions, or the like, for enabling the apparatus 2700to carry out various functions in accordance with example embodiments ofthe present disclosure. In this regard, the memory 2704 may bepreconfigured to include computer-coded instructions (e.g., computerprogram code), and/or dynamically be configured to store suchcomputer-coded instructions for execution by the processor 2702.

The processor 2702 may be embodied in any one of a myriad of ways. Inone or more embodiments, for example, the processor 2702 includes one ormore processing devices, processing circuitry, and/or the like,configured to perform independently. Additionally or alternatively, insome embodiments, the processor 2702 may include one or more processingdevices, processing circuitry, and/or the like, configured to operate intandem. In some such embodiments, the processor 2702 include one or moreprocessors configured to communicate via a bus to enable independentexecution of instructions, pipelining, an/or multi-threading.Alternatively or additionally still, in some embodiments, the processor2702 is embodied entirely by an electronic hardware circuit speciallydesigned for performing the operations described herein. The use of theterm “processor,” “processing module,” and/or “processing circuitry” maybe understood to include a single-core processor, a multi-coreprocessor, multiple processors internal to the apparatus, other centralprocessing unit(s) (“CPU”), microprocessor(s), integrated circuit(s),field-programmable gate array(s), application specific integratedcircuit(s), and/or remote or “cloud” processors.

In an example embodiment, the processor 2702 may be configured toexecute computer-coded instructions stored in one or more memories, suchas the memory 2704, accessible to the processor 2702. Additionally oralternatively, the processor 2702 may be configured to executehard-coded functionality. As such, whether configured by hardware orsoftware means, or configured by a combination thereof, the processor2702 may represent an entity (e.g., physically embodied in circuitry)capable of performing the operations in accordance with embodiment(s) ofthe present disclosure when configured accordingly. Alternatively, asanother example, when the processor is embodied as an executor ofsoftware instructions, the instructions may specifically configure theprocessor 2702 to perform the algorithm and/or operations describedherein when the instructions are executed.

In at least one example embodiment, the processor 2702, alone or inconjunction with the memory 2704, is configured to provide light sourcetuning functionality, as described herein. In at least one examplecontext, the processor 2702 is configured to perform one or more of theoperations described herein with respect to FIG. 50 and FIG. 51. Forexample, in at least one example embodiment, the processor 2702 isconfigured to adjust a temperature control to affect a sensingenvironment. Additionally or alternatively, in at least one exampleembodiment, the processor 2702 is configured to initiate a calibrationsetup event associated with a light source. Additionally oralternatively, in at least one example embodiment, the processor 2702 isconfigured to capture reference interference fringe data representing acalibrated interference fringe pattern in a calibrated environment, forexample projected via a reference channel of a waveguide. Additionallyor alternatively, in at least one example embodiment, the processor 2702is configured to compare a reference interference fringe data withstored calibration interferometer data, for example to determine arefractive index offset between the reference interference fringe dataand the stored calibration interference data. Additionally oralternatively, in at least one example embodiment, the processor 2702 isconfigured to tune the light source based on the refractive indexoffset. In one or more embodiments, the processor 2702 is configured toadjust a voltage level applied to the light source to adjust a lightwavelength associated with the light source, and/or are configured toadjust a current level applied to the light source to adjust a lightwavelength associated with the light source. In some embodiments, theprocessor 2702 may include or be associated with supporting hardware foradjusting one or more components of a sample testing device, for exampleto adjust a drive current and/or voltage for one or more lightsource(s), to activate one or more imaging component(s) and/or otherwisereceive image data (e.g., interference fringe data) captured by animaging component.

Additionally or alternatively, in at least one example embodiment, theprocessor 2702, alone or in conjunction with the memory 2704, isconfigured to provide refraction index processing functionality, such asto process data and determine one or more refractive index curve(s), asdescribed herein. In at least one example context, the processor 2702 isconfigured to perform one or more of the operations described hereinwith respect to various figures herein. For example, in at least oneexample embodiment, the processor 2702 is configured to receive firstinterference fringe data for an unidentified sample medium andassociated with a first wavelength. Additionally or alternatively, in atleast one example embodiment, the processor 2702 is configured toreceive second interference fringe data for the unidentified samplemedium and associated with a second wavelength. Additionally oralternatively, in at least one example embodiment, the processor 2702 isconfigured to derive refractive index curve data based on the firstinterference fringe data and the second interference fringe data.Additionally or alternatively, in at least one example embodiment, theprocessor 2702 is configured to determine sample identity data based onthe refractive index curve data. In some embodiments, to receive thefirst interference fringe data and second interference fringe data, theprocessor 2702 is configured to trigger a light source to generate thefirst projected light of the first wavelength and the second projectedlight of the second wavelength, and capture the first interferencefringe data representing a first interference fringe pattern from thefirst projected light of the first wavelength, and capture the secondinterference fringe data representing a second interference fringepattern based on the second projected light of the second wavelength. Insome embodiments, to determine the sample identity data based on therefractive index curve, the processor 2702 is configured to query arefractive index data based on the refractive index curve, and/or arefractive index curve and a sample temperature, for example where thesample identity data corresponds to a stored refractive index curve thatbest matches the refractive index curve data.

Additionally or alternatively, in at least one example embodiment, theprocessor 2702, alone or in conjunction with the memory 2704 isconfigured to provide interference fringe data processing functionality,such as to process interference fringe data and identify and/or classifya sample based on such processing, as described herein. In at least oneexample context, the processor 2702 is configured to perform one or moreof the operations described herein with respect to various figuresherein. For example, in at least one example embodiment, the processor2702 is configured to receive sample interference fringe data for anunidentified sample medium. Additionally or alternatively, in at leastone example embodiment, the processor 2702 is configured to provide atleast the sample interference fringe data to a trained sampleidentification model. Additionally or alternatively, in at least oneexample embodiment, the processor 2702 is configured to receive, fromthe sample identification model, sample identity data associated withthe sample interference fringe data. In some such embodiments,additionally or alternatively, the processor 2702 is configured tocollect a plurality of interference fringe data associated with aplurality of known identity labels. In some such embodiments,additionally or alternatively, the processor 2702 is configured tostore, in a training database, each of the plurality of interferencefringe data with the plurality of known sample identity labels. In somesuch embodiments, additionally or alternatively, the processor 2702 isconfigured to train the trained sample identification model from thetraining database. Additionally or alternatively, in some embodiments,the processor 2702 is configured to determine an operational temperatureassociated with a sample environment, and provide the operationaltemperature and the sample interference fringe data to the trainedsample identification model to receive the sample identity data. In someembodiments, to receive the sample interference fringe data for theunidentified sample medium, the processor 2702 is configured to triggera light source to generate a projected light of a determinablewavelength and capture, using an imaging component, the sampleinterferometer data representing a sample interference fringe patternassociated with the projected light.

In at least one example embodiment, the processor 2702 includes a firstsub-processor configured for controlling some or all components of thesample testing device 2706, and a second sub-processor for processinginterference fringe data captured by the sample testing device 2706and/or adjusting one or more components of the sample testing device2706 (e.g., adjusting a drive current and/or drive voltage for a lightsource). In some such embodiments, the first sub-processor may belocated within the sample testing device 2706 for controlling thevarious components described herein, and the second sub-processor may belocated separate from the sample testing device 2706 but communicativelylinked to enable the operations described herein.

FIG. 46 illustrates a block diagram of another example apparatus foradvanced sensing and processing, in accordance with at least one exampleembodiment of the present disclosure. In this regard, the apparatus 2800as depicted may be configured to perform one, some, or all of themethodologies disclosure herein. In at least one example embodiment, theapparatus 2800 embodies an advanced interferometry apparatus configuredto perform the interferometry processes described herein and one or moreof the advanced sensing and/or processing methodologies described hereinwith respect to various figures herein.

The apparatus 2800 may include various components, such as one or moreimaging component(s) 2806, one or more light source(s) 2808, one or moresensing optic(s) 2810, processor 2802, memory 2804, refraction indexprocessing module 2812, light source calibration module 2814, and fringedata identification module 2816. In some embodiments, one or morecomponents are entirely optional (e.g., a refraction index processingmodule, light source calibration module, fringe data identificationmodule, and/or the like), and/or one or more components may be embodiedin part or entirely by another component and/or module associated withthe apparatus 2800 (e.g., the refraction index processing module, lightsource calibration module, and/or fringe data identification modulecombined with the processor). The components similarly named to thosedescribed with respect to FIG. 45, such as the processor 2802 and/ormemory 2804, may be configured similarly as described with respect tothe similarly named components of FIG. 45. Similarly, the imagingcomponent(s) 2806 may be embodied and/or similarly configured to thosesimilarly named components as described herein with respect to variousfigures, light source(s) 2808 may be embodied and/or similarlyconfigured to those similarly named components as described herein withrespect to various figures, and/or sensing optic(s) 2810 may be embodiedand/or similarly configured to those similarly named components asdescribed herein with respect to various figures.

As illustrated, the apparatus 2800 includes the refraction indexprocessing module 2812. In some embodiments, the refraction indexprocessing module 2812, alone or in conjunction with one or more othercomponents such as the processor 2802 and/or memory 2804, to providelight source tuning functionality as described herein. In at least oneexample context, the refraction index processing module 2812 isconfigured to perform one or more of the operations described hereinwith respect to FIG. 50 and FIG. 51. For example, in at least oneexample embodiment, the refraction index processing module 2812 isconfigured to adjust a temperature control to affect a sensingenvironment. Additionally or alternatively, in at least one exampleembodiment, the refraction index processing module 2812 is configured toinitiate a calibration setup event associated with a light source.Additionally or alternatively, in at least one example embodiment, therefraction index processing module 2812 is configured to capturereference interference fringe data representing a calibratedinterference fringe pattern in a calibrated environment, for exampleprojected via a reference channel of a waveguide. As described herein,the reference channel may include a known material associated with aknown and/or determinable refractive index for one or more wavelength(s)and/or operating temperatures. Additionally or alternatively, in atleast one example embodiment, the refraction index processing module2812 is configured to compare a reference interference fringe data withstored calibration interferometer data, for example to determine arefractive index offset between the reference interference fringe dataand the stored calibration interference data. Additionally oralternatively, in at least one example embodiment, the refraction indexprocessing module 2812 is configured to tune the light source based onthe refractive index offset. In one or more embodiments, the refractionindex processing module 2812 is configured to adjust a voltage levelapplied to the light source to adjust a light wavelength associated withthe light source, and/or are configured to adjust a current levelapplied to the light source to adjust a light wavelength associated withthe light source. In some embodiments, the refraction index processingmodule 2812 may include or be associated with supporting hardware foradjusting one or more components of a sample testing device, for exampleto adjust a drive current and/or voltage for one or more lightsource(s), to activate one or more imaging component(s) and/or otherwisereceive image data captured by an imaging component.

As illustrated, the apparatus 2800 further comprises the light sourcecalibration module 2814. Additionally or alternatively, in at least oneexample embodiment, the light source calibration module 2814, alone orin conjunction with one or more other components such as the processor2802 and/or memory 2804, is configured to provide refraction indexprocessing functionality, such as to process data and determine one ormore refractive index curve(s), as described herein. In at least oneexample context, the light source calibration module 2814 is configuredto perform one or more of the operations described herein with respectto FIG. 47 to FIG. 49. For example, in at least one example embodiment,the light source calibration module 2814 is configured to receive firstinterference fringe data for an unidentified sample medium andassociated with a first wavelength. Additionally or alternatively, in atleast one example embodiment, the light source calibration module 2814is configured to receive second interference fringe data for theunidentified sample medium and associated with a second wavelength.Additionally or alternatively, in at least one example embodiment, thelight source calibration module 2814 is configured to derive refractiveindex curve data based on the first interference fringe data and thesecond interference fringe data. Additionally or alternatively, in atleast one example embodiment, the light source calibration module 2814is configured to determine sample identity data based on the refractiveindex curve data. In some embodiments, to receive the first interferencefringe data and second interference fringe data, the light sourcecalibration module 2814 is configured to trigger a light source togenerate the first projected light of the first wavelength and thesecond projected light of the second wavelength, and capture the firstinterference fringe data representing a first interference fringepattern from the first projected light of the first wavelength, andcapture the second interference fringe data representing a secondinterference fringe pattern based on the second projected light of thesecond wavelength. In some embodiments, to determine the sample identitydata based on the refractive index curve, the light source calibrationmodule 2814 is configured to query a refractive index data based on therefractive index curve, and/or a refractive index curve and a sampletemperature, for example where the sample identity data corresponds to astored refractive index curve that best matches the refractive indexcurve data.

As illustrated, the apparatus 2800 further comprises the fringe dataidentification module 2816. Additionally or alternatively, in at leastone example embodiment, the fringe data identification module 2816,alone or in conjunction with one or more other components such as theprocessor 2802 and/or memory 2804, is configured to provide interferencefringe data processing functionality, such as to process interferencefringe data and identify and/or classify a sample based on suchprocessing, as described herein. In at least one example context, thefringe data identification module 2816 is configured to perform one ormore of the operations described herein with respect to FIG. 52 to FIG.54. For example, in at least one example embodiment, the fringe dataidentification module 2816 is configured to receive sample interferencefringe data for an unidentified sample medium. Additionally oralternatively, in at least one example embodiment, the fringe dataidentification module 2816 is configured to provide at least the sampleinterference fringe data to a trained sample identification model.Additionally or alternatively, in at least one example embodiment, thefringe data identification module 2816 is configured to receive, fromthe sample identification model, sample identity data associated withthe sample interference fringe data. In some such embodiments,additionally or alternatively, the fringe data identification module2816 is configured to collect a plurality of interference fringe dataassociated with a plurality of known identity labels. In some suchembodiments, additionally or alternatively, the fringe dataidentification module 2816 is configured to store, in a trainingdatabase, each of the plurality of interference fringe data with theplurality of known sample identity labels. In some such embodiments,additionally or alternatively, the fringe data identification module2816 is configured to train the trained sample identification model fromthe training database. Additionally or alternatively, in someembodiments, the fringe data identification module 2816 is configured todetermine an operational temperature associated with a sampleenvironment, and provide the operational temperature and the sampleinterference fringe data to the trained sample identification model toreceive the sample identity data. In some embodiments, to receive thesample interference fringe data for the unidentified sample medium, thefringe data identification module 2816 is configured to trigger a lightsource to generate a projected light of a determinable wavelength andcapture, using an imaging component, the sample interferometer datarepresenting a sample interference fringe pattern associated with theprojected light. It should be appreciated that, in some embodiments, thefringe data identification module 2816 may include a separate processor,specially configured field programmable gate array (FPGA), and/or aspecially configured application-specific integrated circuit (ASIC),and/or the like.

In some embodiments, one or more of the aforementioned components iscombined to form a single module. The single combined module may beconfigured to perform some or all of the functionality described hereinwith respect to the individual modules combined to form the singlecombined module. For example, in at least one embodiment, the refractionindex processing module 2812, light source calibration module 2814,and/or fringe data identification module 2816, and the processor 2802embodied by a single module. Additionally or alternatively, in someembodiments, one or more of the modules described above may beconfigured to perform one or more of the actions described with respectto such modules.

Some embodiments provided herein are configured for refraction indexprocessing functionality, such as to process data and determine one ormore refractive index curve(s) associated with an unidentified samplemedium as described herein. In this respect, conventionalimplementations have failed to use individual refractive indexdeterminations to accurately perform sample classification and/oridentification. Accordingly, conventional implementations for sampleclassification and identification are deficient with respect toperforming such classification and/or identification utilizingrefractive index processing for an unidentified sample. In this regard,one or more embodiments are provided that are configured to determine arefractive index curve associated with an unidentified sample medium,and/or utilizing the determined refractive index curve(s) to identifyand/or otherwise classify an unidentified sample medium. For example, inat least one example context, the apparatus 2700 and/or 2800 areconfigured to perform such functionality based on captured datarepresenting projected interference fringe pattern. It should beappreciated example interference fringe patterns described with respectto FIG. 45 to FIG. 54 may be embodied in a manner similar to thosedescribed herein with respect to various figures herein.

FIG. 43 depicts an example graphical visualization of a plurality ofderived refractive index curves. For illustrative ad explanatorypurposes, the refractive index curves depicted may be associated with awater sample. In this regard, the refractive index curve may bedetermined from captured interference fringe data projected through thesample. As described herein, in some embodiments, a refractive indexcurve associated with a particular medium (e.g., a known sample mediumor an unidentified sample medium) is derivable based on any of number ofdatapoints, for example any number of interference fringe datapoints,associated with the particular medium. For example, a refractive indexcurve associated with an identified sample medium or unidentified samplemedium may be derived from the associated datapoints using one or morealgorithms (e.g., mathematical calculations), interpolation, and/or thelike.

As depicted, the various refractive index curves are further associatedwith various operating temperatures. For example, a first refractiveindex curve is depicted for the sample at the operational temperature of5 degrees Celsius (C), a second refractive index curve is depicted forthe sample at the operational temperature of 10 C, a third refractiveindex curve is depicted for the sample at the third operationaltemperature of 20 C, and a fourth refractive index curve is depicted forthe sample at the fourth operational temperature of 30 C. It should beappreciated that, for a given sample, any number of refractive indexcurves may be derived for various operational temperatures. For example,in at least one example context, a single refractive index curve arederived for a sample at a single operational temperature. In anotherexample context, a plurality of refractive index curves are derived fora sample at a plurality of operational temperature.

In some embodiments, each refractive index curve is derived from aplurality of interference fringe data embodying captured representationsof interference fringe patterns produced by light with variouswavelengths. For example, an apparatus, such as apparatus 2700 and/or2800, may be configured to project a first light beam of a firstwavelength to produce a first interference fringe pattern for capturingand processing. The apparatus may further capture first interferencefringe data representing the first interference fringe patternassociated with the first wavelength, and derive therefrom a firstrefractive index associated with the first wavelength. In someembodiments, the apparatus may further associate the first refractiveindex with both the first wavelength and an operational temperature. Inthis regard, the first wavelength may be predefined, driven by theapparatus and determinable therefrom (e.g., from memory), and/ordeterminable through communication with one or more light sourcesproducing light at the first wavelength.

The apparatus may further be configured to project a second light beamof a second wavelength to produce a second interference fringe patternfor capturing and processing. In this regard, the second interferencefringe pattern may represent a different interference pattern due to thechange in wavelength of the light that is utilized to project the secondinterference fringe pattern. In this regard, the apparatus may furthercapture second interference fringe data representing the secondinterference fringe pattern associated with the second wavelength andderive therefrom a second refractive index associated with the secondwavelength. In some embodiments, the apparatus may further associate thesecond refractive index with both the second wavelength and theoperational temperature. In this regard, the second wavelength may bepredefined, driven by the apparatus and determinable therefrom, and/ordeterminable through communication with one or more light sourcesproducing light at the second wavelength.

In some embodiments, the apparatus may similarly derive any number ofadditional refractive indices associated with any number of wavelengths.In this respect, each of the derived refractive indices serves as adatapoint for the derived refractive index curve associated with a givenwavelength at a particular operational temperature. Thus, in some suchembodiments, the refractive index curve for a given operationaltemperature may be derived from the various refractive indices, forexample through algorithmic calculation and/or interpolation between thedetermined refractive indices representing datapoints along therefractive index curve. In this regard, each refractive index associatedwith a particular operational temperature may serve as a datapoint alongthe refractive index curve that corresponds to that operationaltemperature. Accordingly, in some example contexts, a plurality ofrefractive index curves associated with a plurality of operationaltemperatures for a given sample medium may be generated, where each ofthe refractive index curves may be determined based on the plurality ofinterference fringe data each representing an individual refractiveindex datapoint for the given sample, light wavelength, and operationaltemperature.

In some embodiments, the apparatus may include and/or otherwise haveaccess to a refractive index database that stores interference fringedata, and/or data derived therefrom (e.g., modulation, frequency, andphase) representing refractive index datapoints for a particular sample,operational temperature, and wavelength. In this regard, the refractiveindex database may be populated with datapoints associated with a knownidentity label for a given sample. Furthermore, based on theinterference fringe data associated with each sample, one or morerefractive index curve(s) may similarly be determined and associatedwith a known sample identity label. For example, the database may beutilized to retrieve data associated with each sample identity label andoperational temperature, and based on the interference fringe dataassociated with each sample identity label and operational temperature acorresponding refractive index curve may be derived. Accordingly, anewly derived refractive index curve associated with an unidentifiedsample medium and known operational temperature can be compared to therefractive index curves derived for samples of known sample identitylabels in the database to determine sample identity data, such as asample identity label, associated with the unidentified sample medium.For example, the apparatus may compare the newly derived refractiveindex curve for the unidentified sample medium with the refractive indexcurves for known sample labels (e.g., where the refractive index curvesfor the known identity labels are stored in the refractive indexdatabase or derived from the information stored therein). Further, insome embodiments the apparatus may be configured to determine therefractive index curve at the particular operational temperature atwhich the interference fringe data was captured for the unidentifiedsample medium that matches and/or best matches the newly derivedrefractive index curve for the unidentified sample medium at theoperational temperature. In some embodiments, for example, theunidentified sample medium is identified and/or classified based on thesample identity data (e.g., a sample identity label) associated with therefractive index curve that best matches the refractive index curve forthe unidentified sample medium. It should be appreciated that the curvethat matches and/or best matches the refractive index curve for theunidentified sample medium may be determined utilizing any one of amyriad of error calculation algorithms, distance algorithms, and/or thelike, and/or other custom algorithms for comparing the similarity of twocurves.

FIG. 47 illustrates a flowchart including example operations of anexample process 2900 for refraction index processing, specifically toidentify sample identity data associated with an unidentified samplemedium, in accordance with at least one example embodiment of thepresent disclosure. It should be appreciated that the various operationsform a process that may be executed via one or more computing devicesand/or modules embodied in hardware, software, and/or firmware (e.g., acomputer-implemented method). In some embodiments, the process 2900 isperformed by one or more apparatus(es), for example the apparatus 2700and/or 2800 as described herein. In this regard, the apparatus mayinclude or otherwise be configured with one or more memory deviceshaving computer-coded instructions stored thereon, and/or one or moreprocessor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 2900 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

The process 2900 begins at block 2902. At block 2902, the process 2900comprises receiving first interference fringe data for an unidentifiedsample medium, wherein the first interference fringe data is associatedwith a first wavelength. In some such embodiments, the firstinterference fringe data embodies a captured representation of aninterference fringe pattern produced by light of the first wavelength,for example via a waveguide. In some such embodiments, the firstinterference fringe data is captured by one or more imaging component(s)associated with the projected first interference fringe pattern.Additionally or alternatively, in some embodiments, the firstinterference fringe data is received from another associated system,loaded from a database embodied on a local and/or remote memory device,and/or the like. In some embodiments, the first interference fringe datais similarly associated with an operational temperature for thewaveguide and/or unidentified sample medium during capture of the firstinterference fringe data. The first interference fringe data, in someembodiments, may be used to derive a first interferometer refractiveindex for the unidentified sample medium associated with the firstwavelength and the operational temperature.

In some embodiments, the interference fringe data represents therefractive index change resulting from introduction of a sample mediuminto a flow channel. In this regard, the separation between therefractive index due to introduction of the sample medium may becalculated. For example, in a circumstance where the change amount is ktimes the original separation of an interference fringe pattern, theoptical path difference may equate to 2kπ. In some embodiments, withrespect to known geometry of the flow channel, the refractive indexchange is calculatable as the path optical different of ΔnL, where Δn isthe refractive index change and L is the equivalent physical length ofthe optical path associated with the flow channel.

At block 2904, the process 2900 further comprises receiving secondinterference fringe data for the unidentified sample medium, wherein thesecond interferometer data is associated with a second wavelength. Inthis regard, in some embodiments, the second interference fringe dataembodies a captured representation of a second interference fringepattern produced by light of the second wavelength, for example via awaveguide. In some embodiments, a second light source may be activatedto produce the second light. In other embodiments, the same light sourceis adjusted to produce both the first light associated with the firstinterference fringe data and the second light associated with the secondinterference fringe data, for example by adjusting a drive currentand/or drive voltage to the light source from a first value associatedwith the first wavelength to a second value associated with the secondwavelength. In some embodiments, the second interference fringe data issimilarly associated with the operational temperature for the waveguideand/or unidentified sample medium during capture of the secondinterference fringe data, which may be the same or nearly the same(e.g., within a predetermined threshold) from the operationaltemperature during capture of the first interference fringe data. Thesecond interference fringe data, in some embodiments, may be used toderive a second interferometer refractive index for the unidentifiedsample medium, where the second interferometer refractive index isassociated with the second wavelength and the operational temperature.

It should be appreciated that the process 2900 may further includereceiving any number of additional interference fringe data associatedwith a myriad of wavelengths. For example, third interference fringedata may be received associated with a third wavelength, and/or fourthinterference fringe data may be received associated with a fourthwavelength. Any such additional interference fringe data may be receivedin a manner similar to that of the first and/or second interferencefringe data described above with respect to blocks 2902 and/or 2904.

At block 2906, the process 2900 further comprises deriving refractiveindex curve data based on (i) the first interference fringe dataassociated with the first wavelength, and (ii) the second interferencefringe data associated with the second wavelength. In some suchembodiments, for example, a first refractive index is derived from thefirst interference fringe data, and a second refractive index is derivedfrom the second interference fringe data. The first and secondrefractive indices may be used to derive the refractive index curve dataassociated with the unidentified sample medium. In some embodiments, therefractive index curve data is derived from the first and secondinterference fringe data using one or more algorithms and/ormathematical calculations. Alternatively or additionally, in someembodiments, the refractive index curve data is derived based oninterpolation between the refractive indices. It should be appreciatedthat in contexts where one or more additional interference fringe dataare received, the refractive index curve data may further be derivedbased on the first interference fringe data, second interference fringedata, and one or more additional interference fringe data.

At block 2908, the process 2900 further comprises determining sampleidentity data based on the refractive index curve data. In someembodiments, the sample identity data is determined by determining therefractive index curve data at the operational temperature most closelymatches known refractive index curve data for a sample associated withknown sample identity data. For example, if the sample refractive indexcurve data most closely corresponds to known refractive index curve dataassociated with a known sample identity label (e.g., distilled water),the sample refractive index curve data may similarly be determined toembody the same known sample identity label (e.g., to representdistilled water). In circumstances where the sample refractive indexcurve data may match more than one known refractive index curve data,the determined sample identity data may embody statistical data based onthe similarity between the sample refractive index curve data and eachof the known refractive index curve data. An example implementation fordetermining the sample identity data based on the refractive index curvedata is described herein with respect to FIG. 49.

FIG. 48 illustrates a flowchart including additional example operationsof an example process 3000 for refraction index processing, specificallyfor receiving at least a first interference fringe data associated witha first wavelength and a second interference fringe data associated witha second wavelength for an unidentified sample medium, in accordancewith at least one example embodiment of the present disclosure. Itshould be appreciated that the various operations form a process thatmay be executed via one or more computing devices and/or modulesembodied in hardware, software, and/or firmware (e.g., acomputer-implemented method). In some embodiments, the process 3000 isperformed by one or more apparatus(es), for example the apparatus 2700and/or 2800 as described herein. In this regard, the apparatus mayinclude or otherwise be configured with one or more memory deviceshaving computer-coded instructions stored thereon, and/or one or moreprocessor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3000 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

As illustrated, the process 3000 begins at block 3002 or block 3004. Insome embodiments, the process begins after one or more operations ofanother process, such as the process 2900 described herein. Additionallyor alternatively, in at least one embodiment, flow returns to one ormore operations of another process, such as the process 2900, uponcompletion of the process illustrated with respect to the process 3000.For example, as illustrated, in some embodiments, flow returns to block2906 upon completion of block 3010.

In some embodiments, the process 3000 begins at block 3002, for examplein circumstances where a single light source is utilized to producemultiple interference fringe patterns associated with multiplewavelengths. At block 3002, the process 3000 comprises triggering alight source to generate (i) first projected light of a firstwavelength, wherein the first projected light is associated with a firstinterferometer fringe pattern and (ii) second projected light of thesecond wavelength, wherein the second projected light is associated witha second interferometer fringe pattern. In this regard, the light sourcemay first be triggered with a first drive current, or drive voltage,associated with the first wavelength, and subsequently triggered with asecond drive current, or drive voltage, associated with the secondwavelength. In other embodiments, the light source may generate a singlelight beam that is split and/or otherwise manipulated by one or moreoptical components into two sub-beams. One or more of the sub-beams maybe manipulated to match the desired first and second wavelengths. Itshould be appreciated that, as described herein, the light source may bea component of a sample testing device, waveguide, and/or similarapparatus, as described herein.

In other embodiments, the process 3000 begins at block 3004, for examplein circumstances where multiple light sources components are utilized toproduce light of different wavelengths associated with the first andsecond interferometer data. At block 3004, the process 3000 comprisestriggering a first light source to generate first projected light of thefirst wavelength, wherein the first projected light is associated with afirst interference fringe pattern. In some embodiments, the first lightsource is triggered based on a first drive current, or first drivevoltage, to cause the first light source to produce the first light ofthe first wavelength. In some embodiments, the first projected light ismanipulated through one or more optical components, for examplecomponents of a waveguide, to produce the first interference fringepattern from the first projected light. In some embodiments, a processorand/or associated module of a sensing apparatus as described herein isconfigured to generate one or more signals to cause triggering of thefirst light source to the appropriate first wavelength.

At block 3006, the process 3000 further comprises triggering a secondlight source to generate second projected light of the secondwavelength, wherein the second projected light is associated with asecond interference fringe pattern. In this regard, in some embodiments,the second light source is triggered based on a second drive current, orsecond drive voltage, to cause the second light source to produce thesecond light of the second wavelength. In at least some suchembodiments, the first drive current or voltage is different from thesecond drive current or voltage, such that the light produced by thefirst and second light sources are of distinct wavelengths. In someembodiments, the second projected light is manipulated through one ormore optical components, for example components of a waveguide, toproduce the second interference fringe pattern from the second projectedlight. In some embodiments, the processor and/or associated module of asensing apparatus as described herein is configured to generate one ormore signals to cause triggering of the second light source to theappropriate second wavelength.

Upon completion of block 3004 or 3006, flow proceeds to block 3008. Atblock 3008, the process 3000 includes capturing, using an imagingcomponent, the first interference fringe data representing the firstinterference fringe pattern associated with the first wavelength. Inthis regard, the first interference fringe pattern is dependent on thefirst wavelength, such that the captured data represents a differentinterference pattern for each different wavelength. The firstinterference fringe data may be processed to determine a refractiveindex associated with the interference pattern. In some embodiments, theimaging component is included in and/or otherwise associated with asample testing device, waveguide, and/or the like, for example asdescribed herein. In this regard, the imaging component may be triggeredby one or more processor(s) and/or associated module(s) associatedtherewith, for example as described herein. In at least one embodiment,the imaging component is embodied by, or a subcomponent of, a separateapparatus communicatively linked with one or more hardware, software,and/or firmware devices for processing such captured image data.

At block 3010, the process 3000 includes capturing, using the imagingcomponent, the second interference fringe data representing the secondinterference fringe pattern associated with the second wavelength. Inthis regard, the second interference fringe pattern is dependent on thesecond wavelength, such that the captured data represents a differentinterference pattern than the first interferometer pattern associatedwith the first wavelength. The second interference fringe data may beprocessed to determine a second refractive index associated with thesecond interference pattern. In some embodiments, the imaging componentis included in and/or otherwise associated with the same sample testingdevice, waveguide, and/or the like, for example as described herein. Inthis regard, the imaging component may be triggered by one or moreprocessor(s) and/or associated module(s) associated therewith, forexample as described herein.

In some embodiments, the first interference fringe data is captured upontriggering projection of a first light of a first wavelength, and thesecond interference fringe data is captured upon triggering projectionof a second light of a second wavelength. In this regard, in someembodiments, block 3008 may occur in parallel with one or moreoperations as described, for example upon projection of the first lightat block 3002 or block 3004. Similarly, in some embodiments, block 3010may occur in parallel with one or more operations as described, forexample upon projection of the first light at block 3002 or block 3006.

FIG. 49 illustrates a flowchart including additional example operationsof an example process 3100 for refraction index processing, specificallyfor determining sample identity data based on the refractive index curvedata, in accordance with at least one example embodiment of the presentdisclosure. It should be appreciated that the various operations form aprocess that may be executed via one or more computing devices and/ormodules embodied in hardware, software, and/or firmware (e.g., acomputer-implemented method). In some embodiments, the process 3100 isperformed by one or more apparatus(es), for example the apparatus 2700and/or 2800 as described herein. In this regard, the apparatus mayinclude or otherwise be configured with one or more memory deviceshaving computer-coded instructions stored thereon, and/or one or moreprocessor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3100 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

The process 3100 begins at block 3102. In some embodiments, the processbegins after one or more operations of another process, such as afterblock 2906 of the process 2900 described herein. Additionally oralternatively, in at least one embodiment, flow returns to one or moreoperations of another process, such as the process 2900, upon completionof the process illustrated with respect to the process 3100.

At block 3102, the process 3100 comprises querying a refractive indexdatabase based on the refractive index curve data, wherein the sampleidentity data corresponds to a stored refractive index curve in therefractive index database that best matches the refractive index curvedata. In some embodiments, the refractive index database is furtherqueried based on an operational temperature, for example the operationaltemperature at which the first and/or second interference fringe datarepresenting interference patterns for the unidentified sample mediumwere captured. In this regard, the refractive index database may bequeried to identify data associated with the same operationaltemperature, and further derive associated refractive index curve datatherefrom for comparison with the sample refractive index curve data.The sample refractive index curve data may be compared with the storedrefractive index curves retrieved from the database, and/or derived fromthe data retrieved therefrom, to determine the best match to the samplerefractive index curve data. For example, in some embodiments, one ormore error and/or distance algorithms may be utilized to determine thestored refractive index curve that best matches the refractive indexcurve data for the unidentified sample medium, In this manner, bydetermining a known refractive index curve that is associated with knownsample identity data and the best match to the sample refractive indexcurve, the sample identity data associated with the closest knownrefractive index curve may represent the identity and/or classificationof the unidentified sample medium, and/or statistical informationassociated therewith.

Some embodiments provided herein are configured for fine tuning a lightsource, such as to refine the wavelength of the light output by thelight source to (or closed to) a desired wavelength. In this regard, thelight source may be fine-tuned to account for environmental effects, forexample discrepancies in projected interference patterns due to shiftscaused by the operational temperature. In at least one example context,the apparatus 2700 and/or 2800 are configured to perform suchfunctionality to fine tune the light output by the light source.

FIG. 44 depicts an example graphical visualization of variableadjustment for fine tuning output of a light source. In this regard, thelight source may be tuned as depicted in the visualization. For example,in at least one example implementation, as the output power of the lightsource is increased, the wavelength of the light produced by the lightsource is decreased. In this regard, the drive current may be adjusted(e.g., increased or decreased) to adjust the wavelength of the lightproduced by the light source to, or closer to (e.g., within anacceptable error threshold), a desired wavelength. For example, in acircumstance where the operating temperature of the sample environmentcauses the wavelength of the light produced by the light source todecrease, the drive current to the light source may be adjusted todecrease the output power of the light source and to increase thewavelength of the produced light. The light source may be adjusted suchthat the wavelength of the light output by the light source approachesand/or matches a desired and/or calibrated wavelength. It should beappreciated that, in other embodiments, the drive voltage applied to thelight source may be adjusted to effectuate adjustment of the lightsource. In some embodiments, the light source includes or is otherwiseassociated with supporting hardware for adjusting the light source, suchas by adjusting the current driving the light source.

FIG. 50 illustrates a flowchart including example operations of anexample process 3200 for light source tuning, specifically to fine tunethe wavelength of the light produced by a light source to calibrate thelight source, in accordance with at least one example embodiment of thepresent disclosure. It should be appreciated that the various operationsform a process that may be executed via one or more computing devicesand/or modules embodied in hardware, software, and/or firmware (e.g., acomputer-implemented method). In some embodiments, the process 3200 isperformed by one or more apparatus(es), for example the apparatus 2700and/or 2800 as described herein. In this regard, the apparatus mayinclude or otherwise be configured with one or more memory deviceshaving computer-coded instructions stored thereon, and/or one or moreprocessor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3200 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

The process 3200 begins at block 3202. At block 3202, the process 3200further comprises initiating a calibration setup event associated with alight source. In this regard, the calibration setup event may triggeruse of a reference channel for storing data for calibration data, forexample calibrated reference interference data, for use in one or morelater calibration operations. In some embodiments, the calibration setupevent is initiated during a factory setup of an apparatus, computerprogram product, and/or the like. Alternatively or additionally, in someembodiments, the calibration setup event is initiated automatically, forexample upon activation of apparatus 2700 and/or 2800, the sampletesting device, and/or the like. Alternatively or additionally, thecalibration setup event may be initiated automatically in response toactivation of an operation for determining sample identity dataassociated with an unidentified sample medium. Alternatively oradditionally still, in one or more embodiments, the calibration setupevent may be initiated in response to user interaction specificallyindicating initiation of the calibration setup event, for example inresponse to predefined user interaction with one or more hardware,software, and/or firmware components for initiating the calibrationsetup event.

At block 3204, the process 3200 further comprises capturing calibratedreference interference fringe data representing a calibratedinterference fringe pattern in a calibrated environment, the calibratedinterference fringe pattern projected via the reference channel of thewaveguide. In this regard, the calibrated interference pattern may beprojected through a reference medium located in the reference channel(e.g., SiO₂) that is used for outputting one or more referenceinterference fringe patterns for calibration purposes (e.g., for tuningand/or otherwise calibrating a wavelength output by a light source). Thecalibrated environment, in some embodiments, comprises a calibratedoperating temperature. In this regard, the sample testing device,waveguide, and/or the like, may be calibrated at an earlier operation,for example at block 3202 or before initiation of the process 3200. Byprojecting an interference fringe pattern via the reference channel ofthe waveguide, the interference fringe pattern represents apre-calibrated result that may be captured and compared to in futurecircumstances to determine whether one or more properties of theapparatus (e.g., a wavelength of the light produced by a light source)has changed. Such properties may change over time due to any one or moreof a myriad of reasons, for example due to deterioration of one or morecomponents of the apparatus, changes in the operating environment,and/or the like.

At block 3206, the process 3200 further comprises storing, in a localmemory, the calibrated reference interference fringe data as the storedcalibration interference fringe data. In this regard, the storedcalibration interference fringe data may be retrieved from the localmemory for use in a subsequent calibration operation. For example asdescribed herein with respect to blocks 3210-3216. For example thecalibrated reference interference fringe data may embody pre-calibratedinterference fringe data for comparison with later-captured interferencefringe data to determine how to adjust one or more light source tore-calibrate, or better calibrate, the wavelength of the light producedby the light source. In some embodiments, for example, the calibratedreference interference fringe data comprises modulation data, frequencydata, phase data, and/or a combination thereof, associated with aprojected calibration interference fringe pattern. It should beappreciated that refractive index datapoints and/or a refractive indexcurve associated with the calibration interference fringe pattern mayagain be determined from the stored calibrated reference interferencefringe data.

At block 3208, the process 3200 further comprises adjusting atemperature control, wherein adjusting the temperature sets a sampleenvironment to a tuned operating temperature, and wherein the tunedoperating temperature is within a threshold range from a desiredoperating temperature. The temperature control may be a component of asample testing device, such as an interferometer device, the apparatus2700 and/or apparatus 2800 as described herein, and/or the like, thatenables altering of the operational temperature at which the apparatusfunctions. In this regard, the sample environment may be adjusted suchthat the light projected through a sample medium (e.g., in a samplechannel) is adjusted towards a desired and/or calibrated wavelength. Forexample, a waveguide may be calibrated for operation at a particularcalibrated operating temperature. The tuned operating temperature may becoarsely tuned (e.g., within a threshold range) from the desiredoperating temperature corresponding to a calibrated operatingtemperature, such that an exact temperature tuning is not required viathe temperature control.

At block 3210, the process 3200 further comprises triggering a lightsource calibration event associated with a light source. In someembodiments, reference captured interference fringe data may bemonitored to determine when the difference in between the stored dataand captured data exceeds a predetermined threshold (e.g., the shift inrefraction index exceeding a predetermined maximum shift beforecalibration occurs). Additionally or alternatively, in at least oneembodiment, the light source calibration event is triggered upondetermination that a predetermined length of time has passed from thesetup event and/or a previously triggered light source calibrationevent. Additionally or alternatively, in at least one embodiment, thelight source calibration event is triggered automatically, for exampleupon initiation of an operation for identifying a sample medium asdescribed herein. Additionally or alternatively, in at least oneembodiment, the light source calibration event is initiated after apredetermined and/or variable number of sample medium identificationevents are initiated.

At block 3212, the process 3200 further comprises capturing referenceinterference fringe data representing a reference interference fringepattern in a sample environment, the reference interference patternprojected via the reference channel of the waveguide. The referenceinterference fringe data may be captured similarly to the calibratedreference interference fringe data as described with respect to block3204. Due to any of a myriad of effects (passing of time, differencesbetween the calibrated environment and sample environment, degradationof one or more optical components, and/or the like), the projectedreference interference pattern may be associated with a differentrefractive index from that of the pre-calibrated pattern represented bythe stored calibration interference data.

At block 3214, the process 3200 further comprises, comparing thereference interference fringe data with the stored calibrationinterference data to determine a refractive index offset between thereference interference fringe data and the stored calibrationinterference data. In some embodiments, for example, the referenceinterference fringe data is processed to derive a first refractive indexassociated with the first interference fringe pattern represented by thereference interference fringe data. Similarly, in some embodiments forexample, the stored calibration interference data is processed to derivea second refractive index associated with the second interference fringepattern represented by the stored calibration interference fringe data.In this regard, the first refractive index and the second refractiveindex may be compared to determine the refractive index offset betweenthe two interference fringe patterns. In some such embodiments, therefractive index offset represents the change in the projected referencepattern due to changes in environment (e.g., operating temperaturechanges from a calibrated temperature to a sample temperature),deterioration of one or more optical and/or hardware device components,changes in the wavelength of the light produced by the light source,and/or the like.

In this regard, in some embodiments, the amount of refractive indexoffset is a result of the waveguide structural and thermal change. Theequivalent length change associated with the refractive index offset maybe derived, and/or otherwise calculated, therefrom. Accordingly, in someembodiments, the proportion of the equivalent length change equates tothe amount of wavelength proportional change that should be adjusted viatuning of the light source, as described herein, to compensate for theoffset.

At block 3216, the process 3200 further comprises tuning the lightsource based on the refractive index offset. In some embodiments, thelight source is tuned to adjust the wavelength of the light output bythe light generation component. For example, in at least one embodiment,one or more values associated with operating the light source are tuned,or otherwise adjusted, based on the refractive index offset between thereference interference fringe data and the stored calibrationinterference data. In this regard, by tuning the light source, thereference interference fringe pattern produced via the reference channelis adjusted to more closely match the calibrated interference fringepattern represented by the stored calibration interference data. Exampleoperations for tuning the light source are further described herein withrespect to FIG. 51.

FIG. 51 illustrates a flowchart including additional example operationsof an example process 3300 for refraction index processing, specificallyfor tuning a light source, in accordance with at least one exampleembodiment of the present disclosure. It should be appreciated that thevarious operations form a process that may be executed via one or morecomputing devices and/or modules embodied in hardware, software, and/orfirmware (e.g., a computer-implemented method). In some embodiments, theprocess 3300 is performed by one or more apparatus(es), for example theapparatus 2700 and/or 2800 as described herein. In this regard, theapparatus may include or otherwise be configured with one or more memorydevices having computer-coded instructions stored thereon, and/or one ormore processor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3300 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

The process 3300 begins at block 3302 and/or block 3304. In someembodiments, the process begins after one or more operations of anotherprocess, such as after block 3214 of the process 3200 described herein.Additionally or alternatively, in at least one embodiment, flow returnsto one or more operations of another process, such as the process 3200,upon completion of the process illustrated with respect to the process3300.

At block 3302, the process 3300 includes adjusting a voltage levelapplied to the light source to adjust a light wavelength associated withthe light source. In this regard, by adjusting the voltage level appliedto the light source, the light produced by the light source maysimilarly be altered based on the adjustment amount, for example asdepicted and described with respect to FIG. 44. In some embodiments, thevoltage level to be applied to the light source is stored in one or morecomponents, such as in a cache, memory device, and/or the like.Alternatively or additionally, in some embodiments, a processor and/orassociated module transmits one or more signals to the light sourceand/or supporting hardware to cause the voltage level applied to thelight source to be adjusted. In some such embodiments, an adjustmentvalue (e.g., how much to adjust the voltage level applied to the lightsource) is determined based on the refractive index offset between thereference interference fringe data and the stored calibrationinterference data. In this regard, the larger the offset between the twodata (e.g., caused by larger changes in operation of the waveguide,and/or associated components), the larger adjustments will be made toattempt to recalibrate the apparatus.

Alternatively or additionally, in some embodiments, the process 3300begins at block 3304. At block 3304, the process 3300 further comprisesadjusting a current level applied to the light source to adjust a lightwavelength associated with the light source. In this regard, byadjusting the current level applied to the light source, the lightproduced by the light source may similarly be altered based on theadjustment amount, for example as depicted and described with respect toFIG. 44. In some embodiments, the current level to be applied to thelight source is stored in one or more components for subsequentactivations of the light source. In some embodiments, a processor and/orassociated module transmits one or more signals to the light sourceand/or supporting hardware to cause the current level applied to thelight source to be adjusted. In some such embodiments, an adjustmentvalue (e.g., how much to adjust the current level applied to the lightsource) is determined based on the refractive index offset. In thisregard, the larger the offset between the two data (e.g., caused bylarger changes in operation of the waveguide, and/or associatedcomponents), the larger the adjustment that will be made in attempt torecalibrate the apparatus. It should be appreciated that in someembodiments, hardware, software, and/or firmware is included to drivethe current level applied to trigger a light source as preferred overother properties, such as voltage, resistance, and/or the like.

It should be appreciated that, in some embodiments, both voltage andcurrent are adjusted to effectuate a change in the wavelength associatedwith the light source. Accordingly in some embodiments, the process 3300includes both blocks 3302 and 3304. In other embodiments, adjustmentsare driven only to one of voltage and/or current to effectuate tuning ofthe light source.

Some embodiments provided herein are configured for processinginterference fringe data to enable sample identification and/orclassification, such utilizing one or more statistical and/or machinelearning modules, associated with at least one example embodimentherein. In this regard, the features of the interference fringe datarepresenting produced interference fringe patterns may be processed byone or more statistical, machine learning, and/or algorithmic models.

By utilizing statistical, machine learning, and/or algorithmic models,sample identity data (e.g., sample label data and/or statisticalinformation such as one or more confidence score(s) associatedtherewith) may be determined for an unidentified sample medium utilizingsuch models. In this regard, such implementations may be utilized evenin contexts where other attempted sample identity data determination(s)may not succeed. For example, such image-based classification and/oridentification may be utilized even in circumstances where a refractiveindex change in a sample medium under test may be insufficient toidentify such sample identity data.

It should be appreciated that embodiments may include machine learningmodels, statistical models, and/or other models trained on any one ormore of a myriad of types of interference fringe data. For example, inat least one embodiment, a model (e.g., a sample identification model)is trained based on interference fringe data embodying rawrepresentations of captured interference patterns. Alternatively oradditionally, in at least one embodiment, a model is trained based oninterference fringe data embodying refractive index data, and/or dataassociated therewith such as a modulation, frequency, and/or phase. Thetype of data utilized for training may be selected based on one or morefactors, such as the specific task to be performed, available trainingdata, and/or the like. In this regard, by receiving interference fringedata, and/or associated input data such as an operational temperature,the model may provide data indicating a statistical closest matchinglabel associated with the input data based on corresponding interferencefringe data corresponding to the same or a similar operationaltemperature.

In some such embodiments, the sample testing device (e.g., a waveguide)is configured to capture interference fringe data associated with asample medium being tested for purposes of performing identificationand/or classification of the sample medium. The captured interferencefringe data may further be associated with a known and/or determinableoperating temperature and/or wavelength associated with the lightproduced by the light source. Thus, the captured interference fringedata and/or data derived therefrom, may be input into a trained sampleidentification model (e.g., embodied by one or more statistical,algorithmic, and/or machine learning model(s)) alone or together withthe operating temperature value and/or a determined wavelength toimprove generate sample identity data associated with the sample medium.

The trained sample identification model, in some embodiments, is trainedon a plurality of data samples associated with known sample identitylabel (e.g., samples for which a classification is known). In thisregard, a training database may be constructed including data, such asinterference fringe data, associated with any number of known samplemediums. In at least one example context, the training database isconfigured to store processed captured representations of interferencefringe pattern(s), for example by storing a modulation value, frequencyvalue, and/or phase value to minimize the required storage space whilemaintaining all raw information available via the interference fringepattern. In this regard, the raw fringe data may then be inversereconstructed to the test sample effective temperature-spectralrefractive index distribution in the sampled area. Additionally oralternatively, in some embodiments, the training database includesinterference fringe data associated with such known sample mediums atvarious operating temperatures and/or associated with variouswavelengths. In this regard, the training database may be used to trainthe sample identification model(s) to identify any number of samplemediums, and further identify such sample mediums based on interferencefringe data associated with varying temperatures and/or wavelengths. Inyet other implementations the training database may include any numberof additional data types, for example sample density profile, particlecount, average size and/or dimensions of sample medium, and/or the like.

In at least one example context, the interference fringe data processingfor advanced sample identification methodologies described herein may beused for virus identification, such as to identify novel COVID-19 asdistinguished from other viruses. In this regard, a sensing apparatus,such as a waveguide interferometer biosensor described herein, may beused to capture interference fringe data associated with a sample medium(e.g., a virus specimen) under various spectral wavelength andtemperature conditions. Collected virus spectral refractive index datamay be collected and stored in a training database that is used torefine and/or otherwise train one or more sample identification model(s)to identify different sample identities (e.g., virus types) with highmatching accuracy that improves as the collected dataset expands. Inthis regard, the inverse transform algorithm can be constructed toreconstruct the refractive index change profile in the testing area, andthe sample identification model (e.g., a neural network for example) maybe used for classification upon training via the collected trainingdatabase to output determined identity label(s), confidence score(s)associated with such label(s). Such sample identity data associated witha tested unidentified sample medium (e.g., an identity label and/orconfidence score(s) in some embodiments) may be displayed to a user forviewing.

FIG. 52 illustrates a flowchart including example operations of anexample process 3400 for interference fringe data processing foradvanced sample identification, specifically using a trained sampleidentification module, in accordance with at least one exampleembodiment of the present disclosure. It should be appreciated that thevarious operations form a process that may be executed via one or morecomputing devices and/or modules embodied in hardware, software, and/orfirmware (e.g., a computer-implemented method). In some embodiments, theprocess 3400 is performed by one or more apparatus(es), for example theapparatus 2700 and/or 2800 as described herein. In this regard, theapparatus may include or otherwise be configured with one or more memorydevices having computer-coded instructions stored thereon, and/or one ormore processor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3400 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

The process 3400 begins at block 3402. At block 3402, the process 3400comprises collecting a plurality of interference fringe data, theplurality of interference fringe data associated with a plurality ofknown identity labels. In this regard, a sample testing device, such asthe apparatus 2700 or 2800 described herein, may be utilized to producean interference fringe pattern for a sample medium having a knownidentity (e.g., associated with a known identity label). The capturedinterference fringe data may be stored locally, and/or transmitted toanother system (such as an external server) over a wired and/or wirelesscommunicate network for storage and/or processing of the data. Forexample, in some embodiments the captured interference fringe data istransmitted over a wireless communication network (e.g., the Internet)accessible to the sample testing device for storage in a centraldatabase server together with sample identity data (e.g., a knownidentity label) provided by the user. In this manner, the collectedinterference fringe data each correspond to sample identity data, suchas a known identity label, that the user knows to be correct. Thus, suchdata may be used for purposes of training one or more model(s) withstatistical certainty. The central database server may be furtherconfigured to train one or more models based on such data, and/orcommunicate with another server, device, system, and/or the like that isconfigured for performing such model training. The server, device,system, and/or the like that performs the model training mayadditionally or alternatively be configured to provide the trained modelfor use by a sample testing device and/or associated processingapparatus, for example the apparatuses 2700 and/or 2800. It should beappreciated that as the number of collected interference fringe dataincreases, the model(s) trained on such data are likely to operate withimproved accuracy as opposed to training with small data sets.

At block 3404, the process 3400 further comprises storing, in a trainingdatabase, each of the plurality of interference fringe data with theplurality of known sample identity labels. In this regard, eachinterference fringe data, and/or data derived therefrom (e.g., thatrepresents the interference fringe data) may be stored to the trainingdatabase with an additional data value embodying the known identitylabel. Thus, each data record stored in the training database may beretrieved together with the corresponding correct identity label for theassociated sample medium. In some embodiments, each of the plurality ofinterference fringe data is also stored together with a correspondingwavelength for the light utilized to generate a correspondinginterference fringe pattern, and/or a sample temperature at which theprojection of the interference fringe pattern and subsequent capturingoccurred.

At block 3406, the process 3400 further comprises training the trainedsample identification model from the training database. In this regard,training may involve fitting a sample identification model to the datarepresented in the training database. It should be appreciated that suchoperations may include segmenting the training database into one or moresubgroupings of data, for example a training set and one or more testsets, and/or the like. Accordingly, upon completion of training themodel, the trained sample identification model is configured to generateidentity label data for newly provided interference fringe data,wavelength, and/or temperature, such as for an unidentified samplemedium. The trained sample identification model may be stored on and/orotherwise made accessible to the sample testing device for use inidentifying and/or otherwise classifying unidentified sample medium(s).

It should be appreciated that blocks 3402-3406 embody a sub-process fortraining a trained sample identification. Accordingly, such blocks maybe performed alone or in conjunction with the remaining blocks depictedand described with respect to process 3400.

At block 3408, the process 3400 further comprises receiving sampleinterference fringe data for an unidentified sample medium, the sampleinterference fringe data associated with a determinable wavelength. Insome such embodiments, the interference fringe data embodies a capturedrepresentation of an interference fringe pattern produced by light ofthe determinable wavelength, for example via a waveguide and/or othersample testing device. In some embodiments, the determinable wavelengthmay be determined based on communication with the light source and/orone or more associated components (e.g., a processor and/or associatedmodule configured for controlling the light source) as described herein.As described, in some such embodiments, the interference fringe data iscaptured by one or more imaging component(s) associated with theprojected interference fringe pattern. Additionally or alternatively, insome embodiments, the interference fringe data is received from anotherassociated system, loaded from a database embodied on a local and/orremote memory device, and/or the like. In some embodiments, theinterference fringe data is similarly associated with an operationaltemperature for the waveguide and/or unidentified sample medium duringcapture of the interference fringe data.

At block 3410, the process 3400 further comprises providing at least thesample interference fringe data to a trained sample identificationmodel. At block 3412, the process 3400 further comprises receiving, fromthe trained sample identification model, sample identity data associatedwith the unidentified sample medium. In this regard, the trained sampleidentification model is configured to generate the sample identity databased on processing the sample interference fringe data. It should beappreciated that, in this regard, the trained sample identificationmodel may analyze various features embodied in the data, and determinesample identity data and/or statistical information associated therewiththat is most likely for the unidentified sample. For example, in atleast one example embodiment, the trained sample identification modelgenerates and/or otherwise outputs sample identity data comprising asample identity label for a most likely classification (e.g., associatedwith the highest statistical probability) for the unidentified samplemedium. In at least one example embodiment, the trained sampleidentification model generates and//or otherwise outputs statisticalsample identity data representing a likelihood that the unidentifiedsample medium corresponds to each of one or more sample identity labels.For example, in the context of virus classification, the statisticalsample identity data may comprise a first likelihood of a virus samplebeing an influenza virus based on the corresponding interference fringedata as opposed to a common cold virus. It should be appreciated that,in some embodiments, the trained sample identification model is providedthe sample interference fringe data and additional data, for exampleoperational temperature data as described herein. In at least oneexample embodiment, the trained sample identification model comprises adeep neural network. In some example embodiments, the trained sampleidentification model comprises a convolutional neural network.

FIG. 53 illustrates a flowchart including additional example operationsof an example process 3500 for interference fringe data processing foradvanced sample identification, specifically for receiving at least theinterference fringe data associated with a determinable wavelength foran unidentified sample medium, in accordance with at least one exampleembodiment of the present disclosure. It should be appreciated that thevarious operations form a process that may be executed via one or morecomputing devices and/or modules embodied in hardware, software, and/orfirmware (e.g., a computer-implemented method). In some embodiments, theprocess 3500 is performed by one or more apparatus(es), for example theapparatus 2700 and/or 2800 as described herein. In this regard, theapparatus may include or otherwise be configured with one or more memorydevices having computer-coded instructions stored thereon, and/or one ormore processor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3500 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

As illustrated, the process 3500 begins at block 3502. In someembodiments, the process begins after one or more operations of anotherprocess, such as after block 3406 of the process 3400 as describedherein. Additionally or alternatively, in at least one embodiment, flowreturns to one or more operations of another process, such as theprocess 3400, upon completion of the process illustrated with respect tothe process 3500. For example, as illustrated, in some embodiments, flowreturns to block 3410 upon completion of block 3504.

As illustrated, process 3500 begins at block 3502. At block 3502, theprocess 3500 comprises triggering a light source to generate a projectedlight of the determinable wavelength, wherein the projected light isassociated with a sample interference fringe pattern. In this regard,the sample interference fringe pattern is associated with theunidentified sample. In some embodiments, the light source is triggeredbased on a drive current, or drive voltage, to cause the light source toproduce the light of the determinable wavelength. In some embodiments,the projected light is manipulated through one or more opticalcomponents, for example components of a waveguide or other sampletesting device, to produce the sample interference fringe pattern fromthe projected light. In some embodiments, a processor and/or associatedmodule of a sensing apparatus as described herein is configured togenerate one or more signals to cause triggering of the light source tothe appropriate determinable wavelength.

At block 3504, the process 3500 includes capturing, using an imagingcomponent, the sample interference fringe data representing the sampleinterference fringe pattern associated with the determinable wavelength.In this regard, the sample interference fringe pattern is dependent onthe determinable wavelength, such that the captured data represents aspecific interference pattern corresponding to the determinablewavelength. In some embodiments, the imaging component is included inand/or otherwise associated with a sample testing device, waveguide,and/or the like, for example as described herein. In this regard, theimaging component may be triggered by one or more processor(s) and/orassociated module(s) associated therewith, for example as describedherein. The captured sample interference fringe data may subsequent beinput into the trained sample identification module for purposes ofidentifying and/or otherwise classifying the unidentified sample.

FIG. 54 illustrates a flowchart including additional example operationsof an example process 3600 for interference fringe data processing foradvanced sample identification, specifically for generating sampleidentity data based on at least sample interference fringe data and anoperational temperature, in accordance with at least one exampleembodiment of the present disclosure. It should be appreciated that thevarious operations form a process that may be executed via one or morecomputing devices and/or modules embodied in hardware, software, and/orfirmware (e.g., a computer-implemented method). In some embodiments, theprocess 3600 is performed by one or more apparatus(es), for example theapparatus 2700 and/or 2800 as described herein. In this regard, theapparatus may include or otherwise be configured with one or more memorydevices having computer-coded instructions stored thereon, and/or one ormore processor(s) (e.g., processing modules) configured to execute thecomputer-coded instructions and perform the operations depicted.Additionally or alternatively, in some embodiments, computer programcode for executing the operations depicted and described with respect toprocess 3600 may be stored on one or more non-transitorycomputer-readable storage mediums of a computer program product, forexample for execution via one or more processors associated with, orotherwise in execution with, the non-transitory computer-readablestorage medium of the computer program product.

As illustrated, the process 3600 begins at block 3602. In someembodiments, the process begins after one or more operations of anotherprocess, such as after block 3408 of the process 3400 as describedherein. Additionally or alternatively, in at least one embodiment, flowreturns to one or more operations of another process, such as theprocess 3400, upon completion of the process illustrated with respect tothe process 3600. For example, as illustrated, in some embodiments, flowreturns to block 3412 upon completion of block 3604.

As illustrated, process 3600 begins at block 3602. At block 3602, theprocess 3600 comprises determining an operational temperature associatedwith a sample environment. In some embodiments, the sample environmentcomprises a defined sample channel within which the unidentified samplemedium is located for testing (e.g., for identification purposes),and/or through which light is projected. In some embodiments, theoperational temperature is monitored and/or otherwise determined usingtemperature monitoring device(s), such as one or more temperaturemonitoring hardware devices. It should be appreciated that theoperational temperature may be read from such temperature monitoringdevices for purposes of determining the operational temperatureassociated with the sample environment, and/or otherwise associated withthe sample medium, during testing of the unidentified sample medium. Inother embodiments, the operational temperature is predetermined. In yetother embodiments, the sample environment may include an operationaltemperature associated with the entirety of a sample testing device,waveguide, associated apparatus such as the apparatus 2700 or 2800,and/or the like. It should be appreciated that, in some embodiments,temperature sensors associated with a sample testing device, waveguide,and/or the like may be utilized for monitoring and/or otherwisecontrolling the operational temperature for testing sample mediums asdescribed herein.

At block 3604, the process 3600 further comprises providing theoperational temperature and the sample interference fringe data to thetrained sample identification model, wherein the sample identity data isreceived in response to the operational temperature and the sampleinterference fringe data. In this regard, the trained sampleidentification model may be configured to generate and/or otherwiseoutput sample identity data for the unidentified sample based on suchinput data. Thus, the trained sample identification model is configuredto accurately output sample identity label(s), and/or statisticalinformation associated therewith, for individual unidentified samplemedium(s) while accounting for shifts in the interference fringe patternassociated with changes in the operating temperature of the sampleenvironment. In other embodiments, as described herein, the trainedsample identification model may be trained to further receive one ormore additional input data elements, such as a wavelength associatedwith the sample interference fringe data, and/or the like.

Bi-modal waveguide interferometer sensors may have the advantage of highsensitivity and low manufacturing process requirement, and silicon waferprocess may be implemented to mass produce bi-modal interferometersensors. However, many bi-modal interferometer fringe analysis based onbi-modal interferometer sensors may have limitations. For example,bi-modal interferometer fringe analysis based on ratio of fringe shiftfail to provide accurate results.

In accordance with various embodiments of the present disclosure, anenhanced bi-modal waveguide interferometer fringe pattern analysisprocess may be provided, where the enhanced analysis process may includeadditional feature extractions. For example, instead of calculatingratio of amplitudes sampled at two side of the fringe pattern, theenhanced analysis process may use statistical metrics to extract patternamplitude (sum), pattern center shift amount (mean), patterndistribution width (standard deviation), pattern profilenon-symmetricity (skewness), and/or pattern distribution outliers(kurtosis). The enhanced analysis process may increase the bi-modalinterferometer sensitivity by detecting detailed differences among thetest sample and reference media.

Referring now to FIG. 55, an example diagram illustrating an exampleinfrastructure 5500 is shown.

In the example shown in FIG. 55, a light source 5501 may provide lightto the sample testing device 5503. In some examples, the light source5501 may be configured to produce, generate, emit, and/or trigger theproduction, generation, and/or emission of light. The example lightsource 5501 may include, but is not limited to, laser diodes (forexample, violet laser diodes, visible laser diodes, edge-emitting laserdiodes, surface-emitting laser diodes, and/or the like. In someexamples, the light source 5501 may be configured to generate lighthaving a spectral purity within a predetermined threshold. For example,the light source 5501 may comprise a laser diode that may generate asingle-frequency laser beam. Additionally, or alternatively, the lightsource 5501 may be configured to generate light that having variances inspectral purity. For example, the light source 5501 may comprise a laserdiode that may generate a wavelength-tunable laser beam. In someexamples, the light source 5501 may be configured to generate lighthaving a broad optical spectrum.

In some embodiments, the sample testing device 5503 may comprise awaveguide (for example, bi-modal waveguide). As light travels throughthe sample testing device 5503, an interferometric fringe pattern may begenerated at the output end of the sample testing device 5503 asdescribed herein. In the example shown in FIG. 55, an area imagingcomponent 5505 may be arranged at the output end of the sample testingdevice 5503 to directly capture the image 5507 of the interferometricfringe pattern to generate interference fringe data.

In accordance with various examples of the present disclosure, theinterference fringe data and the interferometric fringe pattern may beanalyzed with statistical process to obtain one or more statisticalmetrics. Example statistical metrics may include, but not limited to, asum associated with the interference fringe data/interferometric fringepattern, a mean associated with the interference fringedata/interferometric fringe pattern, a standard deviation associatedwith the interference fringe data/interferometric fringe pattern, askewness associated with the interference fringe data/interferometricfringe pattern, and/or a Kurtosis value associated with the interferencefringe data/interferometric fringe pattern. By comparing thesestatistical metrics associated with an unidentified sample medium tostatistical metrics associated with an identified reference medium, theidentity of the unidentified sample medium may be determined, and theresult may have higher accuracy with higher confidence level.

Referring now to FIG. 56, FIG. 57, and FIG. 58, various example methodsassociated with examples of the present disclosure are illustrated.

Referring now to FIG. 56, the example process 5600 may start at block5602.

At block 5604, the process 5600 may comprise receiving interferencefringe data for an identified reference medium.

In some embodiments, the interference fringe data embodies a capturedrepresentation of an interference fringe pattern produced by light andvia a sample testing device in accordance with embodiments of thepresent disclosure (for example, a waveguide). In some embodiments, thefringe data is captured by one or more imaging component(s) associatedwith the projected interference fringe pattern. Additionally oralternatively, in some embodiments, the interference fringe data isreceived from another associated system, loaded from a database embodiedon a local and/or remote memory device, and/or the like.

The interference fringe data, in some embodiments, may be used to deriveone or more statistical metrics, as described herein.

At block 5606, the process 5600 may comprise calculating a plurality ofstatistical metrics based on the interference fringe data.

In some embodiments, the process 5600 may comprise calculating a sumassociated with the interference fringe data. The sum may represent thearea under the pattern distribution (for example, a total energyreceived as the result of the optical efficiency).

In some embodiments, the process 5600 may comprise calculating a meanassociated with the interference fringe data. The mean may represent acenter shift of the pattern. For example, the mean may represent thetotal path length difference between two modes of the waveguide that isintroduced by the refractive index change.

In some embodiments, the process 5600 may comprise calculating astandard deviation associated with the interference fringe data. Thestandard deviation may represent a width of the pattern, includingvariation of the refractive index over the sample area.

In some embodiments, the process 5600 may comprise calculating askewness associated with the interference fringe data. The skewness mayrepresent a symmetry of the pattern, including any additional sampleresponse difference under two modes of the waveguide.

In some embodiments, the process 5600 may comprise calculating aKurtosis value associated with the interference fringe data. TheKurtosis value may represent the shape of the pattern and identify extraoutlier of the sample response (for example, the degree of the shapebeing tall or flat).

At block 5608, the process 5600 may comprise storing the plurality ofstatistical metrics in a database.

At block 5610, the process 5600 ends.

Referring now to FIG. 57, the example process 5700 may start at block5701.

At block 5703, the process 5700 may comprise receiving interferencefringe data for an unidentified sample medium.

In some embodiments, the interference fringe data embodies a capturedrepresentation of an interference fringe pattern produced by light andvia a sample testing device in accordance with embodiments of thepresent disclosure (for example, a waveguide). In some embodiments, thefringe data is captured by one or more imaging component(s) associatedwith the projected interference fringe pattern. Additionally oralternatively, in some embodiments, the interference fringe data isreceived from another associated system, loaded from a database embodiedon a local and/or remote memory device, and/or the like.

At block 5705, the process 5700 may comprise calculating at least onestatistical metric based on the interference fringe data.

In some embodiments, the process 5700 may comprise calculating a sumassociated with the interference fringe data. The sum may represent thearea under the pattern distribution (for example, a total energyreceived as the result of the optical efficiency).

In some embodiments, the process 5700 may comprise calculating a meanassociated with the interference fringe data. The mean may represent acenter shift of the pattern. For example, the mean may represent thetotal path length difference between two modes of the waveguide that isintroduced by the refractive index change.

In some embodiments, the process 5700 may comprise calculating astandard deviation associated with the interference fringe data. Thestandard deviation may represent a width of the pattern, includingvariation of the refractive index over the sample area.

In some embodiments, the process 5700 may comprise calculating askewness associated with the interference fringe data. The skewness mayrepresent a symmetry of the pattern, including any additional sampleresponse difference under two modes of the waveguide.

In some embodiments, the process 5700 may comprise calculating aKurtosis value associated with the interference fringe data. TheKurtosis value may represent the shape of the pattern and identify extraoutlier of the sample response (for example, the degree of the shapebeing tall or flat).

At block 5707, the process 5700 may comprise comparing the at least onestatistical metric with one or more statistical metrics associated withone or more identified media.

For example, the process 5700 may comprise comparing the sum associatedwith the interference fringe data for the unidentified sample mediumwith one or more sums, each associated with the interference fringe datafor an identified reference medium, and calculating one or moredifferences. The process 5700 may comprise determining whether each ofthe differences satisfies a threshold, details of which are described inconnection with at least FIG. 58.

Additionally, or alternatively, the process 5700 may comprise comparingthe mean associated with the interference fringe data for theunidentified sample medium with one or more means, each associated withthe interference fringe data for an identified reference medium, andcalculating one or more differences. The process 5700 may comprisedetermining whether each of the differences satisfies a threshold,details of which are described in connection with at least FIG. 58.

Additionally, or alternatively, the process 5700 may comprise comparingthe standard deviation associated with the interference fringe data forthe unidentified sample medium with one or more standard deviations,each associated with the interference fringe data for an identifiedreference medium, and calculating one or more differences. The process5700 may comprise determining whether each of the differences satisfiesa threshold, details of which are described in connection with at leastFIG. 58.

Additionally, or alternatively, the process 5700 may comprise comparingthe skewness associated with the interference fringe data for theunidentified sample medium with one or more skewnesses, each associatedwith the interference fringe data for an identified reference medium,and calculating one or more differences. The process 5700 may comprisedetermining whether each of the differences satisfies a threshold,details of which are described in connection with at least FIG. 58.

Additionally, or alternatively, the process 5700 may comprise comparingthe Kurtosis value associated with the interference fringe data for theunidentified sample medium with one or more Kurtosis values, eachassociated with the interference fringe data for an identified referencemedium, and calculating one or more differences. The process 5700 maycomprise determining whether each of the differences satisfies athreshold, details of which are described in connection with at leastFIG. 58.

Additionally, or alternatively, other statistical metrics may be used.

At block 5709, the process 5700 may comprise determining sample identitydata based on the at least one statistical metric and the one or morestatistical metrics.

In some embodiments, the sample identity data may provide an identity ofthe unidentified sample medium (for example, a type of virus in thesample medium). In some embodiments, the sample identity data may bedetermined based on the difference(s) values between statistical metricsassociated with the interference fringe data for the unidentified samplemedium and one or more statistical metrics, each associated with theinterference fringe data for an identified reference medium, details ofwhich are described in connection with at least FIG. 58.

At block 5711, the process 5700 ends.

Referring now to FIG. 58, the example process 5800 may start at block5802.

At block 5804, the process 5800 may comprise determining whether adifference between the at least one statistical metric and the one ormore statistical metrics satisfies a threshold.

For example, the process 5800 may comprise determining whether thedifference between a sum associated with the unidentified sample mediumand a sum associated with an identified reference medium satisfies athreshold. For example, the threshold may be a predetermined value basedon the error toleration of the system, and the difference satisfies thethreshold when the difference is less than the threshold.

Additionally, or alternatively, the process 5800 may comprisedetermining whether the difference between a mean associated with theunidentified sample medium and a mean associated with an identifiedreference medium satisfies a threshold. For example, the threshold maybe a predetermined value based on the error toleration of the system,and the difference satisfies the threshold when the difference is lessthan the threshold.

Additionally, or alternatively, the process 5800 may comprisedetermining whether the difference between a standard deviationassociated with the unidentified sample medium and a standard deviationassociated with an identified reference medium satisfies a threshold.For example, the threshold may be a predetermined value based on theerror toleration of the system, and the difference satisfies thethreshold when the difference is less than the threshold.

Additionally, or alternatively, the process 5800 may comprisedetermining whether the difference between a skewness associated withthe unidentified sample medium and a skewness associated with anidentified reference medium satisfies a threshold. For example, thethreshold may be a predetermined value based on the error toleration ofthe system, and the difference satisfies the threshold when thedifference is less than the threshold.

Additionally, or alternatively, the process 5800 may comprisedetermining whether the difference between a Kurtosis value associatedwith the unidentified sample medium and a Kurtosis value associated withan identified reference medium satisfies a threshold. For example, thethreshold may be a predetermined value based on the error toleration ofthe system, and the difference satisfies the threshold when thedifference is less than the threshold.

Additionally, or alternatively, the other statistical metrics may beused.

At block 5806, the process 5800 may comprise determining the sampleidentity data based on identify data of an identified reference mediumassociated with the one or more statistical metrics in response todetermining that the difference between the at least one statisticalmetric and the one or more statistical metrics satisfies the threshold.

For example, if the difference between the sum of the unidentifiedsample medium and the sum of reference medium A satisfies itscorresponding threshold, the process 5800 may comprise determining thatthe unidentified sample medium is associated with reference medium A(for example, the unidentified sample medium has the same type of virusas the reference medium A).

Additionally, or alternatively, if the difference between the mean ofthe unidentified sample medium and the mean of reference medium Asatisfies its corresponding threshold, the process 5800 may comprisedetermining that the unidentified sample medium is associated withreference medium A (for example, the unidentified sample medium has thesame type of virus as the reference medium A).

Additionally, or alternatively, if the difference between the standarddeviation of the unidentified sample medium and the standard deviationof reference medium A satisfies its corresponding threshold, the process5800 may comprise determining that the unidentified sample medium isassociated with reference medium A (for example, the unidentified samplemedium has the same type of virus as the reference medium A).

Additionally, or alternatively, if the difference between the skewnessof the unidentified sample medium and the skewness of reference medium Asatisfies its corresponding threshold, the process 5800 may comprisedetermining that the unidentified sample medium is associated withreference medium A (for example, the unidentified sample medium has thesame type of virus as the reference medium A).

Additionally, or alternatively, if the difference between the Kurtosisvalue of the unidentified sample medium and the Kurtosis value ofreference medium A satisfies its corresponding threshold, the process5800 may comprise determining that the unidentified sample medium isassociated with reference medium A (for example, the unidentified samplemedium has the same type of virus as the reference medium A).

In some examples, the process 5800 may comprise determining that morethan one difference satisfies its corresponding threshold. In suchexamples, the process 5800 may determine the identity data based on thereference medium associated with the greatest number of statisticalmetrics that satisfy the threshold. For example, if three of thedifferences between statistical metrics of the unidentified samplemedium and statistical metrics of reference medium A satisfy theircorresponding thresholds, while four of the differences betweenstatistical metrics of the unidentified sample medium and statisticalmetrics of reference medium B satisfy their corresponding thresholds,the process 5800 may determine that the unidentified sample medium isassociated with reference medium B.

At block 5808, the process 5800 ends.

It is noted that the scope of the present disclosure is not limited tothose described above. In some embodiments of the present disclosure,features from various figures may be substituted and/or combined. Forexample, the statistical metrics described in connection with FIG. 55 toFIG. 58 may be used in connection with the example processes describedabove in connection with FIG. 47 to FIG. 54. As an example, thestatistical metric may be used to train a sample identification modeldescribed above in connection with FIG. 52.

Fluid virus detection may either require complicated operation (such aslab test) or suffer from slow response time or limited sensitivity (suchas paper based test). There is a need for a simple, quick, and accurateclinic or public use fluid virus sensor.

In accordance with various embodiments of the present disclosure, anuniversal fluid virus sensor is provided. The universal fluid virussensor may optically sense the fluid refractive index change based onimmunoassay. The miniature apparatus with disposable-reusable sensorcartridge may report the result in minutes.

Referring now to FIG. 59, an example exploded view of an example sensorcartridge 5900 is provided. In the example shown in FIG. 59, the examplesensor cartridge 5900 may comprise a cover layer 5901, a waveguide 5903,and a substrate layer 5905.

Similar to various examples described herein, the waveguide 5903 maycomprise a sample opening 5907 on a first surface. Similar to variousthe sample openings described herein, the sample opening 5907 may beconfigured to receive a sample medium.

Similar to various examples described herein, the cover layer 5901 maybe coupled to the waveguide 5903. In some examples, the coupling betweenthe cover layer 5901 and the waveguide 5903 may be implemented via atleast one sliding mechanism. For example, the cross-section of the coverlayer 5901 may be in a shape similar to the letter “n.” Sliding guardsmay be attached to an inner surface of each leg of cover layer 5901, andcorresponding rail tacks may be attached on one or more side surfaces ofthe waveguide 5903. As such, the cover layer 5901 may slide between afirst position and a second position as defined by the sliding guardsand the rail tacks, details of which are shown in FIG. 60A, FIG. 60B,FIG. 61A, and FIG. 61B.

Referring back to FIG. 59, the waveguide 5903 may be securely fastenedto the substrate layer 5905. For example, the waveguide 5903 maycomprise an input window 5909 and an output window 5911. Each of theinput window 5909 and the output window 5911 is in the form of a ribprotruding from the surface of the substrate layer 5905. The waveguide5903 may be snap fitted between the input window 5909 and the outputwindow 5911, and light may travel into the waveguide 5903 through theinput window 5909 and exit from the output window 5911. As such, theinput window 5909 and the output window 5911 may each provide opticallyclear path for the light to travel.

In some embodiments, the substrate layer 5905 may comprise thermallyconductive material for temperature sensing and control. For example,the substrate layer 5905 may comprise glass material. Additionally, oralternatively, the substrate layer 5905 may comprise other material(s).

In some embodiments, the example sensor cartridge 5900 may have a lengthof 1.3 inches, a width of 0.4 inches, and a height of 0.1 inches. Insome embodiments, the size(s) of the example sensor cartridge 5900 maybe of other value(s).

Referring now to FIG. 60A and FIG. 60B, example views of an examplesensor cartridge 6000 is provided. In particular, the example sensorcartridge 6000 comprises a cover layer 6006, a waveguide 6004, and asubstrate layer 6002, similar to those describe above.

In the example shown in FIG. 60A and FIG. 60B, the cover layer 6006 isat the first position (e.g. an “open position”). As shown, when thecover layer 6006 is at the first position, the opening 6008 of the coverlayer 6006 may overlap with the opening 6010 of the waveguide 6004. Asdescribed above, the waveguide 6004 may comprise antibody for attractingmolecules in the sample medium and/or comprise reference medium fortemperature control. The opening 6008 accepts the sample medium to betested, such as buffered saliva, nasal swab, and throat swab.

Referring now to FIG. 61A and FIG. 61B, example view of an examplesensor cartridge 6100 is provided. In particular, the example sensorcartridge 6100 comprises a cover layer 6105, a waveguide 6103, and asubstrate layer 6101, similar to those describe above.

In the example shown in FIG. 61A and FIG. 61B, the cover layer 6105 isat the second position (e.g. a “closed position”). As shown, when thecover layer 6105 is at the second position, the opening 6107 of thecover layer 6105 may not overlap with the opening 6109 of the waveguide6103.

In some embodiments, the example sensor cartridge 6100, in a closedposition, may be inserted into a slot of an analyzer apparatus, detailsof which are described herein.

Referring now to FIG. 62, an example view 6200 is shown. In particular,the example view 6200 illustrates an example sensor cartridge 6202 andan analyzer apparatus 6204. The example sensor cartridge 6202 may besimilar to various example sensor cartridges described herein.

The analyzer apparatus 6204 may comprise a slot base 6206 for securelyfastening the sensor cartridge 6202 to the analyzer apparatus 6204 (forexample, but not limited to, through a snap-fit mechanism).

In some embodiments, the slot base 6206 may comprise a thermal pad thatprovides temperature sensing capabilities (for example, the thermal padmay comprise one or more temperature sensors embedded within). Thethermal pad may monitor and control the temperature of the sensorcartridge 6202 to ensure the measurement accuracy of the samplereflective index.

In some embodiments, the analyzer apparatus 6204 may comprise one ormore optical windows (for example, the optical window 6208) that is in aperpendicularly arrangement with the surface of the slot base 6206. Whenthe sensor cartridge 6202 is inserted on the slot base 6206, an opticalwindow (for example, the optical window 6208) may be aligned with aninput window of the example sensor cartridge 6202 so that the analyzerapparatus 6204 may provide light to the example sensor cartridge 6202,and/or another optical window (for example, the optical window 6208) maybe aligned with an output window of the example sensor cartridge 6202 sothat the analyzer apparatus 6204 may receive interferometric infringepattern.

In the example shown in the FIG. 62, the analyzer apparatus 6204 maycomprise a light indicator 6210 disposed on the surface, which mayindicate the optical sensing result. For example, the light indicator6210 may adjust its color and/or flashing based on whether the analyzerapparatus 6204 is ready, whether the analyzer apparatus 6204 is busy,whether virus is determined, whether there is an error, and/or the like.

In some embodiments, the analyzer apparatus 6204 may comprise aplurality of circuitries disposed within. For example, the analyzerapparatus 6204 may comprise a processing circuitry for analyzing theinterferometric infringe pattern. The analyzer apparatus 6204 maycomprise a communication circuitry for transmitting analysis data toother devices (such as mobile phone or tablet) via wired or wirelessmeans (such as via Wi-Fi, Bluetooth, and/or the like). In someembodiments, the circuitries may be powered by one or more batteriesthat are suitable for wireless charging.

In some embodiments, the analyzer apparatus 6204 may be hermeticallysealed so that it is airtight. In particular, the optical interfacethrough the optical windows between sensor cartridge 6202 and theanalyzer apparatus 6204 may reduce the need for wired connection, whileenabling the analyzer apparatus 6204 to be hermetically sealed for easysterilization.

In some embodiments, the analyzer apparatus 6204 may comprise a built-ininternal reflection automatic UV sterilizer for sterilizing the surfaceof the analyzer apparatus 6204. For example, the UV sterilizer may bedisposed within the analyzer apparatus 6204. As described above, theanalyzer apparatus 6204 may communicate data wirelessly, thereforeproviding touchless operation and lower the risk of contamination.

Referring now to FIG. 63A, FIG. 63B, and FIG. 63C, example views of anexample sensor cartridge 6301 that has been inserted into an analyzerapparatus 6303 are illustrated. In particular, FIG. 63A illustrates anexample prospective view, FIG. 63B illustrates an example top view, andFIG. 63C illustrates an example side view.

In some embodiments, the analyzer apparatus 6303 may have a length of 80millimeters, a width of 40 millimeters, and a height of 10 millimeters.In some embodiments, the size(s) of the analyzer apparatus 6303 may beof other value(s).

It is noted that the scope of the present disclosure is not limited tothose described above. In some embodiments of the present disclosure,features from various figures may be substituted and/or combined. Forexample, various features associated with the sample testing device thatcomprises a sliding cover as illustrated in FIG. 10 to FIG. 13 (forexample, the sliding mechanism) may be implemented in the example sensorcartridge described above.

Integrated airborne virus detection can provide early warnings in thefield. For example, an integrated airborne virus detection system may beintegrated into a HVAC system or an AC unit. However, technicalchallenges exist in detecting airborne virus due to the potentially lowconcentration level of virus in the air, and the requirements of highaerosol sampling efficiency with high virus detection sensitivity maylimit the application of point-of-care device for detecting airbornevirus. As such, there is a need for a compact aerosol virus detectiondevice that provides real-time virus detection capabilities.

Some electrostatic precipitator aerosol samplers may comprise a highvoltage electrode, a grid ground and a liquid collector. Such samplersmay be limited in implementation because of the grid ground requirement.In various embodiments of the present disclosure, the integrated sensormay use the waveguide to function as part of electrostatic precipitatorto eliminate the ground grid requirement in the electrical precipitatorsdescribed above. For example, the metal top of the waveguide maydirectly collect the aerosol particle without liquid collector and/orfluidic system to maximize the collection efficiency.

Some waveguide interferometers may have non-conductive dielectric topsurface with non-window area masked with opaque oxide, and sample mediummay be delivered by the fluidics added on the top of the waveguideinterferometers. In various embodiments of the present disclosure, theintegrated electrostatic precipitator waveguide may comprise a metallayer at the top surface for the non-window area shielding without theneed for additional process. The metal layer may be connected to thesystem ground and serve as electrostatic precipitator ground. Aerosolsamples may be directly deposited on to the sensing surface withoutextra air-to-liquid interface, minimizing the collection efficiency lossand improving detection accuracy.

As such, the direct interface design of a sample testing device invarious embodiments of the present disclosure may allow bioaerosolparticle collecting, biochemical virus binding, and virus detection on asingle lab-on-a-chip structure. The air flow tunnel of the sampletesting device may provide an electrical field formed by positiveelectrode and metal layer (also referred to as the ground grid layer) onthe top surface of the waveguide. Electrostatic precipitation may pushthe airborne bio-aerosol to the top surface of the waveguide. Thepre-coated antibody on the waveguide may bind and immobilize thespecific virus particle, and the waveguide may detect virus based on therefractive index change.

In accordance with various embodiments of the present disclosure, anexample sample testing device may comprise a waveguide (for example, abi-modal waveguide interferometer sensor) and a sampler component (forexample, an electrostatic aerosol sampler). The sampler component mayprovide an electrostatic flow tunnel that may bind airborne virus to asurface of the waveguide. In some embodiments, the sampler component mayenable compact field collection of bioaerosol. In some embodiments, thewaveguide may provide a lab-on-a-chip structure to detect virus based onpotential refractive index change due to the airborne virus.

Referring now to FIG. 64A, FIG. 64B, and FIG. 64C, an example sampletesting device 6400 is illustrated.

As shown in FIG. 64A and FIG. 64B, the example sample testing device6400 may comprise a waveguide 6401 and a sampler component 6403.

In some embodiments, the sampler component 6403 may be disposed on a topsurface of the waveguide 6401. In some examples, the sampler component6403 may be disposed on the top surface of the waveguide 6401 throughone or more fastening mechanisms and/or attaching mechanisms, includingnot limited to, chemical means (for example, adhesive material such asglues), mechanical means (for example, one or more mechanical fastenersor methods such as soldering, snap-fit, permanent and/or non-permeantfasteners), and/or suitable means.

In the example shown in FIG. 64A, a cross section of the samplercomponent 6403 may be in a shape similar to an upside-down letter “U” inthe English alphabet. As such, the sampler component 6403 may provide aflow tunnel 6407 that allows air to flow through. In some embodiments,the flow tunnel may be an electrostatic flow tunnel. Referring now toFIG. 65A and FIG. 65B, example views of an example sample testing device6500 are illustrated.

FIG. 65A illustrates an example cross sectional view of an examplesample testing device 6500 along a width of the example sample testingdevice 6500. The example sample testing device 6500 may comprise asampler component 6501 disposed on a top surface of a waveguide 6503. Inthe example shown in FIG. 65A, the example sampler component 6501 maycomprise an anode element 6505. In some embodiments, the anode element6505 may be in the form of an electrode that may be positively charged.In some embodiments, a top surface of the waveguide 6503 may comprise alayer that is connected to the ground. As such, the anode element 6505and the top surface of the waveguide 6503 may create an electrical fieldin the flow tunnel.

Referring now to FIG. 65B, which illustrates another example crosssectional view of the example sample testing device 6500 along a lengthof the example sample testing device 6500. As air flows through the flowtunnel (for example, in the direction as shown by the arrow), theelectrical field created by the anode element 6505 and the top surfaceof the waveguide 6503 may cause aerosol within the flow tunnel to beattracted to or bonded on a top surface of the waveguide 6503.

Referring back to FIG. 64A and FIG. 64B, the sampler component 6403 maycomprise an anode element 6405, similar to the anode element 6505described above. For example, the anode element 6405 and the top surfaceof the waveguide 6401 may create an electrical field within the flowtunnel 6407 of the sampler component 6403, and aerosol in the flowtunnel 6407 may be attracted to or bonded on the top surface of thewaveguide 6401.

In some embodiments, the anode element 6405 may be embedded within thesampler component 6403. For example, the anode element 6405 may beembedded in the center middle portion of the sampler component 6403. Insome embodiments, the anode element 6405 may be in contact with the airin the flow tunnel 6407.

Referring now to FIG. 64C, an exploded view of the example sampletesting device 6400 is illustrated. In particular, FIG. 64C illustratesvarious layers associated with the waveguide 6401.

For example, the waveguide 6401 may comprise a silicon substrate layer6411. The waveguide 6401 may comprise a SiO2 cladding layer 6413disposed on top of the silicon substrate layer 6411. The waveguide 6401may comprise a Si3N4 waveguide core layer 6415 (which may provide one ormore waveguide elements) disposed on top of the SiO2 cladding layer6413. The waveguide 6401 may comprise a SiO2 planner layer 6417 disposedon top of the Si3N4 waveguide core layer 6415. The waveguide 6401 maycomprise a poly Si light shield layer 6419 (which may shield straylight) disposed on top of the SiO2 planner layer 6417. The waveguide6401 may comprise a SiO2 cladding window layer 6421 disposed on top ofthe poly Si light shield layer 6419. The waveguide 6401 may comprise analuminum grid layer 6423 (which may be connected to the ground) disposedon top of the SiO2 cladding window layer 6421.

To protect airplane passengers from airborne virus (for example, but notlimited to, SARS-COV-II), there is a need to provide effective,real-time monitoring of the air in the cabin of an airplane to detectairborne virus.

In accordance with various embodiments of the preset disclosure, anairborne bioaerosol virus sensor may be deployed in the airplane cabinwith minimum impact to the flight operation. In some embodiments, the anairborne bioaerosol virus sensor may be in the form of a plug-in devicesthat can be added to an AC outlet (for example, the AC outlet near thebottom of the seat) to monitor bio-aerosol in the air of the airplanecabin. As such, the flight safety may be improved with real-timemonitoring and control.

Referring now to FIG. 66A, FIG. 66B, FIG. 66C, and FIG. 66D, an examplesample testing device 6600 is illustrated. In particular, the examplesample testing device 6600 may provide an airborne bioaerosol virussensor described above.

Referring now to FIG. 66A, the example sample testing device 6600 maycomprise a shell component 6601.

In some embodiments, the shell component 6601 may comprise a pluralityof airflow opening elements 6605, allowing air to be circulated into thesample testing device 6600, details of which are described herein.

In some embodiments, the shell component 6601 may comprise a poweroutlet element 6607 dispose on a front surface. As described above, thesample testing device 6600 may be plugged into an AC outlet. The poweroutlet element 6607 may pass the electricity from the AC outlet toanother device when the other device is plugged into the power outletelement 6607.

Referring now to FIG. 66B, the example sample testing device 6600 maycomprise a base component 6603. As shown, the shell component 6601 maybe securely fastened to the base component 6603.

As discussed above, the example sample testing device 6600 may beplugged into an AC outlet. In the example shown in FIG. 66B, the basecomponent 6603 may comprise power plug element 6609. When the power plugelement 6609 is plugged into the AC outlet, electricity may flow fromthe AC outlet to the sample testing device 6600, and may power thesample testing device 6600. As described above, the shell component 6601may comprise the power outlet element 6607 dispose on a front surface.In such an example, the example sample testing device 6600 may furtherpass electricity to another device that is plugged into the power outletelement 6607.

Referring now to FIG. 66C, an exploded view of the example sampletesting device 6600 is illustrated.

In some embodiments, the example sample testing device 6600 may comprisean air blower element 6611 disposed on an inner surface of the basecomponent 6603. In some embodiments, the air blower element 6611 maycomprise one or more apparatuses that create an air flow, such as, butnot limited to, a fan. In some embodiments, the air blower element 6611may be positioned on the base component 6603 corresponding to theposition of the airflow opening elements 6605 on the shell component6601. In such example, when the air blower element 6611 is powered onand in operation, the air blower element 6611 may create an air flow,where air may flow into the sample testing device 6600 through theairflow opening elements 6605, travel within the sample testing device6600 (details of which are described herein), and exit from the sampletesting device 6600 through an opening (for example, through the airflowopening elements 6605 and/or another opening).

Referring now to FIG. 66D, an example view of the base component 6603 isshown.

As disclosure above, the air blower element 6611 may be disposed on aninner surface of the base component 6603. A aerosol sampler component6613 may be connected to the air blower element 6611 to sample theaerosol from the air.

For example, the aerosol sampler component 6613 may provide a tunnelthat allows air to flow from the air blower element 6611 onto theexample waveguide 6619. In some embodiments, the aerosol samplercomponent 6613 may create an electrical field to bind or attract aerosolto the waveguide 6619, similar to those described herein.

In some embodiments, the light source 6615 may provide input light tothe waveguide 6619 through an integrated optical component 6617.

Similar to those described above, the light source 6615 may beconfigured to produce, generate, emit, and/or trigger the production,generation, and/or emission of light (including, but not limited to, alaser light beam). The light source 6615 may be coupled to theintegrated optical component 6617, and light may travel from the lightsource 6615 to the integrated optical component 6617. Similar to thosedescribed above, the integrated optical component 6617 may collimate,polarize, and/or couple light to the waveguide 6619. For example, theintegrated optical component 6617 may be disposed on a top surface ofthe waveguide 6619, and may direct light through an input opening of thewaveguide 6619.

In some embodiments, the sample testing device 6600 may comprise a lenscomponent 6621 disposed on the top surface of the waveguide 6619. Forexample, the lens component 6621 may at least partially overlap with anoutput opening of the waveguide 6619, such that light exiting from thewaveguide 6619 may pass through the lens component 826.

In some examples, the lens component 6621 may comprise one or moreoptical imaging lens, such as but not limited to one or more lens havingspherical surface(s), one or more lens having parabolic surface(s)and/or the like. In some examples, the lens component 6621 may redirectand/or adjust the direction of the light that exits from the waveguide6619 towards an imaging component 6623. In some examples, the imagingcomponent 6623 may be disposed on an inner surface of the base component6603.

Similar to those described above, the imaging component 6623 may beconfigured to detect an interference fringe pattern. For example, theimaging component 6623 may comprise one or more imagers and/or imagesensors (such as an integrated 1D, 2D, or 3D image sensor). Variousexamples of the image sensors may include, but are not limited to, acontact image sensor (CIS), a charge-coupled device (CCD), or acomplementary metal-oxide semiconductor (CMOS) sensor, a photodetector,one or more optical components (e.g., one or more lenses, filters,mirrors, beam splitters, polarizers, etc.), autofocus circuitry, motiontracking circuitry, computer vision circuitry, image processingcircuitry (e.g., one or more digital signal processors configured toprocess images for improved image quality, decreased image size,increased image transmission bit rate, etc.), verifiers, scanners,cameras, any other suitable imaging circuitry, or any combinationthereof.

In some embodiments, the imaging component 6623 may be electronicallycoupled to a sensor board element 6625. In some embodiments, the sensorboard element 6625 may comprise circuitries such as, but not limited to,a processor circuitry, a memory circuitry, and a communicationscircuitry.

For example, the processor circuitry may be in communication with thememory circuitry via a bus for passing data/information, including datagenerated by the imaging component 6623. The memory circuitry isnon-transitory and may include, for example, one or more volatile and/ornon-volatile memories. The processor circuitry may carry out one or moreexample methods described herein to detect the presence of virus basedon the data generated by the imaging component 6623.

In some embodiments, when the processor circuitry determines that thereis virus present in the air, the processor circuitry may generate awarning signal. The processor circuitry may pass the warning signal tothe communications circuitry through a bus, and the communicationscircuitry may transmit the warning signal to another device (forexample, a central controller on the airplane) via wired or wirelessmeans (for example, Wi-Fi).

In some embodiments, based on the warning signals, one or more actionsmay be taken. For example, the central controller on the airplane mayadjust the air flow in the airplane to clean out the virus.Additionally, or alternatively, the central controller may render awarning message on a display, and one or more flight crew may initiatedisinfecting the plane and/or replace the waveguide 6619.

While the description above provides an example implementation of thesample testing device 6600 within an airplane, it is noted that thescope of the present disclosure is not limited to the description above.In some examples, an example sample testing device 6600 may beimplemented in other environments and/or situations.

In accordance with various embodiments of the present disclosure, amultichannel waveguide can test multiple fluid samples simultaneously toprovide accurate results with multiple references, which may requirehighly synchronized delivery and control of multiple fluids into thefluid cover. However, it can be technically challenging to providesynchronized delivery and control of multiple fluids. For example, somesystems may utilize multiple pumps, where each pump is configured todeliver one type of fluid (e.g., a sample medium for testing, a knownreference medium for reference, and/or the like) into one flow channel.In order to deliver the multiple fluids (such as sample medium and/orreference medium) to different channels at the same time, such systemsmay require one or more splitters and/or cylinders connected to thepumps. However, a system that implements multiple splitters and/orcylinders may result in non-uniformed delivery of fluids (such as samplemedium and/or reference medium) between channels, causing differences inthe testing results and providing unreliable solutions to sampletesting.

In accordance with various embodiments of the present disclosure, asingle pump multichannel fluidics system is provided. In someembodiments, a single pump continuously deliveries a buffer solutionthat flows through multiple flow channels in serial. Each of the flowchannels is formed between a fluid cover, a flow channel plate, and awaveguide. In some embodiments, multiple fluids (including sample mediumand reference medium) are preloaded and/or injected to valves of thesingle pump multichannel fluidics system. In some embodiments, whenconducting testing of the sample medium, valves are switched to insertthe fluids (such as, but not limited to, sample medium, referencemedium, and/or the like) into the flow of the buffer solution throughthe flow channels. In some embodiments, the tubing length between thevalve(s) and the flow channel(s) are predetermined based on the timingfor switching different valves, such that each flow channel will receivethe fluid at the same time, providing more accurate result(s) fortesting and further analysis.

As such, in accordance with examples of the present disclosure, anexample single pump multichannel fluidics system may provide buffersolution to all channels with the same flow rate, under the samepressure, at same temperature. In some embodiments, multiple valves(each of which is connected to a flow channel through a buffer loop) maybe provided for injecting fluids (such as, but not limited to, samplemedium, reference medium) to the example single pump multichannelfluidics system, which can guarantee a consistent volume for allinjected fluids. In some embodiments, by synchronizing the timing forswitching the valves based on lengths of buffer loops between the valvesand the flow channels, providing same-time fluid sensing and analysisaccuracy.

Referring now to FIG. 67A and FIG. 67B, example configurationsassociated with an example valve 6700 are illustrated. In the exampleshown in FIG. 67A and FIG. 67B, the example valve is a 2-configuration6-port valve.

In particular, FIG. 67A illustrates the example valve 6700 in a firstconfiguration, and FIG. 67B illustrates the example valve 6700 in asecond configuration. In some embodiments, the example valve 6700 maycomprise a first port 6701, a second port 6702, a third port 6703, afourth port 6704, a fifth port 6705 and a sixth port 6706.

In the example shown in FIG. 67A, when in the first configuration, thefirst port 6701 and the second port 6702 are connected within theexample valve 6700. In other words, when in the first configuration, afluid may flow into the example valve 6700 through the first port 6701and flow out of the example valve 6700 through the second port 6702, ormay flow into the example valve 6700 through the second port 6702 andflow out of the example valve 6700 through the first port 6701.

Similarly, when in the first configuration, the third port 6703 and thefourth port 6704 are connected within the example valve 6700. In otherwords, when in the first configuration, a fluid may flow into theexample valve 6700 through the third port 6703 and flow out of theexample valve 6700 through the fourth port 6704, or may flow into theexample valve 6700 through the fourth port 6704 and flow out of theexample valve 6700 through the third port 6703.

Similarly, when in the first configuration, the fifth port 6705 and thesixth port 6706 are connected within the example valve 6700. In otherwords, when in the first configuration, a fluid may flow into theexample valve 6700 through the fifth port 6705 and flow out of theexample valve 6700 through the sixth port 6706, or may flow into theexample valve 6700 through the sixth port 6706 and flow out of theexample valve 6700 through the fifth port 6705.

In the example shown in FIG. 67B, when in the second configuration, thefirst port 6701 and the sixth port 6706 are connected within the examplevalve 6700. In other words, when in the second configuration, a fluidmay flow into the example valve 6700 through the first port 6701 andflow out of the example valve 6700 through the sixth port 6706, or mayflow into the example valve 6700 through the sixth port 6706 and flowout of the example valve 6700 through the first port 6701.

Similarly, when in the second configuration, the third port 6703 and thesecond port 6702 are connected within the example valve 6700. In otherwords, when in the second configuration, a fluid may flow into theexample valve 6700 through the third port 6703 and flow out of theexample valve 6700 through the second port 6702, or may flow into theexample valve 6700 through the second port 6702 and flow out of theexample valve 6700 through the third port 6703.

Similarly, when in the second configuration, the fifth port 6705 and thefourth port 6704 are connected within the example valve 6700. In otherwords, when in the second configuration, a fluid may flow into theexample valve 6700 through the fifth port 6705 and flow out of theexample valve 6700 through the fourth port 6704, or may flow into theexample valve 6700 through the fourth port 6704 and flow out of theexample valve 6700 through the fifth port 6705.

In the example shown in FIG. 67A and FIG. 67B, the first port 6701 isalways connected to the fourth port 6704 through a sample loop 6708,whether the example valve 6700 is in the first configuration (FIG. 67A)or the second configuration (FIG. 67B). In other words, when in thefirst configuration or the second configuration, a fluid may flow intothe first port 6701, through the sample loop 6708, and flow out of thefourth port 6704, or may flow into the fourth port 6704, through thesample loop 6708, and flow out of the first port 6701.

In some embodiments, the example valve 6700 may receive a fluid throughthe second port 6702.

For example, in the first configuration shown in FIG. 67A, the secondport 6702 may be connected to a fluid source that is configured toinject a fluid (for example, but not limited to, a sample medium or areference medium) into the example valve 6700. As described above, inthe first configuration, the second port 6702 is connected to the firstport 6701, which in turn is connected to the sample loop 6708. As such,the fluid may flow through the sample loop 6708 and arrive at the fourthport 6704. As described above, in the first configuration, the fourthport 6704 is connected to the third port 6703. As such, fluid may exitthe valve 6700 through third port 6703.

After the example fluid is injected to the second port 6702 and in thesample loop 6708 while the example valve 6700 is in the firstconfiguration, the example valve 6700 may be switched to the secondconfiguration as shown in FIG. 67B. As described above, in the secondconfiguration, the fourth port 6704 is connected to the fifth port 6705.In some embodiments, the fifth port 6705 may receive buffer solutionfrom a pump or from a previous flow channel through a buffer loop,details of which are described herein.

As described above, the fifth port 6705 is connected to the fourth port6704, which in turn is connected to the sample loop 6708. As such, afterthe example valve 6700 is switched to the second configuration, thebuffer solution received from the fifth port is mixed with the examplefluid in the sample loop 6708 at the fourth port 6704. As describedabove, the fourth port 6704 is connected to the fifth port 6705 in thesecond configuration. As such, the fluid may exit the example valve 6700through the sixth port 6706, which may be connected to a flow channel,details of which are described herein.

Referring now to FIG. 68, an example single pump multichannel fluidicssystem 6800 is illustrated.

In the example shown in FIG. 68, the example single pump multichannelfluidics system 6800 comprises a pump 6802 that delivers buffer solutionto one or more flow channels, including, but not limited to, the firstflow channel 6808, the second flow channel 6816, . . . , and the lastflow channel 6824. In some embodiments, the one or more flow channels ofthe example single pump multichannel fluidics system 6800 are connectedin serial. For example, the first flow channel 6808 is connected thesecond flow channel 6816 through a second valve 6812 as shown in FIG.68. In some embodiments, using a single pump (instead of multiple pumps)provides technical advantages of same flow rate across different flowchannels.

In some embodiments, an example single pump multichannel fluidics systemmay comprise one or more valves. In some embodiments, each of the one ormore valves may connect a flow channel to a pump, or may connect twoflow channels. In the example shown in FIG. 68, the first valve 6804 isconnected to the pump 6802 and the first flow channel 6808, the secondvalve 6812 is connected to the first flow channel 6808 and the secondflow channel 6816, and/or the like.

In some embodiments, to operate the example single pump multichannelfluidics system 6800 shown in FIG. 68, buffer solution may be providedto the one or more flow channels (for example, the first flow channel6808, the second flow channel 6816, . . . , the last flow channel 6824)by the pump 6802, and example fluids (for example, but not limited to, asample medium or a reference medium) may be provided to the one or moreflow channels (for example, the first flow channel 6808, the second flowchannel 6816, . . . , the last flow channel 6824) through the one ormore valves (for example, the first valve 6804, the second valve 6812, .. . , the last valve 6820).

In accordance with examples of the present disclosure, an example methodof operating the example single pump multichannel fluidics system 6800is provided.

In some embodiments, the example method may include switching the one ormore valves of the example single pump multichannel fluidics system 6800(for example, the first valve 6804, the second valve 6812, . . . , thelast valve 6820) to a first configuration. As described above, in thefirst configuration, fifth port of the valve is connected to the sixthport of the valve, while the first port is connected to the fourth portthrough the sample loop.

In some embodiments, the example method may include injecting a buffersolution to the first valve 6804 through the pump 6802. In someembodiments, the example pump 6802 is connected to the fifth port of thefirst valve 6804. In some embodiments, the sixth port of the first valve6804 is connected to a first flow channel 6808. As described above, inthe first configuration, the fifth port of the first valve 6804 isconnected to the sixth port of the first valve 6804. As such, the buffersolution flows from the example pump 6802, through the first valve 6804,and to the first flow channel 6808.

As described above, the first flow channel 6808 is connected to thesecond flow channel 6816 via one or more components. In the exampleshown in FIG. 68, the first flow channel 6808 is connected a firstbuffer loop 6810, which in turn is connected to the second valve 6812,which in turn is connected to the second flow channel 6816. In someembodiments, the length of the first buffer loop 6810 may be determinedbased on the timing of switching the second valve 6812 from the firstconfiguration to the second configuration, details of which aredescribed herein.

Similar to those described above, the sixth port of the second valve6812 is connected to a second flow channel 6816. As described above, inthe first configuration, the fifth port of the second valve 6812 isconnected to the sixth port of the second valve 6812. As such, thebuffer solution flows from the first buffer loop 6810, through thesecond valve 6812, and to the second flow channel 6816.

In some embodiments, one or more sets of valves and flow channels may beconnected in serial, so that the buffer solution may flow from theexample pump 6802 through the various flow channels to the last bufferloop 6818. Similar to those described above, the last buffer loop 6818is connected to the last valve 6820, which in turn is connected to thelast flow channel 6824. In some embodiments, the last flow channel 6824is the last flow channel in the series of flow channels of the examplesingle pump multichannel fluidics system 6800.

In some embodiments, while the first valve 6804 is in the firstconfiguration, the example method further comprises providing firstfluid (for example, but not limited to, a sample medium or a referencemedium) to the first valve 6804 through the second port of the firstvalve 6804. As descried above, the second port of the first valve 6804is connected to first port of the first valve 6804 when the first valve6804 is in the first configuration, and the first port of the firstvalve 6804 is connected to the forth port of the first valve 6804through a first sample loop 6806. As such, the first fluid may flow intothe first sample loop 6806.

Additionally, or alternatively, while the second valve 6812 is in thefirst configuration, the example method further comprises providingsecond fluid (for example, but not limited to, a sample medium or areference medium) to the second valve 6812 through the second port ofthe second valve 6812. As descried above, the second port of the secondvalve 6812 is connected to first port of the second valve 6812 when thesecond valve 6812 is in the first configuration, and the first port ofthe second valve 6812 is connected to the forth port of the second valve6812 through a second sample loop 6814. As such, the second fluid mayflow into the second sample loop 6814.

Additionally, or alternatively, while the last valve 6820 is in thefirst configuration, the example method further comprises providing lastfluid (for example, but not limited to, a sample medium or a referencemedium) to the last valve 6820 through the second port of the last valve6820. As descried above, the second port of the last valve 6820 isconnected to first port of the last valve 6820 when the last valve 6820is in the first configuration, and the first port of the last valve 6820is connected to the forth port of the last valve 6820 through a lastsample loop 6822. As such, the last fluid may flow into the last sampleloop 6822.

In some embodiments, the example method further comprises switching thefirst valve 6804 from the first configuration to the secondconfiguration. As described above, after the first valve 6804 isswitched from the first configuration to the second configuration, thefirst port of the first valve 6804 is no longer connected to the secondport of the first valve 6804. Instead, when the first valve 6804 is atthe second configuration, the first port is connected to the sixth portof the first valve 6804, and the fifth port is connected to the fourthport of the first valve 6804. As such, after the first valve 6804 isswitched to the second configuration, the buffer solution maycontinuously be injected to the first valve 6804 through the fifth port(which is connected to the fourth port when the first valve 6804 is inthe second configuration). Subsequently, the buffer solution may exitthe fourth port and flow through the first sample loop 6806.

As described above, the first sample loop 6806 is connected to the firstport and may contain the first fluid. The buffer solution may becombined with the first fluid and flow to the first port. As describedabove, the first port is connected to the sixth port when the firstvalve 6804 is in the second configuration, and the buffer solution mayexit the first valve 6804 through the sixth port. As described above,the sixth port of the first valve 6804 is connected to the first flowchannel 6808, and the buffer solution with the first fluid may flowthrough the first flow channel 6808.

As described above, after the buffer solution exits the first flowchannel 6808, the buffer solution may further flow through a firstbuffer loop 6810. In some embodiments, the example method furthercomprises switching the second valve 6812 from the first configurationto the second configuration.

As described above, after the second valve 6812 is switched from thefirst configuration to the second configuration, the first port of thesecond valve 6812 is no longer connected to the second port of thesecond valve 6812. Instead, when the second valve 6812 is at the secondconfiguration, the first port is connected to the sixth port of thesecond valve 6812, and the fifth port is connected to the fourth port ofthe second valve 6812. As such, after the second valve 6812 is switchedto the second configuration, the buffer solution may flow from the firstbuffer loop 6810 to the second valve 6812 through the fifth port (whichis connected to the fourth port when the second valve 6812 is in thesecond configuration). Subsequently, the buffer solution may exit thefourth port and flow through the second sample loop 6814.

As described above, the second sample loop 6814 is connected to thefirst port and may contain the second fluid. The buffer solution may becombined with the second fluid and flow to the first port. As describedabove, the first port is connected to the sixth port when the secondvalve 6812 is in the second configuration, and the buffer solution mayexit the second valve 6812 through the sixth port. As described above,the sixth port of the second valve 6812 is connected to the second flowchannel 6816, and the buffer solution with the second fluid may flowthrough the second flow channel 6816.

In some embodiments, the first buffer loop 6810 may enable the mixtureof the buffer solution and the first fluid to enter the first flowchannel 6808 at the same time as the mixture of the buffer solution andthe second fluid entering the second flow channel 6816. In someembodiments, the first buffer loop 6810 may prevent the first fluid frombeing mixed with the second fluid. To achieve the above-mentionedobjectives, the length of the first buffer loop 6810 may be calculatedbased at least in part on the time period between the time of switchingthe first valve 6804 from the first configuration to the secondconfiguration and the time of switching the second valve 6812 from thefirst configuration to the second configuration. For example, the lengthL of the first buffer loop 6810 may be calculated based on the followingequation:

$L = \frac{T \times Q}{\pi \times r^{2}}$

In the above example, T is the time period between the time of switchingthe first valve 6804 from the first configuration to the secondconfiguration and the time of switching the second valve 6812 from thefirst configuration to the second configuration. Q is the flow rate ofinjecting the buffer solution by the pump 6802. r is the radius of thefirst buffer loop 6810. As described in the equation above, the length Lof the first buffer loop 6810 is equal to the volume of flow (during thetime period between the time of switching the first valve 6804 from thefirst configuration to the second configuration and the time ofswitching the second valve 6812 from the first configuration to thesecond configuration) divided by the cross-sectional area of the firstbuffer loop 6810. In some embodiments, the length L of the first bufferloop 6810 prevents the buffer solution that has been mixed with thefirst fluid (and exits the first flow channel 6808) from interactingwith the second fluid (after the second valve 6812 is switched from thefirst configuration to the second configuration), while enables themixture of the buffer solution and the first fluid to enter the firstflow channel 6808 at the same time as the mixture of the buffer solutionand the second fluid entering the second flow channel 6816.

In some embodiments, the example single pump multichannel fluidicssystem 6800 further comprises one or more additional valves that areconnected in serial, and the example method further comprises switchingeach of the one or more additional valves in sequence.

For example, as shown in FIG. 68, the example single pump multichannelfluidics system 6800 further comprises a last buffer loop 6818. The lastbuffer loop 6818 connects a second-to-last flow channel to the lastvalve 6820, and the last valve 6820 is connected to the last flowchannel 6824. In some embodiments, the example method further comprisesswitching the last valve 6820 from the first configuration to the secondconfiguration. As described above, after the last valve 6820 is switchedfrom the first configuration to the second configuration, the first portof the last valve 6820 is no longer connected to the second port of thelast valve 6820. Instead, when the last valve 6820 is at the secondconfiguration, the first port is connected to the sixth port of the lastvalve 6820, and the fifth port is connected to the fourth port of thelast valve 6820. As such, after the last valve 6820 is switched to thesecond configuration, the buffer solution may flow from the last bufferloop 6818 to the last valve 6820 through the fifth port (which isconnected to the fourth port when the last valve 6820 is in the secondconfiguration). Subsequently, the buffer solution may exit the fourthport and flow through the last sample loop 6822. As described above, thelast sample loop 6822 is connected to the first port and may contain thelast fluid. The buffer solution may be combined with the last fluid andflow to the first port. As described above, the first port is connectedto the sixth port when the last valve 6820 is in the secondconfiguration, and the buffer solution may exit the last valve 6820through the sixth port. As described above, the sixth port of the lastvalve 6820 is connected to the last flow channel 6824, and the buffersolution may flow through the last flow channel 6824.

In some embodiments, the last buffer loop 6818 may enable the mixture ofthe buffer solution and a second-to-last fluid to enter the asecond-to-last flow channel at the same time as the mixture of thebuffer solution and the last fluid entering the last flow channel 6824.In some embodiments, the last buffer loop 6818 may prevent thesecond-to-last fluid from being mixed with the last fluid. To achievethe above-mentioned objectives, the length of the last buffer loop 6818may be calculated based at least in part on the time period between thetime of switching the second-to-last valve from the first configurationto the second configuration and the time of switching the last valve6820 from the first configuration to the second configuration. Forexample, the length L of the last buffer loop 6818 may be calculatedbased on the above equation.

As such, in accordance with various embodiments of the presentdisclosure, an example single pump multichannel fluidics system 6800enables synchronized delivery of multiple fluids into theircorresponding flow channels.

Referring now to FIG. 69A and FIG. 69B, example views associated with anexample multichannel waveguide device 6900 is illustrated. Inparticular, FIG. 69A illustrates an example perspective view of themultichannel waveguide device 6900, while FIG. 69B illustrates anexample exploded view of the multichannel waveguide device 6900.

As shown in FIG. 69A and FIG. 69B, the multichannel waveguide device6900 may comprise a fluid cover 6907 that is secured to a multichannelwaveguide 6905. In some embodiments, the multichannel waveguide device6900 comprises a multichannel waveguide 6905 disposed on a top surfaceof a thermally insulated base 6903. In some embodiments, themultichannel waveguide 6905 is based on one or more examples ofwaveguides described above. For example, the multichannel waveguide 6905may comprise one or more sample channels and/or one or more referencechannels, similar to those described above. In some embodiments, thethermally insulated base 6903 prevents environmental temperature frominterfering with the multichannel waveguide 6905, similar to the variousthermally insulated components described above.

In the example shown in FIG. 69A and FIG. 69B, the fluid cover 6907 issecured to the multichannel waveguide 6905 through one or more screws(such as, but not limited to, screw 6909A, screw 6909B, screw 6909C,screw 6909D). For example, the fluid cover 6907 may comprise one or morethreaded holes (such as, but not limited to, threaded hole 6913A,threaded hole 6913C, threaded hole 6913D), and the each of the one ormore screws may pass through one or more threaded holes, where threadson the inside of the threaded hole mesh with threads of the screw.

In some embodiments, a flow channel plate 6915 may be positioned betweenthe fluid cover 6907 and the multichannel waveguide 6905. In particular,the flow channel plate 6915 may comprise one or more ditches that areetched on a surface of the flow channel plate 6915. When the flowchannel plate 6915 is positioned underneath the fluid cover 6907, thebottom surface of the fluid cover 6907 and the one or more ditches formone or more flow channels. When the flow channel plate 6915 ispositioned on the multichannel waveguide 6905 (for example, based on oneor more alignment techniques described herein), each of the one or moreflow channels may be positioned above one of the sample channels or oneof the reference channels of the multichannel waveguide 6905. In someembodiments, an inlet tube and an outlet tube may be connected to eachof the flow channels, so that a sample medium, a reference medium,and/or a buffer solution may flow to each of the flow channels throughan inlet tube and exit from each of the flow channels through an outlettube.

For example, an inlet tube 6911A may be inserted through the fluid cover6907 and connected to a first end of a flow channel on the flow channelplate 6915, and an outlet tube 6911B may be inserted through the fluidcover 6907 and connected to a second end of the flow channel on the flowchannel plate 6915. In this example, a sample medium or a referencemedium may flow from the inlet tube 6911A, through the flow channel, andexit from the outlet tube 6911B. In some embodiments, the inlet tube6911A is connected to the sixth port of a valve, similar to thosedescribed above. In some embodiments, the outlet tube 6911B is connectedto a buffer loop, similar to those described above.

Additionally, or alternatively, an inlet tube 6911C may be insertedthrough the fluid cover 6907 and connected to a first end of a flowchannel on the flow channel plate 6915, and an outlet tube 6911D may beinserted through the fluid cover 6907 and connected to a second end ofthe flow channel on the flow channel plate 6915. In this example, asample medium or a reference medium may flow from the inlet tube 6911C,through the flow channel, and exit from the outlet tube 6911D. In someembodiments, the inlet tube 6911C is connected to the sixth port of avalve, similar to those described above. In some embodiments, the outlettube 6911D is connected to a buffer loop, similar to those describedabove.

Additionally, or alternatively, an inlet tube 6911E may be insertedthrough the fluid cover 6907 and connected to a first end of a flowchannel on the flow channel plate 6915, and an outlet tube 6911F may beinserted through the fluid cover 6907 and connected to a second end ofthe flow channel on the flow channel plate 6915. In this example, asample medium or a reference medium may flow from the inlet tube 6911E,through the flow channel, and exit from the outlet tube 6911F. In someembodiments, the inlet tube 6911E is connected to the sixth port of avalve, similar to those described above. In some embodiments, the outlettube 6911F is connected to a buffer loop, similar to those describedabove.

Referring now to FIG. 70A, FIG. 70B, FIG. 70C, and FIG. 70D, exampleviews associated with an example flow channel plate 7000 is illustrated.In particular, FIG. 70A illustrates an example perspective view of theflow channel plate 7000, FIG. 70B illustrates an example top view of theflow channel plate 7000, FIG. 70C illustrates an example side view ofthe flow channel plate 7000, and FIG. 70D illustrates another exampleside view of the flow channel plate 7000.

In the example shown in FIG. 70A, FIG. 70B, FIG. 70C, and FIG. 70D, theexample flow channel plate 7000 comprises a first flow channel 7002, asecond flow channel 7004, and a third flow channel 7006. As describedabove, each of the first flow channel 7002, the second flow channel7004, and the third flow channel 7006 is formed between an etched ditchon a surface of the flow channel plate 7000 and a bottom surface of afluid cover (underneath which the example flow channel plate 7000 ispositioned).

As shown in FIG. 70B, in some embodiments, the first flow channel 7002and/or the third flow channel 7006 may have a length L2 of 16centimeters. In some embodiments, the second flow channel 7004 may havea length L1 of 21 centimeters. In some embodiments, the example flowchannel plate 7000 may have a length L3 of 25.6 centimeters. In someembodiments, the example flow channel plate 7000 may have a width W2 of5.3 centimeters. In some embodiments, the distance W1 between the firstflow channel 7002 and the second flow channel 7004 (and/or the distancebetween the second flow channel 7004 and the third flow channel 7006) is0.9 centimeters. In some embodiments, one or more of theabove-referenced measurements may be of other values.

As shown in FIG. 70C, in some embodiments, a diameter D3 of an end of aflow channel is 0.6 centimeters. In some embodiments, the diameter D3may be of other values.

As shown in FIG. 70D, in some embodiments, the etched depth D1 of eachflow channel is 0.2 centimeters. In some embodiments, the width D2 ofthe flow channel plate 7000 is 0.5 millimeters. In some embodiments, oneor more of the above-referenced measurements may be of other values.

Referring now to FIG. 71 and FIG. 72, example diagrams illustratingexample testing results are provided. In particular, the diagram 7100shown in FIG. 71 illustrates example raw signals that contain noise, andthe diagram 7200 shown in FIG. 72 illustrates example processed signalswhere noise has been removed.

As shown in FIG. 71 and FIG. 72, example signals from three flowchannels are illustrated. For example, curve 7101 of FIG. 71 illustratesexample raw signals generated by an example imaging component based ondetecting the sample medium or the reference medium in a first flowchannel, and curve 7202 of FIG. 72 illustrates example processed signalsbased on the raw signals from the first flow channel. As anotherexample, curve 7103 of FIG. 71 illustrates example raw signals generatedby an example imaging component based on detecting the sample medium orthe reference medium in a second flow channel, and curve 7204 of FIG. 72illustrates example processed signals based on the raw signals from thesecond flow channel. As another example, curve 7105 of FIG. 71illustrates example raw signals generated by an example imagingcomponent based on detecting the sample medium or the reference mediumin a third flow channel, and curve 7206 of FIG. 72 illustrates exampleprocessed signals based on the raw signals from the third flow channel.

In the example shown in FIG. 71 and FIG. 72, an example of threechannels may allow testing the sample medium using at least a firstreference medium as a negative reference (for example, distilled water)and a second reference medium as a positive reference (for example,targeted virus surrogate). For example, the sample medium, the firstreference medium, and the second reference medium may be a first fluid,a second fluid, and a third fluid, respectively, which may be injectedto a first valve, a second valve, and a third valve of a single pumpmultichannel fluidics system, respectively. The buffer solution may beinjected to the single pump multichannel fluidics system using a pump.

In some embodiments, the three different fluids (for example, one samplemedium and two reference mediums) may travel through the three flowchannels after the valves are switched. In some embodiments, the signalsfrom the three flow channels may be used to quantitatively provide testresults based on processing with negative and positive references. Asmultichannel test is performed under the same condition, common noiseand variations (such as sensing system thermal, structural change anddrifting) may be cancelled out by processing signals from differentchannels, as shown in diagram 7200 of FIG. 72.

While the description above provides some examples of using three flowchannels, it is noted that the scope of the present disclosure is notlimited to the description above. For example, in some embodiments, asingle flow channel may be implemented in an example flow channel plate,and the single flow channel may be positioned on top of a waveguide tocover one or more sample channels and/or one or more reference channelsin the waveguide. In some embodiments, more flow channels can bearranged with different target surrogates to have multiple results inone test. In some embodiments, multiple sensors can be arranged in eachchannel to provide error correction and noise reduction. In someembodiments, buried sensing region can be added to provide absolutereference to compensate the sensor signal variations with signals fromthe ambient environment.

As describes above, an example sample testing device in accordance withembodiment of the present disclosure may implement a light source thatemits a laser light beam to a waveguide. It is noted that devices basedon optical waveguides are finding use in various applications, frombiosensing to quantum computing to communications and data processing.In some of those applications, the waveguides are a permanent part ofthe system. But in others, and especially in biosensing applications,they may need to be removable and disposable, which poses some technicalchallenges as laser light must generally be correctly coupled into awaveguide before it can be used. Correctly coupling the laser light to awaveguide generally requires aligning the waveguide to the focus of thelaser (or to a fiber or another waveguide in which the light in alreadyconfined) to within a few microns. Such an requirement can be beyond thetolerances that can be achieved by machining or manufacturing ofmechanical parts.

As such, the waveguide needs to be actively aligned to the light sourceafter it is inserted into the system. However, manual alignment can betime consuming and requires a skilled operator. Moreover, the kinds ofshock and vibration associated with normal use (e.g. setting a devicedown on a table, bumping it with an elbow, a loud machine runningnearby) can move the waveguide relative to the light source by at leasta few microns, requiring the alignment process to be repeated.

In accordance with various embodiments of the present disclosure, alaser alignment system that provides automated alignment of a laserlight to a waveguide is provided. For example, various embodiments ofthe present disclosure may comprise features that can provide signals toan automated alignment system even when the laser source is initiallybadly misaligned to the waveguide. Various embodiments of the presentdisclosure may allow lower cost actuators (which may drift over time) tobe used during alignment by providing feedback signals (which can beused to correct for drift).

Various embodiments of the present disclosure may provide varioustechnical advantages over other systems, including, but not limited to,providing feedback even when the laser is badly misaligned with thewaveguide. Various embodiments of the present disclosure are compatiblewith inexpensive, high drift actuators used in a continuous active servocontrol process.

In various embodiments of the present disclosure, an example method isprovided. The example method may include patterning at least someoptical features on the waveguide chip, and some optical features on theholder in which the waveguide chip is mounted. In some embodiments, as alaser source emits a laser light on one of the optical features, theoptical feature may cause a redirection of the laser light (for example,only high spatial frequency or low spatial frequency light areredirected) and/or change in its characteristics (for example, a changein the light intensity). In some embodiments, an imaging component asdescribed above (such as a camera pixel array or one or morephotodiodes) may be positioned at specific locations to detect the laserlight. In some embodiments, the camera pixel array or one or morephotodiodes may convert the detected laser light into signals, which maybe transmitted to a processor. Based on the signals, the processor maysend control signals to an actuator or a motor to move the light sourceso that it is correctly aligned with the waveguide (additionally, oralternatively, to move the waveguide so that it is correctly alignedwith the light source).

For example, based on the signals, the processor may send controlsignals to the actuator or the motor indicating which direction thelight source should move in the “horizontal” dimension (e.g. in theplane of the waveguide chip). In some embodiments, the laser light maybe redirected from grating couplers patterned into the waveguide itself,such that, even if the laser source is initially far misaligned in thehorizontal dimension, the laser source can be re-aligned to a waveguideleading to the grating coupler. In some embodiments, the gratingcouplers may redirect these laser light vertically onto a camera pixelarray or one or more photodiodes, and the resulting signals differ whenthe laser source is aligned to one side of the waveguide chip ascompared to when the laser source is aligned to the other side of thewaveguide chip. As such, the signals generated by the camera pixel arrayor one or more photodiodes can indicate which way the laser source (orthe waveguide chip) needs to move to be correctly aligned (for example,to the input coupler that is configured to receive the laser light anddirect it to the waveguide chip).

Additionally, or alternatively, in the “vertical” dimension (e.g. in theplane that is normal to the waveguide chip), signals are reflected ontoone or more photodiodes or camera pixel arrays differently from parts ofthe mount that is below the chip than from parts of the mount that isabove the chip.

Referring now to FIG. 73A, FIG. 73B, and FIG. 73C, example diagramsillustrating an example method of aligning a laser source to a waveguidechip in a vertical dimension is illustrated. In particular, the examplemethod illustrated in FIG. 73A, FIG. 73B, and FIG. 73C may align thelaser source with the waveguide chip in the vertical direction based onsignals detected by a camera pixel array. In some embodiments, examplesillustrated herein may provide many technical advantages, including butnot limited to, providing robust alignment against background lightpollution, accommodating for laser intensity variation, and avoidinginterference from spurious reflections or scattering.

In the example shown in FIG. 73A, FIG. 73B, and FIG. 73C, a waveguidemount 7301, a waveguide chip including multiple layers (for example, afirst layer 7303 and a second layer 7305), and a fluid cover 7307 areillustrated. In some embodiments, the waveguide chip is mounted on a topsurface of the waveguide mount 7301. In some embodiments, the fluidcover 7307 is mounted on a top surface of the waveguide chip. In someembodiments, the second layer 7305 is mounted on a top surface of thefirst layer 7303.

In some embodiments, the waveguide mount 7301 and the waveguide chip mayhave different reflectivity rate of reflecting laser light. For example,the waveguide mount 7301 may have a 95% reflectivity rate. Additionally,or alternatively, the first layer 7303 of the waveguide chip maycomprise silicon and have a 40% reflectivity rate. Additionally, oralternatively, the second layer 7305 of the waveguide chip may comprisesilicon oxide that has a 4% reflectively rate.

Referring now to FIG. 73A, in some embodiments, the example method maycomprise aiming the laser source 7309 at the waveguide mount 7301. Inparticular, the laser source 7309 may emit a laser light, and the laserlight may travel through a beam splitter 7311 and a collimator 7313,similar to those described above. As the laser source 7309 is aimed atthe waveguide mount 7301, and the waveguide mount 7301 has a 95%reflectivity rate, the waveguide mount 7301 may reflect the laser lightback to the beam splitter 7311, and the beam splitter 7311 redirects thelaser light upwards in a vertical dimension towards an imaging component7317 (for example, a camera pixel array).

In some embodiments, the example method may include maximizing thebrightness of the laser light detected by the imaging component 7317based on tipping and/or tilting the beam splitter 7311.

In some embodiments, the example method may comprise causing movement ofthe laser source 7309 upwards in the vertical dimension. In the exampleshown in FIG. 73A, the laser source 7309, the beam splitter 7311, andthe collimator 7313 are secured within a laser housing 7315 and alignedwith one another. In some embodiments, the laser housing 7315 ismoveably positioned on a vertical support wall 7321. For example, thelaser housing 7315 may be attached to one or more sliding mechanisms(for example, a slider/track mechanism described above), and theposition of the laser housing 7315 on the one or more sliding mechanismsis controlled by one or more actuators or motors (for example, theactuator or the motor may control the position of the slider on thetrack). As described above, the actuator or the motor is controlled by aprocessor, and the example method may comprise transmitting controlsignals from the processor to the actuator or the motor, such that thelaser source 7309 moves upwards in the vertical dimension.

In some embodiments, one or more horizontal support walls (for example,the horizontal support wall 7319 and the horizontal support wall 7323)are disposed on an inner surface of the vertical support wall 7321. Inthe example shown in FIG. 73A, FIG. 73B, and FIG. 73C, the imagingcomponent 7317 is mounted on the horizontal support wall 7319.

In some embodiments, the example method may comprise causing, by aprocessor, a laser source or an optical element from which it isrefracted or reflected to move in a vertical dimension until detecting achange in the back-reflected power from the surface. In someembodiments, the characteristic reflectivity of the dielectric in whichthe waveguide is embedded can be used as a signal to indicate when thelaser is incident on that film. For example, as the laser source 7309continues to move upwards in the vertical dimension, the laser lightemitted by the laser source 7309 arrives at the first layer 7303. Asdescribed above, the first layer 7303 has a reflectivity rate of 40%,compared the 95% reflectivity rate of the waveguide mount 7301. As such,the light received by the imaging component 7317 becomes dimmer as thelaser source 7309 moves upwards in the vertical dimension from aiming atthe waveguide mount 7301 to aiming at the first layer 7303.

In some embodiments, as the laser source 7309 continues to move upwardsin the vertical dimension, the laser light emitted by the laser source7309 arrives at the second layer 7305, as shown in FIG. 73B. Asdescribed above, the second layer 7305 has a reflectivity rate of 4%,compared the 40% reflectivity rate of the first layer 7303. As such, thelight received by the imaging component 7317 becomes dimmer as the lasersource 7309 moves upwards in the vertical dimension from aiming at thefirst layer 7303 to aiming at the second layer 7305.

In some embodiments, once the laser light emitted by the laser source7309 arrives at the second layer 7305, the imaging component 7317 maydetect grating coupler spots due to reflected laser light from gratingcouplers etched at the second layer 7305. In some embodiments, thereflected laser light from grating couplers travels through thecollimator 7316 mounted on the imaging component 7317, forming the oneor more grating coupler spots detected by the imaging component 7317.

In some embodiments, once the imaging component detects the one or moregrating coupler spots, the example method further comprises causing thevertical movement of the laser source 7309 to stop, and initiatinghorizontal movement of the laser source 7309. In some embodiments, oncethe one or more grating coupler spots appear, the processor maydetermine that the laser source 7309 is correctly aligned in thevertical dimension, and may start the alignment of the laser source inthe horizontal dimension. Details associated with the alignment in thehorizontal dimension are described further in connection with at leastFIG. 74, FIG. 75A, and FIG. 75B.

In some embodiments, as laser source 7309 continuously moving upwards inthe vertical dimension, the laser source 7309 may inadvertently movefrom aiming at the second layer 7305 to aiming as the fluid cover 7307,as shown in FIG. 73C. In some embodiments, the fluid cover 7307 maycomprise additional grating on the surface. When the laser source 7309emits laser light toward the fluid cover 7307, the imaging component7317 may detect additional spots due to laser light redirected by theadditional grating on the surface of the fluid cover 7307. In someembodiments, these additional spots appear at locations that aredifferent and away from the grating coupler spots detected by theimaging component when the laser light aims at the second layer 7305.Based on these locations, the processor may determine that the lasersource 7309 has moved upwards and passed the second layer 7305, and maycause the laser source 7309 to move downwards in the vertical dimension.

Referring now to FIG. 74, an example top view 7400 of an examplewaveguide chip 7402 is illustrated. In particular, the example top view7400 illustrates example grating couplers patterns on the examplewaveguide chip 7402, which may facilitate the alignment of the lasersource in the horizontal dimension as described above.

In the example shown in FIG. 74, the example waveguide chip 7402 maycomprise an optical channel 7404, which corresponds to the correctchannel that the laser source should be aiming at when it is correctlyaligned (for example, a sample channel or a reference channel of thewaveguide). In some embodiments, a fluid cover 7405 may be disposed on atop surface of the example waveguide chip 7402.

In some embodiments, the example waveguide chip 7402 may comprise one ormore additional alignment channels, such as, but not limited to,alignment channel 7406, alignment channel 7408, alignment channel 7410,alignment channel 7412, alignment channel 7414, and alignment channel7416.

In some embodiments, each of the alignment channels may comprise one ormore grating couplers that are etched on the alignment channel (forexample, a grating coupler 7418 of alignment channel 7406). In someembodiments, each of the grating couplers redirect laser light at aparticular spatial frequency. As described above, the redirected laserlight may further form one or more grating coupler spots as detected theimaging component. As such, based on the spatial frequency of detectedgrating coupler spot, the processor may cause movement of the lasersource in the horizontal dimension so that the laser source is correctlyaligned with the waveguide chip.

In the example shown in FIG. 74, the optical channel 7404 may divide thewaveguide chip 7402 to two sides: one or more alignment channels(including the alignment channel 7406, the alignment channel 7408, thealignment channel 7410) are etched on a first side from the opticalchannel 7404, while one or more alignment channels (including thealignment channel 7412, the alignment channel 7414, the alignmentchannel 7416) are etched on a second side from the optical channel 7404.In some embodiments, alignment channels etched on the first side fromthe optical channel 7404 may comprise grating couplers that redirectlaser light at a spatial frequency that is different from a spatialfrequency in which grating couplers from alignment channels etched onthe second side from the optical channel 7404 redirect the laser light.

For example, the alignment channel 7406, the alignment channel 7408, thealignment channel 7410 may comprise grating couplers that redirect thelaser light at a low spatial frequency, and the alignment channel 7412,the alignment channel 7414, the alignment channel 7416 may comprisegrating couplers that redirect the laser light at a high spatialfrequency.

Referring now to FIG. 75A and FIG. 75B, example diagrams illustrating anexample method of aligning a laser source to a waveguide chip in ahorizontal dimension are illustrated. In particular, the example methodillustrated in FIG. 75A and FIG. 75B may align the laser source with thewaveguide chip in the horizontal dimension based on signals detected bya camera pixel array.

Similar to the waveguide chip 7402 described above in connection withFIG. 74, the waveguide chip 7503 shown in FIG. 75A and FIG. 75B maycomprise an optical channel 7511, which corresponds to the correctchannel that the laser source should be aiming at when it is correctlyaligned (for example, a sample channel or a reference channel of thewaveguide). The example waveguide chip 7503 may comprise one or moreadditional alignment channels, such as, but not limited to, alignmentchannel 7505, alignment channel 7507, and alignment channel 7509 thatare positioned on a first side from the optical channel 7511, as well asalignment channel 7513, alignment channel 7515, and alignment channel7517 that are positioned on a second side from the optical channel 7511.

Similar to those described above, the alignment channel 7505, thealignment channel 7507, and the alignment channel 7509 may redirectlaser light at a high spatial frequency, while the alignment channel7513, the alignment channel 7515, and the alignment channel 7517 mayredirect the laser light at a low spatial frequency. In someembodiments, each of the alignment channel 7505, the alignment channel7507, and the alignment channel 7509, the alignment channel 7513, thealignment channel 7515, and the alignment channel 7517 may redirect thelaser light at a different spatial frequency.

In some embodiments, an example method may comprise causing the lasersource or an optical element from which it is refracted or reflected tomove in a horizontal dimension in a direction indicated by a pattern oflight diffracted from gratings formed in the waveguide or waveguides toeither side of the target area for coupling into a main functionalwaveguide or a main channel of the waveguide. In some embodiments, theposition or spatial frequency of the gratings being different on oneside of the target area than the other as described herein. For example,the laser source 7501 may move in the horizontal dimension by anactuator or a motor, and the imaging component may detect one or moregrating coupler spots as described above. For example, when the imagingcomponent detects one or more grating coupler spots having a highspatial frequency, the processor may determine that the laser source7501 has moved too far to the left side, and may cause the laser source7501 to move towards the right side as shown in FIG. 75A. As usedherein, the relative sides of “left” and “right” are based on viewingfrom the direction of the laser light from the laser source 7501 towardthe waveguide chip 7503. As another example, when the imaging componentdetects one or more grating coupler spots having a low spatialfrequency, the processor may determine that the laser source 7501 hasmoved too far to the right side, and may cause the laser source 7501 tomove towards the left side as shown in FIG. 75B. In some embodiments,each of the alignment channel 7505, the alignment channel 7507, and thealignment channel 7509, the alignment channel 7513, the alignmentchannel 7515, and the alignment channel 7517 may redirect the laserlight at a different spatial frequency. In such embodiments, theprocessor can determine the position of the laser source 7501 based onthe detected spatial frequency, and may case the laser source 7501 tomove accordingly. In some embodiments, the processor may cause the lasersource to be continuously moving in the horizontal dimension until thelaser source 7501 is correctly aligned in the horizontal dimension.

Referring now to FIG. 76A, FIG. 76B, and FIG. 76C, example diagramsillustrating an example method of aligning a laser source to a waveguidechip in a vertical dimension is illustrated. In particular, the examplemethod illustrated in FIG. 76A, FIG. 76B, and FIG. 76C may align thelaser source with the waveguide chip in the vertical direction based onsignals detected by one or more photodiodes.

In the example shown in FIG. 76A, FIG. 76B, and FIG. 76C, a waveguidemount 7601, a waveguide chip including multiple layers (for example, afirst layer 7603 and a second layer 7605), and a fluid cover 7607 areillustrated. In some embodiments, the waveguide chip is mounted on a topsurface of the waveguide mount 7601. In some embodiments, the fluidcover 7607 is mounted on a top surface of the waveguide chip. In someembodiments, the second layer 7605 is mounted on a top surface of thefirst layer 7603.

In some embodiments, the waveguide mount 7601 and the waveguide chip mayhave different reflectivity rate of reflecting laser light. For example,the waveguide mount 7601 may have a 95% reflectivity rate. Additionally,or alternatively, the first layer 7603 of the waveguide chip maycomprise silicon and have a 40% reflectivity rate. Additionally, oralternatively, the second layer 7605 of the waveguide chip may comprisesilicon oxide that has a 4% reflectively rate.

Referring now to FIG. 76A, in some embodiments, the example method maycomprise aiming the laser source 7609 at the waveguide mount 7601. Inparticular, the laser source 7609 may emit a laser light, and the laserlight may travel through a beam splitter, similar to those describedabove. As the laser source 7609 is aimed at the waveguide mount 7601,and the waveguide mount 7601 has a 95% reflectivity rate, the waveguidemount 7601 may reflect the laser light based on the beam splitter 7611,and the beam splitter 7611 redirects the laser light upwards in avertical dimension towards a photodiode 7616.

In some embodiments, the example method may comprise causing movement ofthe laser source 7609 upwards in the vertical dimension. In the exampleshown in FIG. 76A, the laser source 7609 and the beam splitter 7611 aresecured within a laser housing 7615 and aligned with one another. Insome embodiments, the laser housing 7615 is moveably positioned on avertical support wall 7621. For example, the laser housing 7615 may beattached to one or more sliding mechanisms (for example, a slider/trackmechanism described above), and the position of the laser housing 7615on the one or more sliding mechanisms is controlled by one or moreactuators or motors (for example, the actuator or the motor may controlthe position of the slider on the track). As described above, theactuator or the motor is controlled by a processor, and the examplemethod may comprise transmitting control signals from the processor tothe actuator or the motor, such that the laser source 7609 moves upwardsin the vertical dimension.

In some embodiments, one or more horizontal support walls (for example,the horizontal support wall 7619 and the horizontal support wall 7623)are disposed on an inner surface of the vertical support wall 7621. Inthe example shown in FIG. 76A, FIG. 76B, and FIG. 76C, one or morephotodiodes 7614 is mounted on the horizontal support wall 7619.

In some embodiments, as the laser source 7609 continues to move upwardsin the vertical dimension, the laser light emitted by the laser source7609 arrives at the first layer 7603. As described above, the firstlayer 7603 has a reflectivity rate of 40% (compared the 95% reflectivityrate of the waveguide mount 7601). As such, the light received by thephotodiode 7616 becomes dimmer as the laser source 7609 moves upwards inthe vertical dimension from aiming at the waveguide mount 7601 to aimingat the first layer 7603.

In some embodiments, as the laser source 7609 continues to move upwardsin the vertical dimension, the laser light emitted by the laser source7609 arrives at the second layer 7605, as shown in FIG. 76B. Asdescribed above, the second layer 7605 has a reflectivity rate of 4%compared the 40% reflectivity rate of the first layer 7603. As such, thelight received by the photodiode 7616 becomes dimmer as the laser source7609 moves upwards in the vertical dimension from aiming at the firstlayer 7603 to aiming at the second layer 7605.

In some embodiments, the processing circuitry may determine that thelaser source 7609 is aiming at the second layer 7605 based on thedetected reflectivity rate.

Referring now to FIG. 77, an example diagram 7700 is illustrated. Inparticular, the example diagram 7700 illustrates an example relationshipbetween the back-reflected signal power (for example, as detected by thephotodiode 7616 shown in FIG. 76A to FIG. 76C) and the position of thelaser source (for example, the laser source 7609) in the verticaldimension.

In the example diagram 7700, the example threshold of back-reflectedsignal power is set at 4%, which corresponds to the reflectivity rate ofthe second layer. In some embodiments, the back-reflected signal powermay be calculated by dividing the power of light signal detected by thephotodiode by the power of the light as emitted by the laser source. Insome embodiments, a power monitor diode is implemented to distinguishbetween laser power change and reflectivity change.

In some embodiments, when the detected back-reflected signal power isabove 4%, the processor may cause the laser source to move upwards inthe vertical dimension (as shown in FIG. 76A). When the detectedback-reflected signal power is below 4%, the processor may cause thelaser source to move downwards in the vertical dimension (as describedfurther in details in connection with at least FIG. 76C). In someembodiments, when the detected back-reflected signal power isapproximately 4% (for example, within 15 um), the processor determinesthat the laser source is correctly aligned in the vertical direction.

Referring back to FIG. 76B, in some embodiments, once the processordetermines that the laser source 7609 is aiming at the second layer7605, the example method further comprises causing the vertical movementof the laser source 7609 to stop, and initiating horizontal movement ofthe laser source 7609. In some embodiments, the processor may determinethat the laser source 7609 is correctly aligned in the verticaldimension, and may start the alignment of the laser source in thehorizontal dimension. Details associated with the alignment in thehorizontal dimension are described further in connection with at leastFIG. 78, FIG. 79A, and FIG. 79B.

In some embodiments, as laser source 7609 continuously moving upwards inthe vertical dimension, the laser source 7609 may inadvertently movefrom aiming at the second layer 7605 to aiming as the fluid cover 7607,as shown in FIG. 76C. In some embodiments, the fluid cover 7607 may havea low reflectivity rate, and the photodiode 7616 may detect little to noreflected light, indicating a below-threshold back-reflected signalpower as shown in FIG. 77. In this example, the processor may determinethat the laser source 7609 has moved too upwards and passed the secondlayer 7605, and may cause the laser source 7609 to move downwards in thevertical dimension.

Referring now to FIG. 78, an example top view 7800 of an examplewaveguide chip 7802 is illustrated. In particular, the example top view7800 illustrates example grating couplers patterns on the examplewaveguide chip 7802, which may facilitate the alignment of the lasersource in the horizontal dimension as described above.

In the example shown in FIG. 78, the example waveguide chip 7802 maycomprise an optical channel 7804, which corresponds to the correctchannel that the laser source should be aiming at when it is correctlyaligned (for example, a sample channel or a reference channel of awaveguide). In some embodiments, a fluid cover 7805 may be disposed on atop surface of the example waveguide chip 7802.

In some embodiments, the example waveguide chip 7802 may comprise one ormore additional alignment channels, such as, but not limited to,alignment channel 7806, alignment channel 7808, alignment channel 7810,alignment channel 7812, alignment channel 7814, and alignment channel7816. In some embodiments, each of the alignment channels may compriseone or more grating couplers that are etched on the alignment channel(for example, a grating coupler 7818 of alignment channel 7806).

In the example shown in FIG. 78, the optical channel 7804 may divide thewaveguide chip 7802 to two sides: one or more alignment channels(including the alignment channel 7806, the alignment channel 7808, thealignment channel 7810) are etched on a first side from the opticalchannel 7804, while one or more alignment channels (including thealignment channel 7812, the alignment channel 7814, the alignmentchannel 7816) are etched on a second side from the optical channel 7804.In some embodiments, alignment channels etched on the first side fromthe optical channel 7804 may comprise grating couplers that located intheir respective alignment channels differently from the respectivelocations of the grating couplers in the alignment channels on thesecond side from the optical channel 7804.

For example, the alignment channel 7806, the alignment channel 7808, andthe alignment channel 7810 may comprise grating couplers that arelocated closer to the laser source as compared to the locations of thegrating couplers in the alignment channel 7812, the alignment channel7814, and the alignment channel 7816. As described above, each of thegrating couplers may redirect laser light (for example, upwards in thevertical dimension). In some embodiments, one or more photodiodes arepositioned above each of the grating couplers to receive the reflectedlaser light from each of the grating couplers. In some embodiments,based on which of the one or more photodiodes detects the reflectedlaser light, the processor may align the laser source in the horizontaldimension.

Referring now to FIG. 79A and FIG. 79B, example diagrams illustrating anexample method of aligning a laser source to a waveguide chip in ahorizontal dimension is illustrated. In particular, the example methodillustrated in FIG. 79A and FIG. 79B may align the laser source with thewaveguide chip in the horizontal dimension based on signals detected byone or more photodiodes.

Similar to the waveguide chip 7802 described above in connection withFIG. 78, the waveguide chip 7903 shown in FIG. 79A and FIG. 79B maycomprise an optical channel 7911, which corresponds to the correctchannel that the laser source should be aiming at when it is correctlyaligned (for example, a sample channel or a reference channel of awaveguide). The example waveguide chip 7903 may comprise one or moreadditional alignment channels, such as, but not limited to, alignmentchannel 7905, alignment channel 7907, and alignment channel 7909 thatare positioned on a first side from the optical channel 7911, as well asalignment channel 7913, alignment channel 7915, and alignment channel7917 that are positioned on a second side from the optical channel 7911.

As illustrated in FIG. 79A and FIG. 79B, the grating couplers of thealignment channel 7905, the alignment channel 7907, and the alignmentchannel 7909 are positioned closer to laser source 7901 as compared tothe positions of the grating couplers of the alignment channel 7913, thealignment channel 7915, and the alignment channel 7917. In someembodiments, one or more photodiodes may be positioned above the gratingcouplers of the alignment channel 7905, the alignment channel 7907, andthe alignment channel 7909, and one or more photodiodes may bepositioned above the grating couplers of alignment channel 7913,alignment channel 7915, and alignment channel 7917.

In some embodiments, the laser source 7901 may move in the horizontaldimension by an actuator or a motor, and one or more photodiodes maydetect one or more signals as described above. For example, when the oneor more photodiodes positioned above the grating coupler of alignmentchannel 7907 detect reflected laser light, the processor may determinethat the laser source 7901 has moved too far to the left side, and maycause the laser source 7051 to move towards the right side as shown inFIG. 79A. As used herein, the relative sides of “left” and “right” arebased on viewing from the direction of the laser light from the lasersource 7901 toward the waveguide chip 7903. As another example, when theone or more photodiodes positioned above the grating coupler ofalignment channel 7913 detect reflected laser light, the processor maydetermine that the laser source 7901 has moved too far to the rightside, and may cause the laser source 7901 to move towards the left sideas shown in FIG. 79B. In some embodiments, the processor may cause thelaser source to be continuously moving in the horizontal dimension untilthe laser source 7901 is correctly aligned based on none of thephotodiodes detect any reflected laser light.

In some embodiments, an example method for aligning the laser sourcewith the waveguide chip is provided. In some embodiments, when aligningthe laser source to the waveguide in the vertical dimension or thehorizontal dimension, the actuator or the motor may cause the lasersource to take approximately 100 um steps of movements in the directionas determined by the processor, and stop when a threshold is met basedon the examples described above (for example, when the spatial frequencychanges or when the photodiode detects reflected light). In someembodiments, examples of the present discourse may engage fine controlmotors. Additionally, or alternatively, when aligning the laser sourceto the waveguide in the vertical dimension or the horizontal dimension,the actuator or the motor may cause the laser source to sweepcontinuously in the direction as determined by the processor, until thetarget threshold is crossed. Once the target threshold is crossed, theprocessor may cause the laser source to move in the opposite directionuntil the target threshold is crossed again. This process may berepeated to determine the optimum location for aligning the laser source(for example, the exact location where the target threshold is crossed).

One of the many technical challenges associated with sample testing (forexample, when testing for the presence of a virus in a collected sample)is false negative or false positive readings. For example, in an antigenor molecular test, there is a need to identify and eliminate falsenegative readings. When the test result of a sample (for example,collected through a swab or a breath/aerosol sampling device) isnegative, it can be challenging to determine whether the result isnegative because there is no viral content in the collected sample, orwhether because there is an insufficient amount of sample that has beencollected.

Various embodiments of the present disclosure may overcome theabove-referenced challenges. For example, during the sample collectionof breath aerosol for a viral test, the collected sample may compriseone or more proteins, bio-chemicals or enzymes that are naturallypresent in the breath aerosol regardless of whether there is viralcontent (e.g. regardless of whether the breath aerosol is contagiouswith virus). The concentration level of such proteins, bio-chemicals,and/or enzymes in the collected sample may be analyzed, which mayprovide basis for determining whether a sufficient amount of sample hasbeen collected. As such, various embodiments of the presence disclosuremay reduce or eliminate the possibilities of reporting a false negativeresult.

Referring now to FIG. 80, an example diagram 8000 is illustrated. Inparticular, the example diagram 8000 illustrates a sample medium flowsthrough a flow channel 8002 of a waveguide in the direction as shown byarrow 8008. For example, the waveguide may be configured to receivesample medium comprising non-viral indicator of the biological contentand viral indicator of the biological content.

In some embodiments, the collected sample medium may comprise both viralindicator of biological content 8004 and non-viral indicator ofbiological content 8006. In the present disclosure, the term “viralindicator of biological content” refers toproteins/bio-chemicals/enzymes in a collected sample that indicate thepresence of a biological content to be detected by a sample testingdevice in the collected sample. Examples of viral indicator ofbiological content may include, but are not limited to, viruses to bedetected by the sample testing device, protein fragments associated theviruses to be detected by the sample testing device, and/or biomarkersassociated with a virus state or condition. The term “non-viralindicator of biological content” refers toproteins/bio-chemicals/enzymes that are always present in a collectedsample, regardless of whether biological content to be detected by asample testing device is present in the collected sample. Examples ofnon-viral indicator of biological content may include, but are notlimited to, certain amino acid, certain volatile organic compoundsand/or the like that are always present in the exhale breath.

Referring now to FIG. 81, an example method 8100 is illustrated. Inparticular, the example method 8100 illustrates utilizing a minimumviable concentration of proteins, bio-chemicals and/or enzymes todetermine whether a sufficient amount of sample has been collected. Oncethe minimum concentrations is confirmed in the collected sample, it canbe determined that a sufficient amount of sample has been collected foran accurate testing.

The example method 8100 starts at step/operation 8101 and proceeds tostep/operation 8103. At step/operation 8103, the example method 8100includes detecting the non-viral indicator of biological content in acollected sample and/or determining a concentration level of thenon-viral indicator of biological content in the collected sample.

In some embodiments, the example method 8100 may implement varioussample testing devices in accordance with the present disclosure todetect the non-viral indicator of biological content in a collectedsample. For example, the collected sample may be provided to a flowchannel described herein. In some embodiments, the flow channel may beconfigured to detect a concentration level of the non-viral indicator ofbiological content. As an example, the flow channel may detect that thecollected sample comprises 0.5 mass per milliliter of non-viralindicator of biological content in the collected sample.

Referring back to FIG. 81, at step/operation 8105, the example method8100 includes determining whether a concentration level of non-viralindicator of biological content satisfies a threshold.

In some embodiments, the threshold may be determined based on thenon-viral indicator of biological content and/or the viral indicator ofbiological content that is to be tested. For example, if a type ofnon-viral indicator of biological content normally has a concentrationlevel among 1 mass per milliliter in a collected sample, the thresholdmay be set at 1 mass per milliliter. As another example, if detecting atype of viral indicator of biological content requires that thenon-viral indicator of biological content to be at a concentration levelof at least 2 mass per milliliter, the threshold may be adjusted basedon the 2 mass per milliliter concentration level.

In some embodiments, the threshold may be determined based on collectingmultiple samples and calculating a mean or an average concentrationlevel of the non-viral indicator of biological content in the samples.In some embodiments, the threshold may be determined in other ways.

Referring back to FIG. 81, if, at step/operation 8105, the concentrationlevel of non-viral indicator of biological content satisfies athreshold, the example method 8100 proceeds to step/operation 8107. Atstep/operation 8107, the example method 8100 includes detecting theamount of viral indicator of biological content.

Continuing from the above example, if the threshold is 0.2 mass permilliliter, and the concentration level of the non-viral indicator ofbiological content detected at step/operation 8103 is 0.5 mass permilliliter, the concentration level of the non-viral indicator ofbiological content satisfies the threshold. In other words, a sufficientamount of sample has been collected to ensure accurate testing.

In some embodiments, the example method 8100 may implement varioussample testing devices in accordance with the present disclosure todetect the amount of viral indicator of biological content in acollected sample. For example, the collected sample may be provided to aflow channel described herein. In some embodiments, the flow channel maybe configured to detect a concentration level of the viral indicator ofbiological content.

Referring back to FIG. 81, if, at step/operation 8105, the amount ofnon-viral indicator of biological content does not satisfy a threshold,the example method 8100 proceeds to step/operation 8109. Atstep/operation 8109, the example method 8100 includes transmitting awarning signal.

Continuing from the above example, if the threshold is 1 mass permilliliter, and the concentration level of the non-viral indicator ofbiological content detected at step/operation 8103 is 0.5 mass permilliliter, the concentration level of the non-viral indicator ofbiological content does not satisfy the threshold. In other words, asufficient amount of sample has not been collected.

In some embodiments, the warning signal may be generated by a processorand transmitted to a display device (such as, but not limited to, acomputer display). For example, the warning signal may cause the displaydevice to render a message warning the user that a sufficient amount ofsample has not been collected, and/or that the testing result may beinaccurate. In some embodiments, the user may discard the collectedsample, and may initiate the collection of a new sample.

Referring back to FIG. 81, subsequent to step/operation 8107 and/orstep/operation 8109, the example method 8100 ends at step/operation8111.

Referring now to FIG. 82, an example method 8200 is illustrated. Inparticular, the example method 8200 illustrates utilizing concentrationlevels of non-viral indicators of biological content to imputecomparative concentration levels of viral indicators of biologicalcontent in different collected samples.

The example method 8200 starts at step/operation 8202 and proceeds tostep/operation 8204. At step/operation 8204, the example method 8200includes detecting concentration levels of non-viral indicators ofbiological content in multiple collected samples.

Similar to those described above in connection with at leaststep/operation 8103 of FIG. 81, in some embodiments, the example method8200 may implement various sample testing devices in accordance with thepresent disclosure to detect concentration levels of the non-viralindicators of biological contents in collected samples.

As an example, the example method 8200 may determine that a firstcollected sample comprises 0.8 mass per milliliter of non-viralindicator of biological content, and a second collected sample comprises1.8 mass per milliliter of non-viral indicator of biological content.

At step/operation 8206, the example method 8200 includes detectingconcentration levels of viral indicators of biological content inmultiple collected samples.

Similar to those described above in connection with at leaststep/operation 8107 of FIG. 81, in some embodiments, the example method8200 may implement various sample testing devices in accordance with thepresent disclosure to detect concentration levels of the viralindicators of biological contents in collected samples.

As an example, the example method 8200 may determine that a firstcollected sample comprises 0.4 mass per milliliter of viral indicator ofbiological content, and a second collected sample comprises 0.6 mass permilliliter of viral indicator of biological content.

Referring back to FIG. 82, at step/operation 8208, the example method8200 includes calculating comparative concentration levels of viralindicators of biological content in multiple collected samples.

In the present disclosure, the term “comparative concentration level ofviral indicators of biological content” refers to a normalizedconcentration level of a viral indicator of biological content in acollected sample of multiple collected samples based on theconcentration level of a non-viral indicator of biological content inmultiple collected samples. In some embodiments, the concentration levelof non-viral indicator of biological content may serve as a standard fornormalizing the concentration level of viral indicators of biologicalcontent in different collected samples. In some embodiments, acomparative concentration level of viral indicator of biological contentmay be calculated based on the following equation:

$C_{c} = \frac{C_{v}}{C_{nv}}$

In the above equation, C_(c) stands for the comparative concentrationlevel of a viral indicator of biological content, C_(v) stands for aconcentration level of a viral indicator of biological content, andC_(nv) stands for a concentration level of a non-viral indicator ofbiological content.

Continuing from the example above, the first collected sample has a 0.8mass per milliliter of non-viral indicator of biological content and 0.4mass per milliliter of viral indicator of biological content. As such,the comparative concentration level of a viral indicator of biologicalcontent of the first collected sample is 0.5. The second collectedsample has a 1.8 mass per milliliter of non-viral indicator ofbiological content and 0.6 mass per milliliter of viral indicator ofbiological content. As such, the comparative concentration level of aviral indicator of biological content of the second collected sample is0.33. In such an example, the first collected sample has a highercomparative concentration level of a viral indicator of biologicalcontent than that of the second collected sample, which indicates thatthe first collected sample can be more contagious than the secondcollected sample.

Referring back to FIG. 82, subsequent to step/operation 8208, theexample method 8100 ends at step/operation 8210.

Many multichannel waveguide illumination suffers from technicalchallenges such as, but not limited to, input beam splitter causingnon-uniformity lasers between channels, low light efficiency, high inputpower requirements, and/or the like. For example, the higher the numberof channels, the higher the total input power that is required toilluminate these channel, and the required total input power can be toohigh to be practical. As such, there is a need for alternative lightinput method for a multichannel waveguide.

In various embodiments of the present disclosure, a sample testingdevice (such as a multichannel waveguide biosensor) can detect multiplevirus types simultaneously to effectively overcoming technicalchallenges associated with detecting virus variants. In someembodiments, an example sample testing device (such as a scanningmultichannel waveguide biosensor) uses a laser beam that scans througheach waveguide channel for providing input to the waveguide channels.With scanning laser beam input, only one channel is illuminated at atime, which ensures that the input power of the laser beam to eachchannel in the waveguide is the same. As such, various embodiments ofthe present disclosure provide a mechanism of providing laser beam inputhaving the same power to multiple channels. In some embodiments, anexample sample testing device (such as a scanning multichannel waveguidebiosensor) can provide line scan with pitch and roll control (optionallyalong with a piezo-electric actuator), which can satisfy themultichannel waveguide input alignment requirement. As such, variousembodiments of the present disclosure provide electro-magnetic scan andalignment control that provide low cost solution. In addition to variousadvantages such as input power efficiency, providing laser light to onechannel at a time also eliminates crosstalk and unwanted interferencebetween neighboring channels, which provides clean signals that improvesensitivity for low concentration bio detection.

Referring now to FIG. 83A to FIG. 83E, various example views associatedwith a sample testing device 8300 are illustrated. In particular, FIG.83A illustrates an example perspective view of the sample testing device8300. FIG. 83B illustrates another example perspective view of thesample testing device 8300. FIG. 83C illustrates an example side view ofthe sample testing device 8300. FIG. 83D illustrates an example top viewof the sample testing device 8300. FIG. 83E illustrates an example crosssectional view of the sample testing device 8300 along the line A-A′shown in FIG. 83C and viewing in the direction as shown by the arrows.

Referring now to FIG. 83A and FIG. 83B, the example sample testingdevice 8300 comprises a waveguide platform 8301. In some embodiments, anaiming control base 8303 and a waveguide base 8317 are disposed on a topsurface of the waveguide platform 8301. In some embodiments, the aimingcontrol base 8303 is disposed adjacent to the waveguide base 8317.

In some embodiments, a laser source 8305 is disposed on a top surface ofthe aiming control base 8303. In some embodiments, the laser source 8305may comprise a laser diode that is configured to emit a laser beam,similar to those described herein. In some embodiments, laser light fromthe laser diode of the laser source 8305 is collimated with collimatinglens 8307 as shown in FIG. 83E. In some embodiments, the collimatedlaser beam is reflected by a scan element 8309 (which may comprise aelectro-magnetic scan mirror) to form line scanning laser beam. In someembodiments, the scanning laser beam is refocused with various lens(such as f-theta lens). For example, as show in FIG. 83A, FIG. 83B, FIG.83D and FIG. 83E, the scanning laser beam is refocused by a focusinglens 8311 and subsequently by a field lens 8313.

In some embodiments, the scan element 8309 is mounted on the aimingcontrol base 8303. In some embodiments, the aiming control base 8303 maycomprise at least two electro-magnetic actuators for pitch control androll control of the aiming control base 8303 (such as theelectro-magnetic actuator 8327 and the electro-magnetic actuator 8329).In some embodiments, the electro-magnetic actuators may adjust the pitchand roll of the aiming control base 8303, such that the laser beamreflected from the scan element 8309 may be align to the input end ofthe waveguide 8331.

For example, referring now to FIG. 83C, the aiming control base 8303 maycomprise a bearing ball 8335 that is inserted between a bottom surfaceof a top portion 8337 of the aiming control base 8303 and a top surfaceof a bottom portion 8339 of the aiming control base 8303. In such anexample, components such as laser source 8305 and scan element 8309 adisposed on a top surface of the top portion 8337 of the aiming controlbase 8303. Additionally, or alternatively, each of the electro-magneticactuators may comprise a retaining spring between the top portion 8337and the bottom portion 8339. In some embodiments, the retaining springis configured to adjust the distance between the top portion 8337 andthe bottom portion 8339 at a given location. For example, each of theretaining spring 8341 (of the electro-magnetic actuator 8327) and theretaining spring 8345 (of the electro-magnetic actuator 8329) may adjustthe distance between the top portion 8337 and the bottom portion 8339 attheir respective locations, thereby adjusting the pitch and roll of theaiming control base 8303.

Additionally, or alternatively, the aiming control base 8303 maycomprise one or more piezo actuators that is configured to adjust theposition of the aiming control base 8303 relative to the waveguide base8317.

In some embodiments, the waveguide base 8317 comprises a waveguide 8331that has a plurality of channels. In some embodiments, a multichannelwaveguide may comprise multiple channel that can be arranged in threegroups for negative reference channel 8333A, sample channel 8333B andpositive reference channel 8333C. Similar to those described above, eachgroup comprises open window channels and/or buried reference channels.For example, the sample channel 8333B may comprise an open windowchannel that is coated various target antibodies for detecting multiplevirus variants in one test. In some embodiments, the negative referencechannel 8333A and positive reference channel 8333C comprise buriedreference channels that are pre-arranged to provide real-time referencesto cancel thermal and structural interference that may cause waveguidesignal variations and drifting to ensure high sensitivity for lowconcentration virus detection, similar to those described above.

In some embodiments, the refocused scanning beam illuminates waveguide8331 from channel to channel. In the example shown in FIG. 83D, thescanning beam may illuminate channel 8333A, and then illuminate channel8333B, and then illuminate channel 8333C. In some embodiments, the scanelement 8309 is configured to adjust the angle of the laser beam fromthe laser source 8305 to form the scanning beam, details of which aredescribed herein.

In some embodiments, the sample testing device 8300 further comprises afluid cover 8319. Similar to those described above, the fluid cover 8319is disposed on a top surface of the waveguide base 8317, formingmultiple flow channels. In some embodiments, each of the flow channelsmay comprise at least one inlet (for example, inlet 8321A) that isconfigured to receive and provide a sample to the flow channel and atleast one outlet (for example, outlet 8321B) that is configured todischarge a sample from the flow channel.

In some embodiments, each of multiple flow channels is disposed on topof at least one of the channels (negative reference channel(s), samplechannel(s) and/or positive reference channel(s)) of the waveguide 8331.For example, referring now to FIG. 83D, in some embodiments, negativereference channel(s) 8333A is covered with reference medium having novirus that is from the corresponding flow channel. In some embodiments,sample channel(s) 8333B is covered with sample medium for detection thatis from the corresponding flow channel. In some embodiments, positivereference channel(s) 8333C is covered with target virus surrogates thatare from the corresponding flow channel.

In some embodiments, the sample testing device 8300 further comprises animaging component 8347 that is configured to detect an interferencefringe pattern, similar to those described above.

In some embodiments, the sample testing device 8300 further comprisesthermal insulator 8315 that is disposed between the waveguide platform8301 and the waveguide base 8317. In some embodiments, the thermalinsulator 8315 comprises thermal insulating materials that may minimizeor reduce the impact of interference fringe pattern caused bytemperature fluctuation. Additionally, or alternatively, the sampletesting device 8300 comprises a thermal sensor 8325 that is inelectronic communication with a heating/cooling pad 8323. For example,based on the temperature detected by the thermal sensor 8325, aprocessor may adjust the temperature of the heating/cooling pad 8323 soas to minimize or reduce the interference caused by temperaturefluctuation.

In some embodiments, the size of the sample testing device 8300 may bedesigned based on system requirements. For example, the sample testingdevice 8300 shown in FIG. 83D may have a width W of 26 millimeters and alength L of 76 millimeters. In some embodiments, the width and/or lengthof the sample testing device 8300 may be of other values.

Referring now to FIG. 84A to FIG. 84D, various example views associatedwith an aiming control base 8400 are illustrated. In particular, FIG.84A illustrates an example perspective view of the aiming control base8400. FIG. 84B illustrates another example perspective view of theaiming control base 8400. FIG. 84C illustrates an example side view ofthe aiming control base 8400. FIG. 84D illustrates an example top viewof the aiming control base 8400.

Similar to those described above in connection with FIG. 83A to FIG.83E, the aiming control base 8400 may comprise at least a laser source8401 that is configured to emit a laser beam. In some embodiments, thelaser beam travels to the scan element 8403, which redirects to thelease beam towards the focusing lens 8405. In some embodiments,subsequent to passing through the focusing lens 8405, the laser beamfurther passes through the field lens 8407 and arrive at an input end ofa waveguide, similar to those described above.

In some embodiments, the aiming control base 8400 may comprise one ormore electro-magnetic actuators (for example, electro-magnetic actuator8411 and electro-magnetic actuator 8409). In the example shown in FIG.84C, the aiming control base may comprise a bearing ball 8413, and eachof the one or more electro-magnetic actuators may comprise one or moreretaining springs (for example, retaining spring 8415 and retainingspring 8417) that is configured to adjust distances between a topportion 8442 and a bottom portion 8444 of the aiming control base 8400at one or more locations of the aiming control base 8400, so as tocontrol the roll and pitch of the aiming control base 8400, similar tothose described above.

In some embodiments, the size of the aiming control base 8400 may bedesigned based on system requirements. For example, as shown in FIG. 84Cthe height H of the aiming control base 8400 may be 13 millimeters.Additionally, or alternatively, as shown in FIG. 84D, the length L ofthe aiming control base 8400 may be 36 millimeters, and/or the width ofthe aiming control base 8400 may be 26 millimeters. Additionally, oralternatively, the height, length, and/or the width of the aimingcontrol base 8400 may be of other values.

Referring now to FIG. 85A to FIG. 85E, various example views associatedwith a scan element 8500 are illustrated. In particular, FIG. 85Aillustrates an example perspective view of the scan element 8500. FIG.85B illustrates another example exploded view of the scan element 8500.FIG. 85C illustrates another example exploded view of the scan element8500. FIG. 85D illustrates an example side view of the scan element8500. FIG. 85E illustrates an example perspective view of a resonantflex 8507 of the scan element 8500.

In the examples shown in FIG. 85A to FIG. 85E, the example scan element8500 comprises a substrate 8501, a coil 8503, a magnet 8505, a resonantflex 8507, a scan mirror 8509, and a spacer 8511.

As shown in FIG. 85A and FIG. 85B, the coil 8503 is disposed on asurface of the substrate 8501. As shown in FIG. 85B, FIG. 85C, and FIG.85D, the magnet 8505 is disposed on a first surface of the resonant flex8507, and the scan mirror 8509 is disposed on a second surface of theresonant flex 8507 opposite of the first surface. In some embodiments,the spacer 8511 attaches the substrate 8501 to the resonant flex 8507and aligns the magnet 8505 to be within a central ring formed by thecoil 8503.

In some embodiments, when electric current passes through the coil 8503,an electromagnetic field is formed, causing the magnet 8505 to movetowards or away from the coil 8503. In some embodiments, the strength ofthe electromagnetic field is controlled by the amount of the electriccurrent passing through the coil 8503. As such, by adjusting theelectric current in the coil 8503, the movement of the magnet 8505 canbe adjusted. Because the magnet 8505 is disposed on the resonant flex8507, which in turn attaches the scan mirror 8509, the position of scanmirror 8509 may be adjusted based on the strength of the electromagneticfield. As such, by adjusting the electric current in the coil 8503, theposition of the scan mirror 8509 may be adjusted, which in turn directsthe laser beam to scan from channel to channel as described above.

FIG. 85E illustrates an example resonant flex 8507. In some embodiments,a surface of the resonant flex 8507 comprises a first portion 8513attached to the spacer 8511 and a third portion 8517 attached to themagnet 8505. In some embodiments, the resonant flex 8507 comprises amiddle hinge 8515 between the first portion 8513 and the third portion8517. In some embodiments, the middle hinge 8515 is flexible.

In some embodiments, the size of the resonant flex 8507 may be designedbased on system requirements. For example, the resonant flex 8507 mayhave a length L of 11 millimeters and a width W of 5.6 millimeters. Insome embodiments, the length L and/or the width W may be of othervalues.

In various applications, a sample testing device (such as a waveguidevirus sensor) requires micro fluidics to delivery sample medium andreference medium with controlled flow rate and injection timing. Variousembodiments of the present disclosure provide an integrated waveguidevirus sensor cartridge (also referred to as “waveguide cartridge”)comprising a waveguide, flow channels, a cartridge body, and a fluidcover to that are configured to provide controlled flow rate andinjection timing of sample medium and reference medium. In someembodiments, a waveguide cartridge allows for quick plug-in applicationwith alignment features. In some embodiments, enclosed and sealedwaveguide cartridge is disposable in accordance with bio-hazards controlprotocols to satisfy clinic use requirement.

Referring now to FIG. 86A to FIG. 86F, an example waveguide cartridge8600 is illustrated. In particular, FIG. 86A illustrates an exampleperspective view of the waveguide cartridge 8600 from the top. FIG. 86Billustrates an example perspective view of the waveguide cartridge 8600from the bottom. FIG. 86C illustrates an example exploded view of thewaveguide cartridge 8600. FIG. 86D illustrates an example top view ofthe waveguide cartridge 8600. FIG. 86E illustrates an example side viewof the waveguide cartridge 8600. FIG. 86F illustrates an example bottomview of the waveguide cartridge 8600. In some embodiments, the waveguidecartridge 8600 may be a single use cartridge. In some embodiments, thewaveguide cartridge 8600 may be implemented together with a specimencollector and receive sample such as respiratory/breath aerosol specimen(e.g. exhaled aerosols) and/or a nasal swab specimen.

As shown in FIG. 86C, the example waveguide cartridge 8600 comprises awaveguide 8601, a flow channel plate 8603, a cartridge body 8605, afluid cover 8607, an exhaust filter 8609, and a cartridge cover 8611. Insome embodiments, the flow channel plate 8603 may be embodied as a flowgasket in accordance with various examples described herein.

In some embodiments, one or more laser alignment methods, devices,and/or systems may be implemented to align the waveguide 8601 and/orwaveguide cartridge 8600 to a laser source so as to reduce the systemturnaround time (for example, less than five minutes). In someembodiments, the temperature of the waveguide 8601 may remain uniformthroughout testing of the sample by implementing one or more temperaturecontrol techniques described herein. In some embodiments, a bottomsurface of the flow channel plate 8603 is disposed on a top surface ofthe waveguide 8601. In some embodiments, each of the flow channels inthe flow channel plate 8603 are aligned with one of the sample channelor reference channel in the waveguide 8601, similar to those describedabove.

In some embodiments, a bottom surface of the cartridge body 8605 isdisposed on a top surface of the flow channel plate 8603. As describedfurther herein, the bottom surface of the cartridge body 8605 comprisesa plurality of inlet ports and outlet ports. In some embodiments, eachof the output ports provides sample medium or reference medium to one ofthe flow channels in the flow channel plate 8603, and each of the inputports receives sample medium or reference medium from one of the flowchannels in the flow channel plate 8603, details of which are describedherein.

In the example shown in FIG. 86C, the cartridge body 8605 comprises abuffer reservoir 8613, a reference port 8619, a sample port 8625, and anexhauster chamber 8631.

In some embodiments, the fluid cover 8607 is disposed on a top surfaceof the cartridge body 8605. In some embodiments, the fluid cover 8607comprises an actuator push 8615, a reference injection tube 8621, and asample injection tube 8627. In some embodiments, the actuator push 8615is aligned on top of the buffer reservoir 8613 of the cartridge body8605. In some embodiments, the reference injection tube 8621 is alignedon top of the reference port 8619. In some embodiments, the sampleinjection tube 8627 is aligned on top of the sample port 8625.

In some embodiments, the exhaust filter 8609 is disposed on a topsurface of the cartridge body 8605. In some embodiments, the exhaustfilter 8609 is aligned to cover the exhauster chamber 8631 of thecartridge body 8605.

In some embodiments, the cartridge cover 8611 is disposed on top of thefluid cover 8607 and/or the exhaust filter 8609. In some embodiments,the cartridge cover 8611 comprises an actuator opening 8617, a referenceopening 8623, a sample opening 8629, and an exhaust opening 8633. Insome embodiments, the actuator opening 8617 is aligned on top of theactuator push 8615. In some embodiments, the reference opening 8623 isaligned on top of the reference injection tube 8621. In someembodiments, the sample opening 8629 is aligned on top of the sampleinjection tube 8627. In some embodiments, the exhaust opening 8633 isaligned on top of the exhaust filter 8609.

In the example shown in FIG. 86B, the corners of the waveguide 8601 areexposed from cartridge body 8605, which allows for optical alignment. Insome embodiments, the bottom surface of the waveguide 8601 is alsocleared to contact a heating/cooling pad for temperature control.

In some embodiments, heat staking joints method with only local heatingmay be implemented in assembling the waveguide cartridge 8600 to preventdamage to bio-activated waveguide 8601. Additionally, or alternatively,other methods may be implemented in assembling the waveguide cartridge8600.

For example, the waveguide cartridge 8600 may be pre-assembled with thecartridge body 8605, fluid cover 8607, exhaust filter 8609, andcartridge cover 8611. Final assembly is performed with heat staking tosecure the bio-activated waveguide 8601 and to seal the flow channelplate 8603 between the cartridge body 8605 and the waveguide 8601. Insome embodiments, the waveguide cartridge 8600 is then filled with PBSbuffer solution (except exhaust/waste chamber), including in the bufferreservoir 8613 and in the flow channels of the flow channel plate 8603.

When using the waveguide cartridge 8600, the waveguide cartridge 8600 isplaced in a reading instrument with optical aliment, directlyreferencing to the waveguide edge features. Injections are thenperformed with reference medium injection through the reference port8619 and followed by sample medium injection through the sample port8625. After injection, the deformable actuator push 8615 is then pusheddown, which in turn pushes the buffer solution in the buffer reservoir8613 to move through the flow channels. In the example of three channelsshown in FIG. 86A to FIG. 86F, flows are in the same sequence as PBSbuffer solution, fluids and then PBS buffer solution. Fluids includetarget surrogate in positive reference channel (e.g. positive referencemedium), non-virus PBS in negative reference channel (e.g. negativereference medium), and patient sample in sample channel (e.g. samplemedium). A serial flow path provides synchronized signals from referencechannels and the sample channel so as to accurately derive test results,details of which are described herein.

In some embodiments, the size of the waveguide cartridge 8600 may bedesigned based on system requirements. For example, a width W of thewaveguide cartridge 8600 as shown in FIG. 86D may be 74 millimeters.Additionally, or alternatively, a height H of the waveguide cartridge8600 as shown in FIG. 86E may be 68 millimeters. Additionally, oralternatively, a length L of the waveguide cartridge 8600 as shown inFIG. 86E may be 31 millimeters. Additionally, or alternatively, a widthW′ of the waveguide 8601 may be 44 millimeters. Additionally, oralternatively, the width W, the height H, the length L and/or the widthW′ may be of other values.

Referring now to FIG. 87A to FIG. 87C, an example waveguide 8700 isillustrated. In particular, FIG. 87A illustrates an example perspectiveview of the waveguide 8700. FIG. 87B illustrates an example top view ofthe waveguide 8700. FIG. 87C illustrates an example side view of thewaveguide 8700.

In the example shown in FIG. 87A to FIG. 87C, the example waveguide 8700comprises a plurality of channels for sample medium and referencemedium. For example, the example waveguide 8700 may comprise a firstchannel 8701, a second channel 8703, and a third channel 8705. In someembodiments, the first channel 8701 and the third channel 8705 arereference channels (e.g. buried channels). In some embodiments, thesecond channel 8703 is a sample channel (e.g. an open channel). Forexample, the second channel 8703 may comprise biological assay reagentsimmobilized on the surface so as to detect and/or capture pathogens inthe sample (such as SARS-CoV2 pathogen), similar to those describedabove. The capturing induces a refractive index change that modifies thepropagation of laser light down the waveguide 8700, similar to thosedescribed above. Due to the evanescent transduction mechanism, testing asample using the example waveguide 8700 requires very little samplepreparation. In some embodiments, the first channel 8701 and the thirdchannel 8705 may provide parallel positive and negative control assaysthat allow for real-time elimination of noise and quantification of thevirus load present in the sample. Due to the evanescent transductionmechanism, the diagnostic requires very little sample preparation. Insome embodiments, the example waveguide 8700 may comprise less thanthree or more than three channels. For example, the example waveguide8700 may comprise eight optical channels that are active in use whentesting one or more samples.

As shown in FIGS. 87B and 87C, in some embodiments, the length L1 of theexample waveguide 8700 is 31000 microns. In some embodiments, the totallength L2 of the channels in the example waveguide 8700 is 30000microns. In some embodiments, the length L3 of the open window portionof each channel is 15000 microns. In some embodiments, the length L4 ofthe buried portion of each channel is 8000 microns. In some embodiments,the width W of the example waveguide 8700 is 4400 microns. In someembodiments, the height H of the waveguide 8700 is 400 microns. In someembodiments, one or more measurements of the waveguide 8700 may be ofother values.

Referring now to FIG. 88A to FIG. 88D, an example flow channel plate8800 is illustrated. In particular, FIG. 88A illustrates an exampleperspective view of the flow channel plate 8800. FIG. 88B illustrates anexample top view of the flow channel plate 8800. FIG. 88C illustrates anexample cross-sectional view of the flow channel plate 8800 cutting fromthe A-A′ in FIG. 88B and viewing from the direction of the arrow. FIG.88D illustrates an example side view of the flow channel plate 8800.

In some embodiments, the example flow channel plate 8800 may bemanufactured through a PDMS molding process that provides seals betweena top surface of the waveguide cartridge and the cartridge body, formingmultiple flow channels. In the example shown in FIG. 88A to FIG. 88D,the example flow channel plate 8800 comprises a first flow channel 8802,a second flow channel 8804, and a third flow channel 8806.

In some embodiments, each of the first flow channel 8802, the secondflow channel 8804, and the third flow channel 8806 may correspond to oneof the channels in the waveguide of the waveguide cartridge. Forexample, referencing in connection with the waveguide 8700 shown in FIG.87A to FIG. 87C, the first flow channel 8802, the second flow channel8804, and the third flow channel 8806 of the example flow channel plate8800 may be positioned on top of the first channel 8701, the secondchannel 8703, and the third channel 8705, respectively. In someembodiments, when the waveguide 8700 is positioned within the waveguidecartridge, the waveguide cartridge provides optical access to the inletand the outlet of the waveguide 8700, such that laser beam may beemitted through the waveguide as described herein.

In some embodiments, each of the flow channel may receive sample from aninlet opening and discharge the sample through an outlet opening. In theexample shown in FIG. 88C, a sample may flow from the inlet opening8808, through the second flow channel 8804, and exits from the secondflow channel 8804 through the outlet opening 8810. In some embodiments,each of the inlet opening 8808 and the outlet opening 8810 may beconnected to an outlet port and an inlet port of the cartridge body,details of which are described herein.

Referring now to FIG. 89A to FIG. 89E, an example cartridge body 8900 isillustrated. In particular, FIG. 89A illustrates an example perspectiveview of the cartridge body 8900 from the top. FIG. 89B illustrates anexample perspective view of the cartridge body 8900 from the bottom.FIG. 89C illustrates an example top view of the cartridge body 8900.FIG. 89D illustrates an example bottom view of the cartridge body 8900.FIG. 89E illustrates an example side view of the cartridge body 8900.

In some embodiments, the cartridge body 8900 may be manufactured througha cyclic olefin copolymer (COC) injection molding process. In someembodiments, the cartridge body 8900 may comprise a lower housing, agasket disposed on the lower housing, and an upper housing disposed onthe gasket. In some embodiments, the cartridge body 8900 provide variousfluidics, a buffer reservoir 8901, a sample injection port 8921, asample loop 8925, a reference injection port 8905, a reference loop 8909and an exhauster chamber 8933. In some embodiments, various loops in thecartridge body 8900 and various channels in the flow channel plate areconnected in serial to form a flow path, ensuring the exact same flowrate among sample medium and reference mediums, details of which aredescribed herein. In some embodiments, the cartridge body 8900 maycomprise material such as ABS.

For example, referring now to FIG. 89C (an example top view) and FIG.89D (an example bottom view), port 8911, which is an end port of thereference loop 8909, is connected and provides input fluid to a firstflow channel in the flow channel plate. The first flow channel is alsoconnected to port 8913 and outputs fluid to port 8913. As shown in FIG.89D, port 8913 is one end of the buffer loop 8915, while the other endof the buffer loop 8915 is port 8917 that is connected and providesinput fluid to a second flow channel in the flow channel plate. Thesecond flow channel is also connected to port 8919 and outputs fluid toport 8919. As shown in FIG. 89D, port 8919 is one end of the sample loop8925, while the other end of the sample loop 8925 is port 8927 that isconnected and provides input fluid to a third flow channel in the flowchannel plate. The third flow channel is also connected to port 8929 andoutputs fluid to port 8929.

In some embodiments, the buffer solution may be provided in the bufferreservoir 8901, which is connected to port 8903. In some embodiments,the buffer solution has been degassed and is bubble free. In someembodiments, the buffer solution in the buffer reservoir 8901 may have avolume of more than 95 ml. In some embodiments, the buffer solution inthe buffer reservoir 8901 may have a volume of other values. Asdescribed above, port 8903 is connected to the reference loop 8909. Asdescribed above, when the actuator push of a waveguide cartridge ispushed down, the actuator push in turn pushes the buffer solution in thebuffer reservoir 8901 to move through the flow channels.

In some embodiments, reference medium is provided to the referenceinjection port 8905 (for example, through punch-through injections) andtravels to the reference loop 8909 through port 8907 that is connectedto reference injection port 8905 after the actuator push of thewaveguide cartridge is pushed down. As described above, the end of thereference loop 8909 is port 8911 that is connected to a first channel ofthe flow channel plate. As such, the reference medium travels throughthe first channel of the flow channel plate.

As described above, the first channel of the flow channel plate isconnected to port 8913. As the reference medium travels through thefirst channel, it pushes the buffer solution in the first channel tobuffer loop 8915 through port 8913. As described above, the end of thebuffer loop 8915 is port 8917 that is connected to a second channel. Assuch, the buffer solution travels through the second flow channel andexits at port 8919, which is connected to the sample loop 8925.

In some embodiments, sample medium is provided to the sample injectionport 8921 (for example, through punch-through injections) and travels tothe sample loop 8925 through port 8923 that is connected to the sampleinjection port 8921 after the actuator push of the waveguide cartridgeis pushed down. As described above, the end 8927 of the sample loop 8925is connected to a third channel of the flow channel plate. As such, thesample medium travels through the third channel of the flow channelplate and exits at port 8929.

In some embodiments, port 8929 is connected to the exhauster chamber8933 through port 8931. As such, the sample may be discharged into theexhauster chamber 8933.

In some embodiments, to meet a requirement of 75 mL of total flow with30 mL sample injection, the buffer reservoir 8901 volume is more than 95mL, the exhaust chamber volume is more than 110 mL, and each of thesample loop and reference loop capacity is more than 35 mL. In someembodiments, a steady flow rate range between 5 to 15 uL/min for 10 to15 minutes may be provided. In some embodiments, one or more of theabove-mentioned requirement, flow rate, and/or volumes may be of othervalues.

In some embodiments, the size of the cartridge body may be designedbased on system requirements. For example, the width W of the cartridgebody 8900 shown in FIG. 89C may be 7.4 millimeters. The height H of thecartridge body 8900 shown in FIG. 89E may be 7.4 millimeters. The lengthL of the cartridge body 8900 shown in FIG. 89E may be 31 millimeters. Insome embodiments, the width W, height H, and/or the length L of thecartridge body 8900 may be of other values.

Referring now to FIG. 90A to FIG. 90E, an example fluid cover 9000 isillustrated. In particular, FIG. 90A illustrates an example perspectiveview of the fluid cover 9000 from the top. FIG. 90B illustrates anexample perspective view of the fluid cover 9000 from the bottom. FIG.90C illustrates an example top view of the fluid cover 9000. FIG. 90Dillustrates an example side view of the fluid cover 9000. FIG. 90Eillustrates an example bottom view of the fluid cover 9000.

In some embodiments, the fluid cover 9000 is deformable and can functionas a pump with actuator that is configured to push down the buffersolution in the buffer reservoir under precision displacement control.For example, the fluid cover 9000 may comprise silicon rubber that isformed through an injection molding process. In some embodiments, thefluid cover 9000 may comprise material such as ABS.

In the example shown in FIG. 90A to FIG. 90E, the example fluid cover9000 comprises an actuator push 9006, a reference injection tube 9004,and a sample injection tube 9002, similar to the actuator push 8615, thereference injection tube 8621, and the sample injection tube 8627described above in connection with FIG. 86A to FIG. 86F.

Referring now to FIG. 91A to FIG. 91C, an example exhaust filter 9100 isillustrated. In particular, FIG. 91A illustrates an example perspectiveview of the exhaust filter 9100. FIG. 91B illustrates an example sideview of the exhaust filter 9100. FIG. 91C illustrates an example bottomview of the exhaust filter 9100.

In some embodiments, the exhaust filter 9100 may comprise gas permeablePTFE filter exhaust that allows gaseous substance to be released from awaveguide cartridge without causing environment risk.

Referring now to FIG. 92A to FIG. 92C, an example cartridge cover 9200is illustrated. In particular, FIG. 92A illustrates an exampleperspective view of the cartridge cover 9200. FIG. 92B illustrates anexample top view of the cartridge cover 9200. FIG. 92C illustrates anexample side view of the cartridge cover 9200.

In some embodiments, the example cartridge cover 9200 may comprisepolycarbonate and be manufactured through an injection molding process.In some embodiments, the example cartridge cover 9200 may comprise oneor more additional or alternative materials, and may be manufacturedthrough one or more additional or alternative processes. In the exampleshown in FIG. 92A to FIG. 92C, the example cartridge cover 9200comprises an actuator opening 9202, a reference opening 9204, a sampleopening 9206, and an exhaust opening 9208, similar to the actuatoropening 8617, the reference opening 8623, the sample opening 8629, andthe exhaust opening 8633 described above in connection with FIG. 86A toFIG. 86F.

Many communicable diseases/pathogens spread through aerosol droplets,and almost every biological assay that is capable of identifyingspecific pathogens (viruses, bacteria, etc.) relies on liquid basedimmunoassays. One of the technical challenges associated with virusdetection is how to efficiently collect a sufficient amount of aerosolsfrom a large air volume for subsequent immunoassay. Another technicalchallenge is to keep the pathogens viable during the sampling process.

Many systems focus on implementing a sampler with a dedicated pump thatsamples a smaller percentage of the air within a space. Many of thesesamplers also are designed to identify the RNA/DNA content of thepathogen and therefore are not designed to keep the pathogen viable(e.g. as a whole). Keeping the pathogen whole is critical to assess howcontagious the aerosol particles were (for example, non-viable viruseswould not infect others, but would still show positive in an RNAanalysis).

In accordance with various embodiments of the present disclosure, asample collection device is integrated into the air conditioner'scondenser unit. Referring now to FIG. 93A and FIG. 93B, an examplesystem 9300 in accordance with embodiments of the present disclosure areillustrated.

In the example shown in FIG. 93A and FIG. 93B, the example system 9300comprises an evaporator unit 9302 and a condenser unit 9304, which maybe parts of an air considering unit. In some embodiments, the evaporatorunit 9302 comprises an evaporator coil 9308 and a blower 9306. In someembodiments, the condenser unit 9304 comprises a compressor 9318 and acondenser coil 9320, which are connected to the evaporator coil 9308.

In some embodiments, the blower 9306 is configured to draw air into theevaporator unit 9302 and/or push air out of the evaporator unit 9302. Insome embodiments, air travels through the evaporator coil 9308. In someembodiments, liquid refrigerant at a low temperature circulates throughthe evaporator coil 9308. For example, the condenser coil 9320 mayrelease heat absorbed by the liquid refrigerant that has circulatedthrough the evaporator coil 9308, and the compressor 9318 may drive thecirculation between the condenser coil 9320 and evaporator coil 9308. Insome embodiments, when air drawn by the blower 9306 reaches theevaporator coil 9308, condensation may occur due to the temperaturedifference between the air and the condenser coil 9320, and liquid maybe formed on the outer surface of the evaporator coil 9308. In someembodiments, the liquid formed on the surface may effectively collectaerosol particles from a large percentage of the air in a space that hasbeen driven into the evaporator unit 9302 by the blower 9306.

In the example shown in FIG. 93A, a condensate tray 9310 is positionedunderneath the evaporator coil 9308 to collect condensed liquid 9312dripping from the evaporator coil 9308. In some embodiments, a samplecollection device 9316 is connected to the condensate tray 9310 througha conduit 9314. In some embodiments, the sample collection device 9316may contain buffer solution to keep the pathogens in the condensedliquid 9312 viable before performing immunoassay. For example, thesample collection device 9316 may comprise a container, a storagedevice, and/or a cartridge, similar to those described above.

Additionally, or alternatively, the condensate tray 9310 may bepositioned underneath the condenser coil 9320 in the condenser unit 9304to collect condensed liquid, and the sample collection device 9316 isconnected to the condensate tray 9310 (for example, through a conduit)to receive condensed liquid.

In some embodiments, the evaporator coil 9308 and/or the condenser coil9320 are modified to more effectively and/or rapidly collect condensedliquid. For example, various embodiments of the present disclosure maycomprise coating the evaporator coil 9308 and/or the condenser coil 9320with one or more hydrophobic layers to promote droplet formation andgravity-based collection of the fluid.

In some embodiments, the condensate tray 9310 could be augmenteddirectly to enable immunoassay. In some embodiments, the condensate tray9310 may comprise optical surfaces, immobilized antibodies, transductionmechanism, and/or other testing component(s) incorporated into the baseof the condensate tray 9310, such as, but not limited to, a sampletesting device described herein. Additionally, or alternatively, thecondensate tray 9310 may comprise a separate liquid reservoir withbuffer solution that could combine with the condensed aerosol liquid,and condensed aerosol liquid with buffer solution may be pumped into achannel of a sample testing device described herein (such as awaveguide) for performing immunoassay, similar to various examplesdescribed herein.

It is to be understood that the disclosure is not to be limited to thespecific examples disclosed, and that modifications and other examplesare intended to be included within the scope of the appended claims.Although specific terms are employed herein, they are used in a genericand descriptive sense only and not for purposes of limitation, unlessdescribed otherwise.

1. A sample testing device comprising: a pump; a first valve connectingthe pump to a first flow channel of a waveguide; and a buffer loopconnecting the first flow channel of the waveguide to a second valve. 2.The sample testing device of claim 1, wherein the first valve is a2-configuration 6-port valve.
 3. The sample testing device of claim 2,wherein the first valve comprises a first port, a second port, a thirdport, a fourth port, a fifth port, and a sixth port, wherein the firstvalve is configured to provide a first configuration and a secondconfiguration.
 4. The sample testing device of claim 3, wherein, whenthe first valve is in the first configuration, the fifth port of thefirst valve is connected to the sixth port of the first valve.
 5. Thesample testing device of claim 4, wherein the pump is connected to thefifth port of the first valve.
 6. The sample testing device of claim 5,wherein the first flow channel is connected to the sixth port of thefirst valve.
 7. The sample testing device of claim 6, wherein, when thefirst valve is in the first configuration, the pump is configured toprovide a buffer solution to the first flow channel through the firstvalve.
 8. The sample testing device of claim 3, wherein, when the firstvalve is in the first configuration, the first port of the first valveis connected to the second port of the first valve.
 9. The sampletesting device of claim 3, wherein, when the first valve is in the firstconfiguration, the third port of the first valve is connected to thefourth port of the first valve.
 10. The sample testing device of claim3, wherein, when the first valve is in the second configuration, thefirst port of the first valve is connected to the sixth port of thefirst valve.
 11. The sample testing device of claim 3, wherein, when thefirst valve is in the second configuration, the third port of the firstvalve is connected to the second port of the first valve.
 12. The sampletesting device of claim 3, wherein, when the first valve is in thesecond configuration, the fifth port of the first valve is connected tothe fourth port of the first valve.
 13. The sample testing device ofclaim 12, wherein the fourth port of the first valve is connected to thefirst port of the first valve through a first sample loop.
 14. Thesample testing device of claim 13, wherein, the first sample loopcomprises a first fluid.
 15. The sample testing device of claim 14, whenthe first valve is in the second configuration, the pump is configuredto inject the first fluid to the first flow channel.
 16. The sampletesting device of claim 14, wherein the second valve is connected to asecond flow channel of the waveguide.
 17. The sample testing device ofclaim 16, wherein the second valve is a 2-configuration 6-port valve.18. The sample testing device of claim 17, wherein the second valvecomprises a second sample loop.
 19. The sample testing device of claim18, wherein the second sample loop comprises a second fluid.
 20. Thesample testing device of claim 19, wherein the pump is configured toinject the first fluid to the first flow channel and inject the secondfluid to the second flow channel at the same time.